Prosecution Insights
Last updated: July 17, 2026
Application No. 19/175,473

SYSTEMS AND METHODS FOR PRODUCING ULTRA-HIGH DC VOLTAGES IN OPEN FIELD LINE TRAPS WITH MINIMAL DISSIPATION AND MINIMAL DAMAGE

Non-Final OA §102§112
Filed
Apr 10, 2025
Priority
Apr 10, 2024 — provisional 63/632,068
Examiner
PHAM, THAI N
Art Unit
Tech Center
Assignee
The Trustees of Princeton University
OA Round
1 (Non-Final)
78%
Grant Probability
Favorable
1-2
OA Rounds
10m
Est. Remaining
98%
With Interview

Examiner Intelligence

Grants 78% — above average
78%
Career Allowance Rate
723 granted / 928 resolved
+17.9% vs TC avg
Strong +20% interview lift
Without
With
+20.3%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 1m
Avg Prosecution
28 currently pending
Career history
945
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
74.8%
+34.8% vs TC avg
§102
8.8%
-31.2% vs TC avg
§112
9.7%
-30.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 928 resolved cases

Office Action

§102 §112
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Information Disclosure Statement The information disclosure statements (IDSs) submitted on 05/12/2025 is in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statements have been considered by the examiner. Drawings The drawings are objected to under 37 CFR 1.83(a). The drawings must show every feature of the invention specified in the claims. Therefore, the limitation recites “generating, within a plasma device having at least one outer boundary that defines walls, at least one magnetic field including an axially directed magnetic field in an open field line configuration” in claim 1, the limitation recites “wherein the at least one electric field have a component parallel to magnetic field lines such that the at least one electric field is larger in an interior region of the plasma and substantially reduced near the walls of the plasma device” in claim 2, the limitation recites “wherein the at least one magnetic field is configured to have a plurality of magnetic field lines shaped into conducting wall regions which act as electrodes separated by insulators” in claim 8, the limitation recites “wherein the at least one magnetic field comprises a diverging nozzle geometry” in claim 13, and the limitation recites ““a magnetic field source configured to generate at least one magnetic field including an axially directed magnetic field in an open field line configuration, wherein the axial-directed magnetic field is configured to confine a plasma in a direction perpendicular to the magnetic field; and an electric field source configured to generate steady-state electric fields parallel to magnetic field lines produced by the magnetic field source such that the electric fields are larger in an interior region of the plasma and substantially reduced in boundary regions of the plasma” in claim 14 must be shown or the feature(s) canceled from the claim(s). No new matter should be entered. Corrected drawing sheets in compliance with 37 CFR 1.121(d) are required in reply to the Office action to avoid abandonment of the application. Any amended replacement drawing sheet should include all of the figures appearing on the immediate prior version of the sheet, even if only one figure is being amended. The figure or figure number of an amended drawing should not be labeled as “amended.” If a drawing figure is to be canceled, the appropriate figure must be removed from the replacement sheet, and where necessary, the remaining figures must be renumbered and appropriate changes made to the brief description of the several views of the drawings for consistency. Additional replacement sheets may be necessary to show the renumbering of the remaining figures. Each drawing sheet submitted after the filing date of an application must be labeled in the top margin as either “Replacement Sheet” or “New Sheet” pursuant to 37 CFR 1.121(d). If the changes are not accepted by the examiner, the applicant will be notified and informed of any required corrective action in the next Office action. The objection to the drawings will not be held in abeyance. The drawings are also objected to under 37 CFR 1.83(a) because they fail to show “the system may include a magnetic field. A magnetic field source may be configured to generate at least one magnetic field including an axially directed magnetic field in an open field line configuration. The axially directed magnetic field may be configured to confine a plasma in a direction perpendicular to the magnetic field. The system may also include an electric field source. The electric field source may be configured to generate a steady-state electric field parallel to magnetic field lines produced by the magnetic field source such that the steady-state electric field is larger in an interior region of the plasma and substantially reduced in boundary regions of the plasma” in claim 14 as described in the specification. Any structural detail that is essential for a proper understanding of the disclosed invention should be shown in the drawing. MPEP § 608.02(d). Corrected drawing sheets in compliance with 37 CFR 1.121(d) are required in reply to the Office action to avoid abandonment of the application. Any amended replacement drawing sheet should include all of the figures appearing on the immediate prior version of the sheet, even if only one figure is being amended. The figure or figure number of an amended drawing should not be labeled as “amended.” If a drawing figure is to be canceled, the appropriate figure must be removed from the replacement sheet, and where necessary, the remaining figures must be renumbered and appropriate changes made to the brief description of the several views of the drawings for consistency. Additional replacement sheets may be necessary to show the renumbering of the remaining figures. Each drawing sheet submitted after the filing date of an application must be labeled in the top margin as either “Replacement Sheet” or “New Sheet” pursuant to 37 CFR 1.121(d). If the changes are not accepted by the examiner, the applicant will be notified and informed of any required corrective action in the next Office action. The objection to the drawings will not be held in abeyance. Claim Rejections - 35 USC § 112 The following is a quotation of the first paragraph of 35 U.S.C. 112(a): (a) IN GENERAL.—The specification shall contain a written description of the invention, and of the manner and process of making and using it, in such full, clear, concise, and exact terms as to enable any person skilled in the art to which it pertains, or with which it is most nearly connected, to make and use the same, and shall set forth the best mode contemplated by the inventor or joint inventor of carrying out the invention. The following is a quotation of the first paragraph of pre-AIA 35 U.S.C. 112: The specification shall contain a written description of the invention, and of the manner and process of making and using it, in such full, clear, concise, and exact terms as to enable any person skilled in the art to which it pertains, or with which it is most nearly connected, to make and use the same, and shall set forth the best mode contemplated by the inventor of carrying out his invention. Claims 1-14 are rejected under 35 U.S.C. 112(a) or 35 U.S.C. 112 (pre-AIA ), first paragraph, as failing to comply with the written description requirement. The claim(s) contains subject matter which was not described in the specification in such a way as to reasonably convey to one skilled in the relevant art that the inventor or a joint inventor, or for applications subject to pre-AIA 35 U.S.C. 112, the inventor(s), at the time the application was filed, had possession of the claimed invention. The specification, paragraph [0017], discloses "the system may include a magnetic field source. The magnetic field source may be configured to generate at least one magnetic field including an axially directed magnetic field in an open field line configuration. The axially directed magnetic field may be configured to confine a plasma in a direction perpendicular to the magnetic field. The system may also include an electric field source. The electric field source may be configured to generate a steady-state electric field parallel to magnetic field lines produced by the magnetic field source such that the steady-state electric field is larger in an interior region of the plasma and substantially reduced in boundary regions of the plasma." However, applicant does not describe or explain with the adequate support of “how the magnetic field source may be configured to generate at least one magnetic field including an axially directed magnetic field in an open field line configuration. The axially directed magnetic field may be configured to confine a plasma in a direction perpendicular to the magnetic field. And how does the electric field source may be configured to generate a steady-state electric field parallel to magnetic field lines produced by the magnetic field source such that the steady-state electric field is larger in an interior region of the plasma and substantially reduced in boundary regions of the plasma.” However, the magnetic field source, the electric field source, an outer boundary that defines walls, Furthermore, there are not any drawings shown the how the system work. There is only a flowchart of figure 1 show the method claim. Furthermore, the specification must include a written description of the invention or discovery and of the manner and process of making and using the same, and is required to be in such full, clear, concise, and exact terms as to enable any person skilled in the art or science to which the invention or discovery appertains, or with which it is most nearly connected, to make and use the same (see 37 CFR 1.71). The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claims 1-13 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Regarding claim 1, the limitation recites “generating, within a plasma device having at least one outer boundary that defines walls, at least one magnetic field including an axially directed magnetic field in an open field line configuration,” and the limitation recites “generating at least one electric field within the plasma device” are unclear and leaves the reader in doubt as to the meaning of the technical feature to which it refers. It is unclear that how does it generate at least one magnetic field including an axially directed magnetic field in an open field line configuration? And how does it generate at least one electric field within the plasma device? Regarding claim 3, the limitation recites “reducing electric field strength near the walls by increasing resistivity of the plasma” is unclear and leaves the reader in doubt as to the meaning of the technical feature to which it refers. It is unclear that where does resistivity of the plasma coming from? And how does it reduce electric field strength near the walls by increasing resistivity of the plasma? Regarding claim 4, the limitation recites “introducing a cold plasma between the walls and the plasma” is unclear and leaves the reader in doubt as to the meaning of the technical feature to which it refers. It is unclear that how does it introduce a cold plasma between the walls and the plasma? Regarding claim 5, the limitation recites “introducing radiating impurities into the cold plasma” is unclear and leaves the reader in doubt as to the meaning of the technical feature to which it refers. It is unclear that how does it introduce radiating impurities into the cold plasma? Regarding claim 6, the limitation recites “modifying a geometry of magnetic field lines such that the magnetic field lines spread before contacting the walls” is unclear and leaves the reader in doubt as to the meaning of the technical feature to which it refers. It is unclear that how does it modify a geometry of magnetic field lines such that the magnetic field lines spread before contacting the walls? Regarding claim 7, the limitation recites “modifying an angle of contact between magnetic field lines and the walls” is unclear and leaves the reader in doubt as to the meaning of the technical feature to which it refers. It is unclear that how does it modify an angle of contact between magnetic field lines and the walls? Regarding claim 8, the limitation recites “modifying an angle of contact between magnetic field lines and the walls” is unclear and leaves the reader in doubt as to the meaning of the technical feature to which it refers. It is unclear that how does it modify an angle of contact between magnetic field lines and the walls? Regarding claim 10, the limitation recites “isolating a radial voltage drop in an interior of the plasma so an electric field at the wall is smaller than an electric field in the interior of the plasma by setting field strength and shape of the at least one magnetic field so as to use centrifugal forces to modify plasma currents in a direction parallel to the magnetic field” is unclear and leaves the reader in doubt as to the meaning of the technical feature to which it refers. It is unclear that how does it isolate a radial voltage drop in an interior of the plasma? And how does it set field strength and shape of the at least one magnetic field? Regarding claim 11, the limitation recites “generating at least a part of a voltage drop using wave-particle interactions” is unclear and leaves the reader in doubt as to the meaning of the technical feature to which it refers. It is unclear that how does it generate at least a part of a voltage drop using wave-particle interactions? Regarding claim 12, the limitation recites “generating at least a part of a voltage drop using torque from neutral beams” is unclear and leaves the reader in doubt as to the meaning of the technical feature to which it refers. It is unclear that how does it generate at least a part of a voltage drop using torque from neutral beams? The claim fails to recite sufficiently definite structure, material or acts for achieving the functional result recited in the claim to reasonably apprise one of ordinary skill in the art of the scope of the claim. It is not clearly explained in the specification as same reasons as stated above; therefore, it renders the claims indefinite. Claims 2-13 are depending on claim 1, and are rejected as the same reasons under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph. In addition, a claim which fails to interrelate essential elements of the invention as defined by applicant(s) in the specification may be rejected under 35 U.S.C. 112(b) or pre-AlA 35 U.S.C. 112, second paragraph, for failure to point out and distinctly claim the invention. See In re Venezia, 530 F.2d 956, 189 USPQ 149 (CCPA 1976); In re Collier, 397 F.2d 1003, 158 USPQ 266 (CCPA 1968). But see Ex parte Nolden, 149 USPQ 378, 380 (Bd. Pat. App. & Inter. 1965) ("[I]t is not essential to a patentable combination that there be interdependency between the elements of the claimed device or that all the elements operate concurrently toward the desired result"); Ex parte Huber, 148 USPQ 447, 448-49 (Bd. Pat. App. & Inter. 1965) (A claim does not necessarily fail to comply with 35 U.S.C. 112, second paragraph where the various elements do not function simultaneously, are not directly functionally related, do not directly intercooperate, and/or serve independent purposes). Note: for compact prosecution purposes, the examiner interprets the claims as best understood in the rejection below. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1 and 14 are rejected under 35 U.S.C. 102(a1) as being anticipated by Wong (U.S Publication No. 20190206578 A1). Regarding claims 1 and 14, Lane discloses a method for producing a voltage across a magnetized plasma and a system (which is methods, apparatuses, devices, and systems for producing and controlling and fusion activities of nuclei, see fig. 1-25), comprising: a magnetic field source configured to generate at least one magnetic field including an axially directed magnetic field in an open field line configuration, wherein the axial-directed magnetic field is configured to confine a plasma in a direction perpendicular to the magnetic field; and an electric field source configured to generate steady-state electric fields parallel to magnetic field lines produced by the magnetic field source such that the electric fields are larger in an interior region of the plasma and substantially reduced in boundary regions of the plasma (see abstract, paragraph [0008], [0122]-[0123], [0126], [0145] and [0215]). Citation of Relevance Prior Art The prior art made of record and not relied upon is considered pertinent to applicant's disclosure: Yamazaki et al. (U.S Publication No. 20190010933 A1) discloses a plasma accelerating apparatus includes: a cathode configured to supply electrons to a plasma acceleration region; a anode; a power supply configured to apply a voltage between the cathode and the anode; a supply port arranged on an outer circumference side than the cathode to supply a propellant to the plasma acceleration region; and a first magnetic field generator configured to generate a first axial direction magnetic field in the upstream side region of the plasma acceleration region to suppress that the electrons supplied from the cathode head for the anode. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to THAI N PHAM whose telephone number is (571)270-5518. The examiner can normally be reached M-F 9:00 am-5:00 pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Alexander Taningco can be reached at 571-272-8048. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /Thai Pham/Primary Examiner, Art Unit 2845 05/21/2026
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Prosecution Timeline

Apr 10, 2025
Application Filed
Jun 03, 2026
Non-Final Rejection mailed — §102, §112 (current)

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Prosecution Projections

1-2
Expected OA Rounds
78%
Grant Probability
98%
With Interview (+20.3%)
2y 1m (~10m remaining)
Median Time to Grant
Low
PTA Risk
Based on 928 resolved cases by this examiner. Grant probability derived from career allowance rate.

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