Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1711 1714 1792
This examiner grants 56% of resolved cases
Ryan L Coleman works in Tech Center 1700 and Art Unit 1711. He has 687 resolved cases and an allowance rate of 56.0 percent. This rate indicates the examination environment. The median days to allowance is 1193, which is the duration for the prosecution process in this tech center.
The interview lift is 59.7 percent. This lift indicates that interviews are an effective tool for this examiner. In Tech Center 1700, the 59.7 percent lift can impact the 56.0 percent allowance rate, making it a strategy to consider.
With 687 resolved cases, the data highlights the role of direct communication. The 56.0 percent allowance rate and the 1193 days median to allowance show the environment in Art Unit 1711. The 59.7 percent interview lift provides a mechanism for practitioners to improve their outcomes. The combination of these metrics defines the current prosecution landscape for this examiner.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18336217 | SUBSTRATE CLEANING CHAMBER, A SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME, AND A METHOD OF PROCESSING A SUBSTRATE USING THE SUBSTRATE PROCESSING SYSTEM | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18944769 | PARTICLE REMOVAL METHOD, PARTICLE REMOVAL APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18762163 | VIBRATION DEVICE AND VIBRATION METHOD | Non-Final OA | Murata Manufacturing Co., Ltd. |
| 18980687 | High Pressure Sensor Cleaning Nozzles | Final Rejection | Aurora Operations, Inc. |
| 18279818 | PLASMA PROCESSING METHOD | Final Rejection | Hitachi High-Tech Corporation |
| 18794757 | METHODS TO QUICKLY ADJUST THE TEMPERATURE OF AT LEAST ONE PROCESSING LIQUID USED TO PROCESS A SEMICONDUCTOR SUBSTRATE IN A WET PROCESS | Non-Final OA | Tokyo Electron Limited |
| 18761581 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 18799283 | METHOD FOR TREATING A SUBSTRATE | Final Rejection | SEMES CO., LTD. |
| 17843919 | SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD | Final Rejection | SEMES CO., LTD. |
| 18276530 | METHOD OF REMOVING POLLUTANTS | Non-Final OA | KAO CORPORATION |
| 18372295 | SYSTEMS, METHODS, AND TECHNOLOGIES FOR CLEANING AND MAINTAINING OPERABILITY OF VEHICLE SENSORS | Final Rejection | Daimler Truck North America LLC |
| 17016809 | LASER SYSTEM AND METHOD FOR OPERATING THE LASER SYSTEM | Non-Final OA | Fotona d.o.o. |
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