Prosecution Insights
Last updated: October 02, 2026
Application No. 18/981,553

ARRAY SUBSTRATE AND LIQUID CRYSTAL DISPLAY PANEL

Non-Final OA §DOUBLEPATENT
Filed
Dec 15, 2024
Priority
Dec 27, 2022 — CN 202211689670.X +1 more
Examiner
CHIEN, LUCY P
Art Unit
Tech Center
Assignee
TCL Technology Group Corporation
OA Round
1 (Non-Final)
83%
Grant Probability
Favorable
1-2
OA Rounds
9m
Est. Remaining
88%
With Interview

Examiner Intelligence

Grants 83% — above average
83%
Career Allowance Rate
773 granted / 932 resolved
+22.9% vs TC avg
Moderate +6% lift
Without
With
+5.5%
Interview Lift
resolved cases with interview
Typical timeline
2y 7m
Avg Prosecution
25 currently pending
Career history
945
Total Applications
across all art units

Statute-Specific Performance

§103
57.4%
+17.4% vs TC avg
§102
32.1%
-7.9% vs TC avg
§112
1.3%
-38.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 932 resolved cases

Office Action

§DOUBLEPATENT
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Double Patenting The nonstatutory double patenting rejection is based on a judicially created doctrine grounded in public policy (a policy reflected in the statute) so as to prevent the unjustified or improper timewise extension of the “right to exclude” granted by a patent and to prevent possible harassment by multiple assignees. A nonstatutory double patenting rejection is appropriate where the conflicting claims are not identical, but at least one examined application claim is not patentably distinct from the reference claim(s) because the examined application claim is either anticipated by, or would have been obvious over, the reference claim(s). See, e.g., In re Berg, 140 F.3d 1428, 46 USPQ2d 1226 (Fed. Cir. 1998); In re Goodman, 11 F.3d 1046, 29 USPQ2d 2010 (Fed. Cir. 1993); In re Longi, 759 F.2d 887, 225 USPQ 645 (Fed. Cir. 1985); In re Van Ornum, 686 F.2d 937, 214 USPQ 761 (CCPA 1982); In re Vogel, 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Thorington, 418 F.2d 528, 163 USPQ 644 (CCPA 1969). A timely filed terminal disclaimer in compliance with 37 CFR 1.321(c) or 1.321(d) may be used to overcome an actual or provisional rejection based on nonstatutory double patenting provided the reference application or patent either is shown to be commonly owned with the examined application, or claims an invention made as a result of activities undertaken within the scope of a joint research agreement. See MPEP § 717.02 for applications subject to examination under the first inventor to file provisions of the AIA as explained in MPEP § 2159. See MPEP § 2146 et seq. for applications not subject to examination under the first inventor to file provisions of the AIA . A terminal disclaimer must be signed in compliance with 37 CFR 1.321(b). The filing of a terminal disclaimer by itself is not a complete reply to a nonstatutory double patenting (NSDP) rejection. A complete reply requires that the terminal disclaimer be accompanied by a reply requesting reconsideration of the prior Office action. Even where the NSDP rejection is provisional the reply must be complete. See MPEP § 804, subsection I.B.1. For a reply to a non-final Office action, see 37 CFR 1.111(a). For a reply to final Office action, see 37 CFR 1.113(c). A request for reconsideration while not provided for in 37 CFR 1.113(c) may be filed after final for consideration. See MPEP §§ 706.07(e) and 714.13. The USPTO Internet website contains terminal disclaimer forms which may be used. Please visit www.uspto.gov/patent/patents-forms. The actual filing date of the application in which the form is filed determines what form (e.g., PTO/SB/25, PTO/SB/26, PTO/AIA /25, or PTO/AIA /26) should be used. A web-based eTerminal Disclaimer may be filled out completely online using web-screens. An eTerminal Disclaimer that meets all requirements is auto-processed and approved immediately upon submission. For more information about eTerminal Disclaimers, refer to www.uspto.gov/patents/apply/applying-online/eterminal-disclaimer. Claim 1-17 is rejected on the ground of nonstatutory double patenting as being unpatentable over claim 3-17 of U.S. Patent No. 12204214 B2. Although the claims at issue are not identical, they are not patentably distinct from each other because. Claim 1 is anticipated by Claim 3 of U.S. Patent No. 12204214 B2. Claim 2 is anticipated by Claim 3 of U.S. Patent No. 12204214 B2. Claim 3 is anticipated by Claim 3 of U.S. Patent No. 12204214 B2. Claim 4 is anticipated by Claim 3 of U.S. Patent No. 12204214 B2. Claim 5 is anticipated by Claim 3 and 5 of U.S. Patent No. 12204214 B2. Claim 6 is anticipated by Claim 3 and 6 of U.S. Patent No. 12204214 B2. Claim 7 is anticipated by Claim 3 and 8 and 9 of U.S. Patent No. 12204214 B2. Claim 8 is anticipated by Claim 4 and 5 of U.S. Patent No. 12204214 B2. Claim 9 is anticipated by Claim 5 of U.S. Patent No. 12204214 B2. Claim 10 is anticipated by Claim 12 of U.S. Patent No. 12204214 B2. Claim 11 is anticipated by Claim 12 of U.S. Patent No. 12204214 B2. Claim 12 is anticipated by Claim 12 of U.S. Patent No. 12204214 B2. Claim 13 is anticipated by Claim 12 of U.S. Patent No. 12204214 B2. Claim 14 is anticipated by Claim 12 and 14 of U.S. Patent No. 12204214 B2. Claim 15 is anticipated by Claim 12 and 15 of U.S. Patent No. 12204214 B2. Claim 16 is anticipated by Claim 12 and 17 of U.S. Patent No. 12204214 B2. Claim 17 is anticipated by Claim 12,17,18 of U.S. Patent No. 12204214 B2. Allowable Subject Matter Claim 1-17 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Regarding Claim 1, Yang et al (US 12204213 B2) discloses (Fig. 2,3a,3b) An array substrate, comprising: a base substrate (10); a first metal layer (M1) disposed on one side of the base substrate; a second metal layer (M2) disposed at one side of the first metal layer away from the base substrate, the second metal layer comprising a plurality of data lines (DL); and a pixel electrode (P) layer disposed at one side of the second metal layer away from the first metal layer, the pixel electrode layer comprising a plurality of pixel electrodes (PV1 including P); wherein the array substrate further comprises a plurality of shielding electrodes (22,23); wherein each of the shielding electrodes (22,23) is at least disposed between one of the data lines (DL) and one of the pixel electrodes (P). The prior art does not disclose nor would it be obvious to one of ordinary skill in the art to disclose wherein each of the shielding electrodes is at least disposed between one of the data lines and one of the pixel electrodes in an area corresponding to gaps between the adjacent pixel electrodes, the adjacent shielding electrodes are partially connected in some areas, and the adjacent shielding electrodes are disconnected in some areas, orthogonal projections of the shielding electrodes projected on the base substrate partially overlap with orthogonal projections of the pixel electrodes projected on the base substrate. Claims 2-7 depends on Claim 1, therefore are allowable. Regarding Claim 8, Lin et al (US 11467455) discloses (Fig. 2a-2b) An array substrate, comprising: a base substrate (100); a first metal layer (110) disposed on one side of the base substrate; a second metal layer (140) disposed on one side of the first metal layer away from the base substrate, the second metal layer comprising a plurality of data lines (142); and a pixel electrode layer (190) disposed on one side of the second metal layer away from the first metal layer, the pixel electrode layer comprising a plurality of pixel electrodes (190); wherein the array substrate further comprises a plurality of shielding electrodes (170); wherein each of the shielding electrodes (170) is at least disposed between one of the data lines (142) and one of the pixel electrodes (190), the shielding electrodes (170) are arranged corresponding to the pixel electrodes (190) respectively. The prior art does not disclose nor would it be obvious to one of ordinary skill in the art to disclose wherein the adjacent shielding electrodes arranged corresponding to the adjacent pixel electrodes are electrically insulated from each other; along a direction perpendicular to a direction of the data line, a widest width of an orthogonal projection of the shielding electrode projected on the base substrate is less than a shortest width of an orthogonal projection of the pixel electrode projected on the base substrate. Claims 9 depends on Claim 8, therefore are allowable. Regarding Claim 10, Yang et al (US 12204213 B2) discloses (Fig. 2,3a,3b) A liquid crystal display panel, comprising: an array substrate (100), a color filter substrate (160), and a liquid crystal layer (LC) disposed between the array substrate and the color filter substrate, wherein the array substrate comprises: a base substrate (100); a first metal layer (110) disposed on one side of the base substrate; a second metal layer (140) disposed at one side of the first metal layer away from the base substrate, the second metal layer comprising a plurality of data lines (142); and a pixel electrode layer (190) disposed at one side of the second metal layer away from the first metal layer, the pixel electrode layer (190) comprising a plurality of pixel electrodes (190); wherein the array substrate further comprises a plurality of shielding electrodes (170). The prior art does not disclose nor would it be obvious to one of ordinary skill in the art to disclose wherein each of the shielding electrodes is at least disposed between one of the data lines and one of the pixel electrodes, in an area corresponding to gaps between the adjacent pixel electrodes, the adjacent shielding electrodes are partially connected in some areas, and the adjacent shielding electrodes are disconnected in some areas, orthogonal projections of the shielding electrodes projected on the base substrate partially overlap with orthogonal projections of the pixel electrodes projected on the base substrate . Claims 11-17 depends on Claim 10, therefore are allowable. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to LUCY P CHIEN whose telephone number is (571)272-8579. The examiner can normally be reached 9AM-5PM PST M-F. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Michael Caley can be reached at 571-272-2286. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /LUCY P CHIEN/Primary Examiner, Art Unit 2871
Read full office action

Prosecution Timeline

Dec 15, 2024
Application Filed
Aug 21, 2026
Non-Final Rejection mailed — §DOUBLEPATENT (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
83%
Grant Probability
88%
With Interview (+5.5%)
2y 7m (~9m remaining)
Median Time to Grant
Low
PTA Risk
Based on 932 resolved cases by this examiner. Grant probability derived from career allowance rate.

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