Tech Center 4100 • Art Units: 3723 3799 4100
This examiner grants 59% of resolved cases
Examiner Crandall has handled 786 resolved cases in Art Unit 3723 with an allowance rate of 59.4%. This moderate rate suggests a balanced approach to examination within Tech Center 4100. The median days to allowance of 1251 indicates a prosecution timeline that often extends for a significant period. The 786 resolved cases provide a reliable statistical base for understanding the examiner's tendencies and the expected duration of the process.
The interview lift of 21.6% is a very strong indicator that direct engagement is beneficial. For the 786 resolved cases, interviews significantly increased the likelihood of a grant. Applicants should use this data to justify an interview early in the process, which may help overcome the 59.4% baseline allowance rate and potentially shorten the 1251-day median wait for an allowance. The 21.6% lift suggests that the examiner is particularly open to resolving issues through verbal discussion. By incorporating interviews into their strategy, practitioners can navigate the 1251-day timeline more effectively and improve their overall chances of success.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18428946 | SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING SYSTEM | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18898988 | PIPE PREPARATION TOOL | Non-Final OA | BLACK & DECKER INC. |
| 18399488 | SERVICE LIFT FOR A REFUSE VEHICLE | Final Rejection | Oshkosh Corporation |
| 18713640 | Tool Holding Device, Machine Tool, Machine Tool System, and Tool Means | Non-Final OA | Robert Bosch GmbH |
| 18633312 | PLANARIZATION APPARATUS, PLANARIZATION METHOD, AND PRODUCT MANUFACTURING METHOD | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18711957 | DEVICE AND METHOD FOR MANUFACTURING PHOTOSYNTHESIS AND DEMULTIPLEXING CIRCUIT | Non-Final OA | NIPPON TELEGRAPH AND TELEPHONE CORPORATION |
| 18977686 | TEMPERATURE CONTROL OF CHEMICAL MECHANICAL POLISHING | Non-Final OA | Applied Materials, Inc. |
| 18632450 | CONTACT CLEANING UNITS IN CMP POLISHER | Non-Final OA | Applied Materials, Inc. |
| 18711900 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM | Non-Final OA | Tokyo Electron Limited |
| 18813172 | FREE JOINT STRUCTURE, PUSH-PULL DEVICE, AND SUBSTRATE PROCESSING MODULE | Non-Final OA | EBARA CORPORATION |
| 18840437 | SUBSTRATE POLISHING APPARATUS | Non-Final OA | EBARA CORPORATION |
| 18719028 | INFORMATION PROCESSING APPARATUS, INFERENCE APPARATUS, MACHINE-LEARNING APPARATUS, INFORMATION PROCESSING METHOD, INFERENCE METHOD, AND MACHINE-LEARNING METHOD | Non-Final OA | EBARA CORPORATION |
| 18894292 | METHOD OF PROCESSING WORKPIECE | Non-Final OA | DISCO CORPORATION |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
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