Prosecution Insights
Prosecution Insights
1 pending office actions • 0 art units • 1 examiners • 0 of 1 (0%) have an AI response strategy ready
Dongfang Jingyuan Electron Limited currently has 1 pending office action in its patent portfolio. This workload is managed by 1 distinct examiner, indicating a narrow scope of active prosecution at this time. The data shows 0 distinct art units associated with these filings, which suggests the application has not yet been fully classified within the standard art unit system.
The busiest examiner for this company is OCHOA, JUAN CARLOS, who is currently handling 1 pending office action. Because this examiner represents the entirety of the active prosecution, the outcome of the portfolio depends on the interactions with this individual. Practitioners should prepare for an engagement with the named examiner to resolve the 1 pending office action and advance the company's intellectual property interests.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §101 only | 1 (100%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| OCHOA, JUAN CARLOS | 1 | 67.3% | +22.1% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18320226 | METHOD FOR SIMULATION OF NEGATIVE TONE DEVELOPMENT PHOTOLITHOGRAPHY PROCESS, NEGATIVE TONE DEVELOPMENT PHOTORESIST MODEL, OPC MODEL, AND ELECTRONIC DEVICE | OCHOA, JUAN CARLOS | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18320226 | METHOD FOR SIMULATION OF NEGATIVE TONE DEVELOPMENT PHOTOLITHOGRAPHY PROCESS, NEGATIVE TONE DEVELOPMENT PHOTORESIST MODEL, OPC MODEL, AND ELECTRONIC DEVICE | OCHOA, JUAN CARLOS | — |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18320226 | METHOD FOR SIMULATION OF NEGATIVE TONE DEVELOPMENT PHOTOLITHOGRAPHY PROCESS, NEGATIVE TONE DEVELOPMENT PHOTORESIST MODEL, OPC MODEL, AND ELECTRONIC DEVICE | OCHOA, JUAN CARLOS | — | §101 | Non-Final OA | — | Pending | May 19, 2023 |
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