Prosecution Insights
Last updated: August 17, 2026
Application No. 19/005,640

BACKLIGHT PANEL

Final Rejection §102§103
Filed
Dec 30, 2024
Examiner
TAYLOR, APRIL ALICIA
Art Unit
2876
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Industrial Technology Research Institute
OA Round
2 (Final)
79%
Grant Probability
Favorable
3-4
OA Rounds
10m
Est. Remaining
87%
With Interview

Examiner Intelligence

Grants 79% — above average
79%
Career Allowance Rate
552 granted / 701 resolved
+10.7% vs TC avg
Moderate +9% lift
Without
With
+8.6%
Interview Lift
resolved cases with interview
Typical timeline
2y 6m
Avg Prosecution
21 currently pending
Career history
721
Total Applications
across all art units

Statute-Specific Performance

§101
5.2%
-34.8% vs TC avg
§103
32.8%
-7.2% vs TC avg
§102
29.4%
-10.6% vs TC avg
§112
13.2%
-26.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 701 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . This office action is responsive to the amendment filed 04/23/2026. Claim Status Claim 1 is currently amended Claims 2-13 have been presented in original form. Claims 1-13 are currently pending in the application. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim(s) 1-3, 5, 8, and 12-13 is/are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Shiau et al. (US 2026/0110832 A1) (hereinafter referred to as Shiau). Regarding claim 1, Shiau discloses a backlight panel (para. 0003), comprising: a substrate (110); a plurality of first structures (111) disposed on a surface (S1) of the substrate (110); and a plurality of second structures (112) disposed on the surface (S1) of the substrate (110), and between the plurality of first structures (111), wherein the plurality of second structures (112) have a different profile from the plurality of first structures (111), wherein the plurality of first structures (111) and the plurality of second structures (112) are protruding structures. (See figs. 6A-6B; and paras. 0049-0051) Regarding claim 2, Shiau further discloses the backlight panel according to claim 1, wherein one of the plurality of second structures (112) is surrounded by an even number of the plurality of first structures (111) (figs. 6A-6B). Regarding claim 3, Shiau further discloses the backlight panel according to claim 2, wherein the plurality of first structures (111) surrounding the one of the plurality of second structures (112) are mirror-arranged along a symmetry plane, and the symmetry plane passes through the one of the plurality of second structures (see figs. 6A-6B). Regarding claim 5, Shiau further discloses the backlight panel according to claim 2, wherein the plurality of first structures (111) surrounding the one of the plurality of second structures (112) comprises a first unit component and a second unit component, wherein a first distance between the first unit component and the one of the plurality of second structures is shorter than a second distance between the second unit component and the one of the plurality of second structures (see figs. 6A-6B). Regarding claim 8, Shiau further discloses the backlight panel according to claim 1, wherein the plurality of first structures (111) are arranged in at least two columns, and the plurality of second structures (112) are located between the at least two columns (figs. 6A-6B shows a plurality of structures (111, 112) arranged in columns). Regarding claims 12 and 13, Shiau further discloses wherein one of the plurality of second structures (112) has a bottom surface and a curved surface connected to the bottom surface; and wherein the plurality of second structures (112) are an arc-shaped structure (see figs. 6A-6B). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 4, 6-7, and 9-11 is/are rejected under 35 U.S.C. 103 as being unpatentable over Shiau. Regarding claim 4, Shiau discloses the claimed invention except for wherein an angle between the symmetry plane and a connection line between the one of the plurality of second structures and one of the plurality of first structures surrounding the one of the plurality of second structures is between 35 degrees and 55 degrees. However, it would have been obvious to one having ordinary skill in the art before the effective filing date of the invention to select an angle between 35 degrees and 55 degrees, since it has been held that where the general conditions of a claim are disclosed in the prior art, discovering the optimum or workable ranges involves routine skill in the art. In re Aller, 105 USPQ 233. Regarding claims 6 and 7, Shiau discloses the claim invention except for wherein the first distance is between 20 micrometers and 35 micrometers; and wherein the second distance is between 31 micrometers and 46 micrometers. However, it would have been obvious to one having ordinary skill in the art before the effective filing date of the invention to select a first distance between 20 micrometers and 35 micrometers and a second distance between 31 micrometers and 46 micrometers, since it has been held that where the general conditions of a claim are disclosed in the prior art, discovering the optimum or workable ranges involves routine skill in the art. In re Aller, 105 USPQ 233. Regarding claim 9, Shiau discloses the claimed invention except for wherein a structure quantity ratio of the plurality of first structures to the plurality of second structures is between 6:1 and 10:1. However, it would have been obvious to one having ordinary skill in the art before the effective filing date of the invention to select a structure quantity ratio of the plurality of first structures to the plurality of second structures is between 6:1 and 10:1, since it has been held that where the general conditions of a claim are disclosed in the prior art, discovering the optimum or workable ranges involves routine skill in the art. In re Aller, 105 USPQ 233. Regarding claim 10, Shiau discloses the claimed invention except for wherein an angle between a bottom surface and an inclined surface connected to the bottom surface of one of the plurality of first structures is between 20 degrees and 90 degrees. However, it would have been obvious to one having ordinary skill in the art before the effective filing date of the invention to select an angle between 20 degrees and 90 degrees, since it has been held that where the general conditions of a claim are disclosed in the prior art, discovering the optimum or workable ranges involves routine skill in the art. In re Aller, 105 USPQ 233. Regarding claim 11, Shiau discloses wherein the plurality of first structures are a ridge-shaped structure (see fig. 4C-4D and 6A-6B). Response to Arguments Applicant’s arguments with respect to claim(s) 1 have been considered but are moot because the new ground of rejection does not rely on any reference applied in the prior rejection of record for any teaching or matter specifically challenged in the argument. Conclusion Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to APRIL A TAYLOR whose telephone number is (571)272-2403. The examiner can normally be reached Monday-Friday between 9am-6pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, STEVEN S PAIK can be reached at 571-272-2404. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /APRIL A TAYLOR/Examiner, Art Unit 2876 /THIEN M LE/Primary Examiner, Art Unit 2876
Read full office action

Prosecution Timeline

Dec 30, 2024
Application Filed
Jan 06, 2026
Non-Final Rejection mailed — §102, §103
Mar 31, 2026
Examiner Interview Summary
Mar 31, 2026
Applicant Interview (Telephonic)
Apr 23, 2026
Response Filed
Jul 20, 2026
Final Rejection mailed — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
79%
Grant Probability
87%
With Interview (+8.6%)
2y 6m (~10m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 701 resolved cases by this examiner. Grant probability derived from career allowance rate.

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