Prosecution Insights
Last updated: October 02, 2026

Examiner: ZHANG, WILLIAM XIANG

Tech Center 2100 • Art Units: 2117

This examiner grants 100% of resolved cases

Analysis

William Xiang Zhang is an examiner in Tech Center 2100 and Art Unit 2117. He has 1 resolved case. The allowance rate for this case is 100.0%. This 100.0% rate is a metric for practitioners to consider. The interview lift is 0.0%. This 0.0% lift shows the change in allowance probability when an interview occurs. The median days to allowance is 1057. This 1057-day median is the duration for the allowed application.

With 1 resolved case, the data provides a basis for strategy. The 0.0% interview lift is a metric for those planning their communication. Practitioners should factor the 1057-day timeline into their expectations. The 100.0% allowance rate reflects the examiner's record in Tech Center 2100 and Art Unit 2117. The examiner's history shows the outcome of the case. Direct communication through the interview process is associated with the 0.0% lift. The Art Unit environment is associated with these metrics. The duration of prosecution is a factor in strategy. The Tech Center context is relevant for understanding the trends.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

100.0%
Allow Rate
+45.0% vs TC avg
10
Total Applications
+0.0%
Interview Lift
1057
Avg Prosecution Days
Based on 1 resolved cases, 2023–2026

Rejection Statute Breakdown

19.6%
§101 Eligibility
8.9%
§102 Novelty
58.9%
§103 Obviousness
12.5%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18754082 ENERGY PROVISIONING MANAGEMENT Non-Final OA TOYOTA MOTOR NORTH AMERICA, INC.
18932570 Collective Charging Control for Mobile Computing Devices Non-Final OA Zebra Technologies Corporation
18161913 DYNAMIC SPLITTING AND MOVEMENT FOR 3D PRINTING Non-Final OA INTERNATIONAL BUSINESS MACHINES CORPORATION
18817970 SITE MANAGEMENT APPARATUS AND SITE MANAGEMENT METHOD Non-Final OA Hitachi Vantara, Ltd.

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