Listed by the USPTO as KIM, TONG-HO
Tech Center 4100 • Art Units: 2811 2891 4100
This examiner grants 95% of resolved cases
KIM, TONG-HO is assigned to tech center 4100 and art unit 2811. The profile reports 1097 resolved cases and an allowance rate of 95.3%. The median time to allowance is 627 days. Interviews are associated with a 0.7% lift.
The leading companies are Taiwan Semiconductor Manufacturing Company, Ltd., Intel Corporation, and Samsung Electronics Co., Ltd. The leading firms are Haynes and Boone, LLP (24061), SEED INTELLECTUAL PROPERTY LAW GROUP LLP, and BIRCH STEWART KOLASCH & BIRCH, LLP. The large record supports detailed review of prosecution outcomes in this assignment. The interview measure shows little recorded association with allowance changes, so counsel may focus engagement decisions on the specific issues in each application.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18782187 | SEMICONDUCTOR PACKAGE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18778460 | METHOD FOR FABRICATING MASK, METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE MASK, AND THE SEMICONDUCTOR DEVICE FABRICATED USING THE MASK | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18765435 | SEMICONDUCTOR DEVICE, DISPLAY DEVICE, PHOTOELECTRIC CONVERSION DEVICE, AND ELECTRONIC DEVICE | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18812294 | Light Emitting Display Device | Non-Final OA | LG Display Co., Ltd. |
| 18590308 | DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF | Final Rejection | Samsung Display Co., LTD. |
| 18727155 | DISPLAY PANEL AND DISPLAY APPARATUS | Non-Final OA | BOE Technology Group Co., Ltd. |
| 18700254 | DISPLAY PANEL AND DISPLAY DEVICE | Non-Final OA | BOE TECHNOLOGY GROUP CO., LTD. |
| 18240106 | INTEGRATED CIRCUIT STRUCTURES HAVING UNIFORM GRID METAL GATE AND TRENCH CONTACT PLUG | Non-Final OA | Intel Corporation |
| 18216493 | PERFORMANCE OPTIMIZATION OF TRANSISTORS SHARING CHANNEL STRUCTURES OF VARYING WIDTH | Non-Final OA | Intel Corporation |
| 18339685 | GLASS LAYERS AND CAPACITORS FOR USE WITH INTEGRATED CIRCUIT PACKAGES | Non-Final OA | Intel Corporation |
| 18774420 | VERTICAL CONTACTS FOR SEMICONDUCTOR DEVICES | Non-Final OA | Micron Technology, Inc. |
| 18834590 | OPTOELECTRONIC PACKAGE AND METHOD | Non-Final OA | ams-OSRAM International GmbH |
| 18290422 | SEMICONDUCTOR PACKAGE | Non-Final OA | LG INNOTEK CO., LTD. |
| 18778563 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18772713 | Epitaxial Structures For Semiconductor Devices | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18772123 | SEMICONDUCTOR DEVICES INCLUDING METAL GATE PROTECTION AND METHODS OF FABRICATION THEREOF | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18772124 | SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18770758 | INTEGRATED CIRCUIT WITH EMBEDDED HIGH-DENSITY AND HIGH-CURRENT SRAM MACROS | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18767168 | SEMICONDUCTOR DEVICE WITH FIN STRUCTURES | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18758948 | SEMICONDUCTOR STRUCTURES AND METHODS THEREOF | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18789256 | GATE STRUCTURE AND METHOD | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18787399 | PACKAGED SEMICONDUCTOR DEVICES INCLUDING BACKSIDE POWER RAILS AND METHODS OF FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18786469 | Electroless Plating Method for Metal Gate Fill | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18785512 | GATE STRUCTURE AND METHOD | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18784490 | FIELD EFFECT TRANSISTOR WITH GATE ISOLATION STRUCTURE AND METHOD | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18783563 | Integrated Hybrid Standard Cell Structure with Gate-All-Around Device | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18782219 | TRANSISTOR GATE STRUCTURES | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18782846 | GATE STRUCTURE FOR SEMICONDUCTOR DEVICE | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18783146 | CAPACITOR, MEMORY DEVICE, AND METHOD | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18782124 | Semiconductor Device and Method of Manufacture | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy95.3% of resolved applications examined by Tong-Ho Kim were allowed (1,097 resolved cases), compared with 72.2% across Art Unit 2811 over the last five years.
This examiner's interview lift is +0.7 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Tong-Ho Kim took 627 days on average from filing to allowance.
Tong-Ho Kim examines applications in Art Unit 2811 in Tech Center 4100.
