Office Action Predictor
Last updated: April 15, 2026
Application No. 18/920,942

Curved Plastic Panel And Method And Device For Processing The Same

Non-Final OA §103
Filed
Oct 20, 2024
Examiner
HUSON, MONICA ANNE
Art Unit
1742
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Enflex Corporation
OA Round
1 (Non-Final)
79%
Grant Probability
Favorable
1-2
OA Rounds
2y 12m
To Grant
90%
With Interview

Examiner Intelligence

Grants 79% — above average
79%
Career Allow Rate
1073 granted / 1352 resolved
+14.4% vs TC avg
Moderate +11% lift
Without
With
+10.9%
Interview Lift
resolved cases with interview
Typical timeline
2y 12m
Avg Prosecution
43 currently pending
Career history
1395
Total Applications
across all art units

Statute-Specific Performance

§101
0.4%
-39.6% vs TC avg
§103
44.8%
+4.8% vs TC avg
§102
24.4%
-15.6% vs TC avg
§112
20.4%
-19.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1352 resolved cases

Office Action

§103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 12 is/are rejected under 35 U.S.C. 103 as being unpatentable over Yamamoto et al. (U.S. Patent Application Publication 2005/0167214), in view of Orchard (U.S. Patent Application Publication 2020/0353655). Yamamoto et al., hereafter “Yamamoto,” show that it is known to have a processing device for pressing a product (0017), comprising an upper die with curvature areas and a lower die with a curvature (elements 65, 64, 71-73), a plurality of upper heaters and an upper temperature sensor (elements 74, 75; 0066), and a plurality of lower heaters and a plurality of lower temperatures sensors (elements 82, 83; 0067). Yamamoto does not describe the die curvatures being variable. Orchard describes a device for pressing a product wherein the curvatures of an upper and lower die are variable (Figure 3; 0007, 0010-0016, 0030-0033). It would have been obvious to one of ordinary skill in the art to use Orchard’s variable curvature die surfaces in Yamamoto’s apparatus in order to create customizable complex shapes (see Orchard). Yamamoto does not show two temperatures sensors in his upper die. It would have been obvious to include a plurality of temperature sensors in Yamamoto’s upper die in order to increase the datapoints of temperature in the die and because there is art recognized suitability for a plurality of sensors, e.g. in his lower die. The examiner notes that the process steps of claim 12 do not further limit the claimed apparatus structure, and it is the position of the examiner that the claimed apparatus structure as suggested by Yamamoto and Orchard, as noted above, would be capable of carrying out such process steps. Allowable Subject Matter Claims 13-16 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to MONICA HUSON whose telephone number is (571)272-1198. The examiner can normally be reached M-F 8a-4p. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Christina Johnson can be reached at 571-272-1176. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. MONICA ANNE HUSON Primary Examiner Art Unit 1742 /MONICA A HUSON/Primary Examiner, Art Unit 1742
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Prosecution Timeline

Oct 20, 2024
Application Filed
Mar 05, 2026
Non-Final Rejection — §103
Mar 25, 2026
Response Filed

Precedent Cases

Applications granted by this same examiner with similar technology

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AMORPHOUS PHASE MODIFICATION APPARATUS AND PROCESSING METHOD OF SINGLE CRYSTAL MATERIAL
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Patent 12589543
METHOD FOR PRODUCING A CONTAINER PRODUCT AND DEVICE FOR IMPLEMENTING THE METHOD
2y 5m to grant Granted Mar 31, 2026
Patent 12589525
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2y 5m to grant Granted Mar 31, 2026
Patent 12591083
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2y 5m to grant Granted Mar 31, 2026
Patent 12583169
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2y 5m to grant Granted Mar 24, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
79%
Grant Probability
90%
With Interview (+10.9%)
2y 12m
Median Time to Grant
Low
PTA Risk
Based on 1352 resolved cases by this examiner. Grant probability derived from career allow rate.

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