Prosecution Insights
Last updated: October 23, 2026
Application No. 19/035,415

METHOD FOR MANUFACTURING MAGNETIC SENSOR AND MAGNETIC SENSOR

Non-Final OA §103§112
Filed
Jan 23, 2025
Priority
Feb 21, 2024 — JP 2024-024599
Examiner
ANDREWS, BRENT J
Art Unit
2858
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
TDK Corporation
OA Round
1 (Non-Final)
78%
Grant Probability
Favorable
1-2
OA Rounds
1y 5m
Est. Remaining
99%
With Interview

Examiner Intelligence

Grants 78% — above average
78%
Career Allowance Rate
249 granted / 319 resolved
+10.1% vs TC avg
Strong +28% interview lift
Without
With
+28.5%
Interview Lift
resolved cases with interview
Typical timeline
3y 1m
Avg Prosecution
8 currently pending
Career history
340
Total Applications
across all art units

Statute-Specific Performance

§101
1.7%
-38.3% vs TC avg
§103
60.3%
+20.3% vs TC avg
§102
22.4%
-17.6% vs TC avg
§112
13.0%
-27.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 319 resolved cases

Office Action

§103 §112
DETAILED ACTION The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Information Disclosure Statement The information disclosure statement (IDS) submitted 01/23/2025 and 09/25/2025 are in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statement has been considered by the examiner. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claims 1-17 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Claim 1 recites the limitation “approximately parallel " in line 3 and 8 “approximately perpendicular" in line 4 and “approximately equal angles" in line 14. It‘s not clear how much deviation from parallel or perpendicular or equal is permitted by the term approximately. Claims 2-14 inherit the same deficiency due to dependency on claim 1. Claim 15 recites the limitation “approximately perpendicular" in line 5. It‘s not clear how much deviation from perpendicular is permitted by the term approximately. Claims 16-17 inherit the same deficiency due to dependency on claim 15. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102 of this title, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim 15 is rejected under 35 U.S.C. 103(a) as being unpatentable over CHEN et al. (US 20140176132 A1) in view of YAMAZAKI et al. (US 20140292321 A1). PNG media_image1.png 684 846 media_image1.png Greyscale PNG media_image2.png 768 880 media_image2.png Greyscale Regarding claim 15, CHEN teaches a magnetic sensor (Fig. 4 shows two-axis magnetic field sensor 250), comprising: a first magnetic field sensing element that includes a magnetic field sensing axis parallel to a first direction (Fig. 4 item 250A shows X-Axis Sensor 250a is sensitive to magnetic fields in the X-axis Paragraph [0040]-[0041]); a second magnetic field sensing element that includes a magnetic field sensing axis parallel to a second direction approximately perpendicular to the first direction (Fig. 4 item 250B shows Y-Axis Sensor 250b is sensitive to magnetic fields in the Y-axis; Paragraph [0040]-[0041]); and a substrate that supports the first magnetic field sensing element and the second magnetic field sensing element (Fig. 1A & 4 item 90 illustrates a top-view of a two-axis magnetic field sensor 250 disposed on a single substrate or separate substrates Paragraph [0025 & 0040]); wherein: the first magnetic field sensing element includes a first magnetization free layer in which magnetization direction is caused to rotate by an external magnetic field (Fig. 1A & 4 shows X-axis sensor 250a comprises first and second free magnetization fields 118a, 118b which rotate in the plane when an external magnetic field is applied Paragraph [0033]), a first magnetization fixed layer in which magnetization direction is fixed in the first direction (Fig. 1A & 4 shows X-axis sensor 250a comprises pinned layers 114a, 114b which is fixed in a bisection direction 350 Paragraph [0041]), a nonmagnetic first spacer layer located between the first magnetization free layer and the first magnetization fixed layer (Fig. 1A & 4 shows X-axis sensors 250a comprises a first tunneling layer 115a, 115b formed of non-magnetic material Paragraph [0027], [0028]), and the second magnetic field sensing element includes a second magnetization free layer in which magnetization direction is caused to rotate by an external magnetic field (Fig. 1A & 4 shows Y-axis sensor 250b comprises first and second free magnetization fields 218a, 218b which rotate in the plane when an external magnetic field is applied Paragraph [0033]), a second magnetization fixed layer in which magnetization direction is fixed in the second direction (Fig. 1A & 4 shows Y-axis sensor 250b comprises pinned layers 214a, 214b which is fixed in a bisection direction 350 Paragraph [0041]), a nonmagnetic second spacer layer located between the second magnetization free layer and the second magnetization fixed layer (Fig. 1A & 4 shows Y-axis sensors 250b comprises a second tunneling layer 215a, 215b formed of non-magnetic material Paragraph [0027], [0028]), and CHEN does not explicitly teach two first magnet layers that are arranged in the second direction and that sandwich the first magnetization free layer in the second direction; two second magnet layers that are arranged in the first direction and that sandwich the second magnetization free layer in the first direction. PNG media_image3.png 700 862 media_image3.png Greyscale However, YAMAZAKI teaches two first magnet layers that (Fig.2 shows magnets 21 and 22 are placed on the substrate 2 and are both in contact with the MR element 10 Paragraph [0028[) are arranged in the second direction and that sandwich the first magnetization free layer (Fig.2 shows the MR element 10 Paragraph [0028[)]) in the second direction; two second magnet layers that are arranged in the first direction (Fig.2 shows magnets 21 and 22 are placed on the substrate 2 and are both in contact with the MR element 10 Paragraph [0028[) and that sandwich the second magnetization free layer (Fig.2 shows the MR element 10 Paragraph [0028[)]) in the first direction. It would have been obvious to one with ordinary skill, in the art before the effective filing date of the claimed invention, to modify a differential magnetic sensor with first and second sensing elements in CHEN, by substituting a GMR sensor with free layer sandwiched between magnet layers by YAMAZAKI to apparently improve the magnetic detection sensitivity of the magnetic sensor in Paragraph [0012 & 0030]). Allowable Subject Matter Claims 1-14 would be allowed if the relative terms “approximately” are deleted from claim 1. No art was found for claims 1-14. Claims 16-17 are objected to as being dependent upon a rejected base claim but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to BRENT J ANDREWS whose telephone number is (571)272-6101. The examiner can normally be reached 10am-5pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Judy Nguyen can be reached at (571)272-2258. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /BRENT J ANDREWS/ Examiner, Art Unit 2858 /STEVEN L YENINAS/ Primary Examiner, Art Unit 2858
Read full office action

Prosecution Timeline

Jan 23, 2025
Application Filed
Oct 16, 2026
Non-Final Rejection mailed — §103, §112 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
78%
Grant Probability
99%
With Interview (+28.5%)
3y 1m (~1y 5m remaining)
Median Time to Grant
Low
PTA Risk
Based on 319 resolved cases by this examiner. Grant probability derived from career allowance rate.

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