Prosecution Insights
Last updated: April 19, 2026
Application No. 19/029,082

USE OF A LOW BANDGAP ABSORBER REGION IN A LASER POWER CONVERTER

Non-Final OA §DP
Filed
Jan 17, 2025
Examiner
BUCK, LINDSEY A
Art Unit
1728
Tech Center
1700 — Chemical & Materials Engineering
Assignee
The Boeing Company
OA Round
1 (Non-Final)
49%
Grant Probability
Moderate
1-2
OA Rounds
3y 4m
To Grant
82%
With Interview

Examiner Intelligence

Grants 49% of resolved cases
49%
Career Allow Rate
332 granted / 679 resolved
-16.1% vs TC avg
Strong +34% interview lift
Without
With
+33.5%
Interview Lift
resolved cases with interview
Typical timeline
3y 4m
Avg Prosecution
40 currently pending
Career history
719
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
42.2%
+2.2% vs TC avg
§102
25.5%
-14.5% vs TC avg
§112
24.8%
-15.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 679 resolved cases

Office Action

§DP
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Double Patenting The nonstatutory double patenting rejection is based on a judicially created doctrine grounded in public policy (a policy reflected in the statute) so as to prevent the unjustified or improper timewise extension of the “right to exclude” granted by a patent and to prevent possible harassment by multiple assignees. A nonstatutory double patenting rejection is appropriate where the conflicting claims are not identical, but at least one examined application claim is not patentably distinct from the reference claim(s) because the examined application claim is either anticipated by, or would have been obvious over, the reference claim(s). See, e.g., In re Berg, 140 F.3d 1428, 46 USPQ2d 1226 (Fed. Cir. 1998); In re Goodman, 11 F.3d 1046, 29 USPQ2d 2010 (Fed. Cir. 1993); In re Longi, 759 F.2d 887, 225 USPQ 645 (Fed. Cir. 1985); In re Van Ornum, 686 F.2d 937, 214 USPQ 761 (CCPA 1982); In re Vogel, 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Thorington, 418 F.2d 528, 163 USPQ 644 (CCPA 1969). A timely filed terminal disclaimer in compliance with 37 CFR 1.321(c) or 1.321(d) may be used to overcome an actual or provisional rejection based on nonstatutory double patenting provided the reference application or patent either is shown to be commonly owned with the examined application, or claims an invention made as a result of activities undertaken within the scope of a joint research agreement. See MPEP § 717.02 for applications subject to examination under the first inventor to file provisions of the AIA as explained in MPEP § 2159. See MPEP § 2146 et seq. for applications not subject to examination under the first inventor to file provisions of the AIA . A terminal disclaimer must be signed in compliance with 37 CFR 1.321(b). The filing of a terminal disclaimer by itself is not a complete reply to a nonstatutory double patenting (NSDP) rejection. A complete reply requires that the terminal disclaimer be accompanied by a reply requesting reconsideration of the prior Office action. Even where the NSDP rejection is provisional the reply must be complete. See MPEP § 804, subsection I.B.1. For a reply to a non-final Office action, see 37 CFR 1.111(a). For a reply to final Office action, see 37 CFR 1.113(c). A request for reconsideration while not provided for in 37 CFR 1.113(c) may be filed after final for consideration. See MPEP §§ 706.07(e) and 714.13. The USPTO Internet website contains terminal disclaimer forms which may be used. Please visit www.uspto.gov/patent/patents-forms. The actual filing date of the application in which the form is filed determines what form (e.g., PTO/SB/25, PTO/SB/26, PTO/AIA /25, or PTO/AIA /26) should be used. A web-based eTerminal Disclaimer may be filled out completely online using web-screens. An eTerminal Disclaimer that meets all requirements is auto-processed and approved immediately upon submission. For more information about eTerminal Disclaimers, refer to www.uspto.gov/patents/apply/applying-online/eterminal-disclaimer. Claims 2-21 are rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1-23 of U.S. Patent No. 12,249,666. Although the claims at issue are not identical, they are not patentably distinct from each other because claims 1-23 of U.S. Patent No. 12,249,666 contain all of the limitations of instant claims 2-21 including a device and method comprising a laser power converter (LPC) comprising a plurality of subcells on a substrate, the plurality of subcells including a top subcell and a bottom subcell, wherein: at least one subcell of the plurality of subcells has an emitter and a base with a low bandgap absorber region (LBAR) coupled between the emitter and the base; the emitter and the base include AIGaAs with an Al content higher than a mole fraction of 10%, with a first bandgap higher than 1.55 eV and corresponding to a wavelength longer than a wavelength of incident laser light, such that the emitter and the base are transparent to the incident laser light; the wavelength of the incident laser light is between 808 nm and 1500 nm; the LBAR comprises Ga(In)As with a second bandgap lower than the first bandgap, such that the LBAR absorbs the incident laser light and generates current in response to the incident laser light; and a current generated between the top subcell and the bottom subcell is controlled based on a thickness of the LBAR, such that the LBAR is configured to balance the current generated between the top subcell and the bottom subcell. Allowable Subject Matter Claims 2-21 would be allowable if the double patenting rejection above was overcome. The following is a statement of reasons for the indication of allowable subject matter: The closest prior art is King et al. (US 2012/0240987), Fetzer et al. (US 2007/0137695) and Derkacs et al. (US 2017/0092800). King discloses a device and method in Figure 6, comprising: a plurality of subcells including top and bottom subcells (See 2-junction cell in [207] and [214]) on a substrate (growth substrate, [131] and Figure 6); at least one of the subcells having an emitter (622) and base (624), with a low bandgap absorber region (LBAR) (640) coupled between the emitter (622) and base (624) (Figure 6 and [177]-[178]); the emitter (622) and base are (624) comprised of a first material with a first bandgap ([179], [164] and [97]); the low bandgap absorber region (640) is comprised of a second material with a second bandgap lower than the first bandgap of the emitter (622) and base (624) ([38]-[42], [118], [151]), wherein the second material is Ga(In)As ([164] and [97]). Fetzer discloses a device and method in Figure 3, comprising: a plurality of subcells (subcells shown in Figure 3) on a substrate (310) including top and bottom subcells (Figure 3 and [54]); at least one of the subcells having an emitter (303) and base (308), with a low bandgap absorber region (LBAR) (depletion region including layers 304, 306) coupled between the emitter (303) and base (308) (Figure 3 and [37]-[38]); the emitter (303) and base (308) are comprised of a first material with a first bandgap ([38] and [40]); wherein the first material is AlGaAs ([38] and [40]); the low bandgap absorber region (304, 306) is comprised of a second material with a second bandgap lower than the first bandgap of the emitter (303) and base (308) ([38] and [40]); wherein the second material is Ga(In)As ([40]). Derkacs discloses a multijunction solar cell in Figure 1 comprising a subcell (cell B) having an emitter (111) and a base (112) comprising AlGaAs (Figure 1) that has an Al content higher than a mole fraction of 10% ([113]), and a bandgap higher than 1.55 eV ([19] and [54], second subcell has a bandgap of 1.73 eV). None of the prior art, alone or in combination, discloses, suggests or renders obvious a device or method comprising a laser power converter (LPC), wherein the emitter and the base correspond to a wavelength longer than a wavelength of incident laser light, such that the emitter and the base are transparent to the incident laser light; the wavelength of the incident laser light is between 808 nm and 1500 nm; wherein the LBAR absorbs the incident laser light and generates current in response to the incident laser light; and a current generated between the top subcell and the bottom subcell is controlled based on a thickness of the LBAR, such that the LBAR is configured to balance the current generated between the top subcell and the bottom subcell in combination with the other claim limitations. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to LINDSEY A BUCK whose telephone number is (571)270-1234. The examiner can normally be reached Monday-Friday 9am-5:30pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Matthew Martin can be reached at (571)270-7871. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /LINDSEY A BUCK/Primary Examiner, Art Unit 1728
Read full office action

Prosecution Timeline

Jan 17, 2025
Application Filed
Feb 17, 2026
Non-Final Rejection — §DP (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
49%
Grant Probability
82%
With Interview (+33.5%)
3y 4m
Median Time to Grant
Low
PTA Risk
Based on 679 resolved cases by this examiner. Grant probability derived from career allow rate.

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