Prosecution Insights
Prosecution Insights
Technology area: Chemistry & Materials
1 pending office actions • 1 art units • 1 examiners • 0 of 1 (0%) have an AI response strategy ready
Huizhou Top Metal Material Co. Ltd. holds a portfolio in the Chemistry & Materials technology area. The company currently has 1 pending office action. This action is being handled by ZHENG, LOIS L, who is the busiest examiner for the company with 1 pending matter. This single point of contact for the company's pending work simplifies the management of its intellectual property.
The company's prosecution involves 1 distinct examiner and 1 distinct art unit. The 1 distinct art unit indicates that the company's current technical focus is confined to a single administrative group. Because there is only 1 pending office action, the company faces a very light prosecution workload at this time. The alignment of 1 distinct examiner with 1 distinct art unit suggests that the company's current patenting efforts are highly specialized and concentrated in one area.
Based on the USPTO statutory response window for each pending office action. 1 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| Multi-statute (no §101) | 1 (100%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| ZHENG, LOIS L | 1 | 67.6% | +13.0% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18479211 | MATERIAL FOR METAL LINE, METAL LINE IN SEMICONDUCTOR DEVICE AND METHOD FOR FORMING METAL LINE IN SEMICONDUCTOR DEVICE | ZHENG, LOIS L | 1d overdue |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18479211 | MATERIAL FOR METAL LINE, METAL LINE IN SEMICONDUCTOR DEVICE AND METHOD FOR FORMING METAL LINE IN SEMICONDUCTOR DEVICE | ZHENG, LOIS L | 1d overdue |
| Art Unit | Apps |
|---|---|
| 1733 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18479211 | MATERIAL FOR METAL LINE, METAL LINE IN SEMICONDUCTOR DEVICE AND METHOD FOR FORMING METAL LINE IN SEMICONDUCTOR DEVICE | ZHENG, LOIS L | 1733 | §102§103 | Final Rejection | 1d overdue | Pending | Oct 02, 2023 |
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