Prosecution Insights
Last updated: April 19, 2026
Application No. 18/932,971

PLASMA PROCESSING APPARATUS

Non-Final OA §103
Filed
Oct 31, 2024
Examiner
CRAWFORD, JASON
Art Unit
2844
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Daihen Corporation
OA Round
1 (Non-Final)
85%
Grant Probability
Favorable
1-2
OA Rounds
2y 0m
To Grant
94%
With Interview

Examiner Intelligence

Grants 85% — above average
85%
Career Allow Rate
907 granted / 1069 resolved
+16.8% vs TC avg
Moderate +9% lift
Without
With
+8.9%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 0m
Avg Prosecution
29 currently pending
Career history
1098
Total Applications
across all art units

Statute-Specific Performance

§101
1.0%
-39.0% vs TC avg
§103
38.4%
-1.6% vs TC avg
§102
45.7%
+5.7% vs TC avg
§112
4.3%
-35.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1069 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1-3 are rejected under 35 U.S.C. 103 as being unpatentable over Park (US 2016/0314938). In regards to claim 1, Park discloses of a plasma processing apparatus (100) comprising: an inner electrode (120) that receives application of a voltage (see Paragraph 0056); an electrode holder (151) that holds the inner electrode; an outer electrode (131) formed in a cylindrical shape, the outer electrode (131) surrounding the inner electrode (120) and the electrode holder (151); an insulating pipe (152) disposed between the inner electrode (102) and the outer electrode (131) and between the electrode holder (151) and the outer electrode (131), the insulating pipe (152) surrounding the inner electrode (120) and the electrode holder (151); a rotary cylindrical portion (181, 182) formed in a cylindrical shape surrounding the outer electrode (131), the rotary cylindrical portion (181, 182) being rotatable relative to the outer electrode (131) about a central axis of the inner electrode (120, see Fig 1); and a drive mechanism (see Paragraphs 0070-0074, rotating body would have drive mechanism for rotation) that rotates the rotary cylindrical portion (see Figs 1-4, 6, 9). However, Park does not explicitly disclose of wherein the rotary cylindrical portion is made of an insulating material. One having ordinary skill in the art would readily recognize having the rotary cylindrical portion as an insulating or non-conductive material since it is exposed on the exterior of the apparatus and will protect the outside of the plasma processing apparatus for safely handling the apparatus. Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date to have the rotary cylindrical portion being made of an insulating material to protecting and to allow for safely handling the apparatus. In regards to claim 2, Park discloses of the plasma processing apparatus according to claim 1, further comprising a support that supports the electrode holder (151) and the outer electrode (131), wherein the electrode holder (151) is secured to the support from one side in a direction parallel to the central axis, and the outer electrode (131) is secured to the support from the other side in the direction parallel to the central axis (see Figs 2-4, 6, 9). In regards to claim 3, Park discloses of the plasma processing apparatus according to claim 2, wherein the insulating pipe (152) is sandwiched from both sides in the direction parallel to the central axis by the outer electrode (131) and the support (see Figs 2-4, 6, 9). Claims 5 and 6 are rejected under 35 U.S.C. 103 as being unpatentable over Park (US 2016/0314938) as applied to claim 1 above and in further view of Frame et al. (US 2019/0090339). In regards to claim 5, Park discloses of the plasma processing apparatus according to claim 1 as found within the explanation above. However, Park does not explicitly disclose of wherein the electrode holder holds the inner electrode such that a tip end portion of the inner electrode is movable between a retracted position flush with a tip end surface of the insulating pipe and a protruding position flush with a tip end surface of the outer electrode. Frame discloses of a plasma processing apparatus (200) comprising: an inner electrode (241) that receives application of a voltage; an electrode holder (203) that holds the inner electrode (241); an outer electrode (201) formed in a cylindrical shape, the outer electrode (201) surrounding the inner electrode (241) and the electrode holder (203); wherein the electrode holder (203) holds the inner electrode (241) such that a tip end portion of the inner electrode is movable between a retracted position flush with a tip end surface of the insulating pipe and a protruding position flush with a tip end surface of the outer electrode (see Paragraphs 0040, 0108-0109, spring-loaded bayonet mechanism for retraction/protrusion). It would have been obvious to one of ordinary skill in the art before the effective filing date to have a tip end portion of the inner electrode that moves to different positions of the plasma processing apparatus as taught by Frame for extending the tip end of the inner electrode for improved aiming of the plasma generated by the plasma processing apparatus. In regards to claim 6, Park in view of Frame disclose of the plasma processing apparatus according to claim 5, wherein the rotary cylindrical portion (181, 182 of Park) has a facing surface facing the tip end surface of the outer electrode (131), and a supply flow path for supplying a gas (see 160, 161) from an outside of the outer electrode (131) toward a space between the tip end surface of the outer electrode (131) and the facing surface (see Park Figs 2-4, 6, 9). Allowable Subject Matter Claim 4 is objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is a statement of reasons for the indication of allowable subject matter: In regards to claim 4, the prior art does not disclose of the plasma processing apparatus according to claim 1, wherein the drive mechanism includes a motor, a first gear connected to an output shaft of the motor, and a second gear disposed to mesh with the first gear, the second gear is disposed to surround the outer electrode, the rotary cylindrical portion has a receiving surface that receives the second gear in a direction parallel to the central axis, and the second gear is secured to the rotary cylindrical portion by a fastening member that exerts an axial force that presses the second gear against the receiving surface, nor would it have been obvious to one of ordinary skill in the art to do so. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Tamaki et al. (US 2024/0429029) Any inquiry concerning this communication or earlier communications from the examiner should be directed to Jason M Crawford whose telephone number is (571)272-6004. The examiner can normally be reached Mon-Fri 6:00am-3:00pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Alexander Taningco can be reached at 571-272-8048. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /JASON M CRAWFORD/Primary Examiner, Art Unit 2844
Read full office action

Prosecution Timeline

Oct 31, 2024
Application Filed
Jan 22, 2026
Non-Final Rejection — §103 (current)

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Prosecution Projections

1-2
Expected OA Rounds
85%
Grant Probability
94%
With Interview (+8.9%)
2y 0m
Median Time to Grant
Low
PTA Risk
Based on 1069 resolved cases by this examiner. Grant probability derived from career allow rate.

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