Prosecution Insights
Last updated: October 02, 2026

Examiner: HESTER, HOLLEY GRACE

Tech Center 1700 • Art Units: 1748 1766 1787

This examiner grants 67% of resolved cases

Analysis

Holley Grace Hester is an examiner in Art Unit 1748, part of Tech Center 1700. She has overseen 66 resolved cases, providing a sufficient sample to identify her prosecution trends. Her allowance rate is 66.7 percent, which is a solid indicator of a fair examination process. This rate suggests that two-thirds of the applications she reviews result in a granted patent, provided the claims are well-supported. The 66 resolved cases establish a reliable baseline for predicting outcomes in Art Unit 1748.

The interview lift of 40.8 percent is a very strong positive sign for applicants. This lift suggests that direct communication with the examiner can significantly improve the chances of obtaining an allowance compared to the 66.7 percent baseline. By conducting an interview, practitioners can address the examiner's concerns more directly and potentially find a path to allowable subject matter. The 40.8 percent lift is a highly valuable data point for strategic planning in Tech Center 1700.

The median days to allowance for applications under her review is 1186. This timeline is a useful benchmark for managing expectations regarding the duration of the patent process. The 1186-day median pendency, combined with the 66.7 percent allowance rate, highlights the importance of using tools like the 40.8 percent interview lift to navigate the process. The 1186-day duration is a key metric for long-term planning in Art Unit 1748.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

66.7%
Allow Rate
+1.7% vs TC avg
95
Total Applications
+40.8%
Interview Lift
1186
Avg Prosecution Days
Based on 66 resolved cases, 2023–2026

Rejection Statute Breakdown

1.1%
§101 Eligibility
18.2%
§102 Novelty
56.3%
§103 Obviousness
21.3%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
17886561 Biodegradable Graft Polymers Non-Final OA The Procter & Gamble Company
18681562 RESIN COMPRISING POLY(LACTIC ACID-B-3-HYDROXYPROPIONIC ACID) BLOCK COPOLYMER, AND RESIN COMPOSITION AND RESIN MOLDED PRODUCT COMPRISING SAME Non-Final OA LG CHEM, LTD.
18278445 CURABLE COMPOSITION COMPRISING LIGHT POLYMERIZABLE LIQUID AND EPOXY PRECURSOR FOR COATING, 2D OBJECT FORMATION AND 3D PRINTING Non-Final OA BASF SE
18562639 POLYURETHANE COMPOSITE Non-Final OA Covestro Deutschland AG
18700369 WATER-BASED PRIMER-SURFACER AND USES THEREOF Final Rejection PPG Industries Ohio, Inc.
18842956 TRANSPARENT POLYCARBONATE COMPOSITIONS Non-Final OA SHPP GLOBAL TECHNOLOGIES B.V.
18561394 WEATHERABLE POLYESTER CARBONATES COPOLYMERS FOR INTERIOR AND EXTERIOR TRAIN COMPONENTS Non-Final OA SHPP GLOBAL TECHNOLOGIES B.V.
18681678 FIBER-REINFORCED COMPOSITE MATERIAL AND PRODUCTION METHOD THEREFOR Non-Final OA Teijin Limited
18042096 XYLYLENE DIISOCYANATE COMPOSITION, POLYMERIZABLE COMPOSITION, RESIN, MOLDED ARTICLE, OPTICAL ELEMENT, AND LENS Final Rejection MITSUI CHEMICALS, INC.
17640445 METHOD FOR IMPROVING THE STORAGE STABILITY AND/OR TRANSPORT STABILITY OF A POLYMER Final Rejection BOREALIS AG
18508352 POLYURETHANE DISPERSANTS, PIGMENT DISPERSIONS AND AQUEOUS INKS Non-Final OA Sun Chemical Corporation
17768450 High refractive index and high adhesion epoxy resin composition and encapsulation material comprising the same Non-Final OA SOLUS ADVANCED MATERIALS CO., LTD.
17768453 High refractive index and high adhesion epoxy resin composition and encapsulation material comprising the same Final Rejection SOLUS ADVANCED MATERIALS CO., LTD.

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