Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1700 1716 1718 1722 1731 1733 1737 1746 1747 1754
This examiner grants 100% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 17801188 | IMPURITY PROCESSING DEVICE AND IMPURITY PROCESSING METHOD | Final Rejection | Panasonic Intellectual Property Management Co., Ltd. |
| 18529751 | LAUNDRY TREATMENT COMPOSITION INCLUDING A POLYALKYLENECARBONATE COMPOUND | Final Rejection | The Procter & Gamble Company |
| 18383951 | PROCESS FOR PRODUCING STRONG AND SOFT TISSUE AND TOWEL PRODUCTS | Final Rejection | The Procter & Gamble Company |
| 17917344 | Method for Manufacturing Mixture of Positive Electrode Active Material Particles of Nickel-Rich Lithium Composite Transition Metal Oxide | Final Rejection | LG Chem, Ltd. |
| 18466028 | SHEET MANUFACTURING APPARATUS | Final Rejection | SEIKO EPSON CORPORATION |
| 18012470 | NEGATIVE ACTIVE MATERIAL AND RECHARGEABLE LITHIUM BATTERY INCLUDING SAME | Final Rejection | SAMSUNG SDI CO., LTD. |
| 18563972 | AIR-CONDITIONING SYSTEM WITH ELECTROSTATIC FILTER, MOTOR VEHICLE HAVING SUCH AN AIR-CONDITIONING SYSTEM, AND METHOD FOR OPERATING SUCH AN AIR-CONDITIONING SYSTEM | Non-Final OA | AUDI AG |
| 18156192 | NEGATIVE ELECTRODE, METHOD OF MANUFACTURING NEGATIVE ELECTRODE, AND SECONDARY BATTERY INCLUDING NEGATIVE ELECTRODE | Final Rejection | SK ON CO., LTD. |
| 18275477 | ELECTROLYTE MEASUREMENT DEVICE AND METHOD FOR DETERMINING ABNORMALITY OF ELECTROLYTE CONCENTRATION MEASUREMENT UNIT | Final Rejection | HITACHI HIGH-TECH CORPORATION |
| 18453071 | INSITU BUILD POWDER CHARACTERIZATION FOR POWDER BED FUSION | Final Rejection | RTX Corporation |
| 18130025 | MICRONIZED FLUX FOR JET VALVE DISPENSER | Final Rejection | Honeywell International Inc. |
| 18002749 | AEROSOL-GENERATING DEVICE PROVIDING VISUAL FEEDBACK OF PROGRESS THROUGH A USAGE SESSION | Non-Final OA | Philip Morris Products S.A. |
| 17951218 | Sheet-Like Pseudoboehmite | Final Rejection | SK ie technology Co., Ltd. |
| 18579803 | RESIN COMPOSITION FOR DICING PROTECTION LAYER AND TREATMENT METHOD FOR SEMICONDUCTOR WAFER | Non-Final OA | Resonac Corporation |
| 17925175 | CMP POLISHING LIQUID AND POLISHING METHOD | Non-Final OA | Resonac Corporation |
| 17776380 | METHOD FOR PREPARING A HYDROGEN TANK COMPRISING A SEALING LAYER AND A BASE | Final Rejection | ARKEMA FRANCE |
| 18188340 | VAPORIZATION CORE, VAPORIZER, AND ELECTRONIC VAPORIZATION DEVICE | Final Rejection | SHENZHEN SMOORE TECHNOLOGY LIMITED |
| 17791042 | METHOD OF FLAVORING AND AGING SMOKING MATERIAL AND SMOKING ARTICLE MANUFACTURED USING THE SAME | Final Rejection | KT&G CORPORATION |
| 17890955 | ARTIFICIAL INTELLIGENCE METHODS FOR CORRELATING LASER-INDUCED BREAKDOWN SPECTROSCOPY (LIBS) MEASUREMENTS WITH DEGREE OF SENSITIZATION (DOS) VALUES TO DETERMINE THE SENSITIZATION OF AN ALLOY | Final Rejection | NUtech Ventures |
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