Prosecution Insights
Last updated: August 17, 2026
Application No. 18/924,372

MICROELECTROMECHANICAL SYSTEMS CONTACT AREA REDUCTION

Non-Final OA §102§103
Filed
Oct 23, 2024
Priority
Sep 13, 2021 — continuation of 12/158,574
Examiner
CHOI, WILLIAM C
Art Unit
Tech Center
Assignee
Texas Instruments Incorporated
OA Round
1 (Non-Final)
93%
Grant Probability
Favorable
1-2
OA Rounds
3m
Est. Remaining
97%
With Interview

Examiner Intelligence

Grants 93% — above average
93%
Career Allowance Rate
1046 granted / 1129 resolved
+32.6% vs TC avg
Minimal +4% lift
Without
With
+4.1%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 1m
Avg Prosecution
30 currently pending
Career history
1145
Total Applications
across all art units

Statute-Specific Performance

§101
1.1%
-38.9% vs TC avg
§103
27.5%
-12.5% vs TC avg
§102
54.0%
+14.0% vs TC avg
§112
11.1%
-28.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1129 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Information Disclosure Statement The information disclosure statement (IDS) submitted on 10/23/2024 was filed in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statement is being considered by the examiner. Claim Objections Claim 14 (and corresponding dependent claims) is objected to because of the following informalities: in line 1, “(MEMS device” should be changed to --(MEMS) device--. Appropriate correction is required. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 9, 10, and 12 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Gong (US 2006/0238530 A1). In regard to claim 9, Gong discloses a microelectromechanical systems (MEMS) device (page 5, sections [0046]-[0050], Figures 4A,B) comprising: a hinge (Figures 4A,B, “416”); a spring tip coupled to the hinge (Figures 4A,B, “426”); and a top layer having an edge (Figure 4B, “410”), wherein the edge of the top layer is configured to contact the spring tip (Figure 4B, “410, 426”). PNG media_image1.png 438 608 media_image1.png Greyscale Regarding claim 10, Gong discloses wherein the top layer comprises a mirror (page 5, section [0046], Figure 4B, “410”). Regarding claim 12, Gong discloses wherein the edge of the top layer is a straight edge over the spring tip. PNG media_image1.png 438 608 media_image1.png Greyscale Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1, 3, and 6 is/are rejected under 35 U.S.C. 103 as being unpatentable over Gong (US 2006/0238530 A1) in view of Anderson et al (US 2002/0186449 A1). In regard to claim 1, Gong discloses a microelectromechanical systems (MEMS) device (page 3, section [0035] – page 4, section [0037], Figure 3A) comprising: a hinge (Figure 3A, “316”); a spring tip (Figure 3A, “326”); and a top layer comprising a top surface (Figure 3A, “304”), but does not specifically disclose said top layer comprising a recessed shelf coupled to the hinge. Within the same field of endeavor, Anderson et al teaches wherein it is desirable in MEMs devices for top layers to comprise a recessed shelf coupled to a hinge for the purpose of permitting the micromirror structural film (i.e. top layer) to be considerably shortened (page 3, sections [0032]-[0033], Figures 2A-C, “212”). Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention for the top layer of Gong to comprise a recessed shelf coupled to the hinge since Anderson et al teaches wherein it is desirable for the purpose of permitting the micromirror structural film (i.e. top layer) to be considerably shortened. Regarding claim 3, Gong discloses said MEMS device comprising a raised electrode (page 5, section [0059], Figure 18, “128, 130”). Regarding claim 6, Anderson et al further teaches wherein the top surface is a reflective surface of a mirror (page 3, section [0032], Figures 2A-C, “216”). Allowable Subject Matter Claims 14-20 are allowed. The following is a statement of reasons for the indication of allowable subject matter: The prior art fails to teach a combination of all the claimed features as presented in claims 14-20: a method of manufacturing a microelectromechanical systems (MEMS) device as claimed, specifically comprising: depositing a second spacer material on a first metal layer; forming an opening on in the second spacer material; depositing a second metal layer on the second spacer material; patterning the second metal layer; depositing a third spacer material on the second metal layer; etching the third spacer material; depositing a third metal layer on the third spacer material and the second metal layer; patterning the third metal layer; and removing the first spacer material, the second spacer material, and the third spacer material. Claims 2, 4, 5, 7, 8, 11, and 13 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is a statement of reasons for the indication of allowable subject matter: The prior art fails to teach a combination of all the claimed features as presented in claim 2: a MEMs device as claimed, specifically wherein the recessed shelf is configured to contact the spring tip. The prior art fails to teach a combination of all the claimed features as presented in claims 4 and 5: a MEMs device as claimed, specifically wherein the recessed shelf is configured to contact the spring tip with an edge having a radius of curvature (ROC) of less than 50 nanometers. The prior art fails to teach a combination of all the claimed features as presented in claim 7: a MEMs device as claimed, specifically wherein the reflective surface of the mirror extends beyond an edge of the recessed shelf. The prior art fails to teach a combination of all the claimed features as presented in claim 8: a MEMs device as claimed, specifically wherein the recessed shelf comprises an aluminum alloy, an oxide, or a nitride. The prior art fails to teach a combination of all the claimed features as presented in claim 11: a MEMs device as claimed, specifically wherein the top layer has a notch at the edge. The prior art fails to teach a combination of all the claimed features as presented in claim 13: a MEMs device as claimed, specifically wherein the spring tip has a bend, and wherein an end of the spring tip expends past the edge of the top layer. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Sheng et al (US 2019/0268563 A1) and Payne et al (US 2019/0204587 A1) disclose MEMS devices comprising hinges, spring tips, and top layers. Any inquiry concerning this communication or earlier communications from the examiner should be directed to WILLIAM C CHOI whose telephone number is (571)272-2324. The examiner can normally be reached Monday- Friday, 9:00 am - 6:00 pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Pinping Sun can be reached at (571) 270-1284. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /WILLIAM CHOI/Primary Examiner, Art Unit 2872 July 20, 2026
Read full office action

Prosecution Timeline

Oct 23, 2024
Application Filed
Jul 23, 2026
Non-Final Rejection mailed — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12704704
FINITY-CORRECTED MICROSCOPE OBJECTIVE FOR SCANNING APPLICATIONS
2y 1m to grant Granted Aug 11, 2026
Patent 12695206
BROADBAND WAVELENGTH PLATE DEVICE BASED ON OPTICAL PHASE MODULATION AND MANUFACTURING METHOD THEREFOR
2y 8m to grant Granted Jul 28, 2026
Patent 12693523
OBSERVATION OPTICAL SYSTEM AND OPTICAL APPARATUS
2y 10m to grant Granted Jul 28, 2026
Patent 12693499
IMAGING LENS SYSTEM, CAMERA MODULE, IN-VEHICLE SYSTEM, VEHICLE
2y 7m to grant Granted Jul 28, 2026
Patent 12687657
LENS AND OVERMOLD METHOD OF MANUFACTURE
2y 9m to grant Granted Jul 21, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2
Expected OA Rounds
93%
Grant Probability
97%
With Interview (+4.1%)
2y 1m (~3m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1129 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month