Prosecution Insights
Last updated: April 19, 2026
Application No. 17/122,161

HYDRIDE ENHANCED GROWTH RATES IN HYDRIDE VAPOR PHASE EPITAXY

Non-Final OA §103§112
Filed
Dec 15, 2020
Examiner
MOORE, KARLA A
Art Unit
1716
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Alliance for Sustainable Energy, LLC
OA Round
5 (Non-Final)
43%
Grant Probability
Moderate
5-6
OA Rounds
4y 3m
To Grant
58%
With Interview

Examiner Intelligence

Grants 43% of resolved cases
43%
Career Allow Rate
328 granted / 765 resolved
-22.1% vs TC avg
Moderate +15% lift
Without
With
+14.6%
Interview Lift
resolved cases with interview
Typical timeline
4y 3m
Avg Prosecution
74 currently pending
Career history
839
Total Applications
across all art units

Statute-Specific Performance

§101
0.3%
-39.7% vs TC avg
§103
48.5%
+8.5% vs TC avg
§102
16.1%
-23.9% vs TC avg
§112
28.8%
-11.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 765 resolved cases

Office Action

§103 §112
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Continued Examination Under 37 CFR 1.114 A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after final rejection. Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, the finality of the previous Office action has been withdrawn pursuant to 37 CFR 1.114. Applicant's submission filed on 13 May 2025 has been entered. Drawings The drawings are objected to under 37 CFR 1.83(a). The drawings must show every feature of the invention specified in the claims. Therefore, “a AsH3 or PH3 injector inlet” must be shown (labeled) or the feature(s) canceled from the claim(s) with respect to Fig. 2, the elected embodiment. No new matter should be entered. Corrected drawing sheets in compliance with 37 CFR 1.121(d) are required in reply to the Office action to avoid abandonment of the application. Any amended replacement drawing sheet should include all of the figures appearing on the immediate prior version of the sheet, even if only one figure is being amended. The figure or figure number of an amended drawing should not be labeled as “amended.” If a drawing figure is to be canceled, the appropriate figure must be removed from the replacement sheet, and where necessary, the remaining figures must be renumbered and appropriate changes made to the brief description of the several views of the drawings for consistency. Additional replacement sheets may be necessary to show the renumbering of the remaining figures. Each drawing sheet submitted after the filing date of an application must be labeled in the top margin as either “Replacement Sheet” or “New Sheet” pursuant to 37 CFR 1.121(d). If the changes are not accepted by the examiner, the applicant will be notified and informed of any required corrective action in the next Office action. The objection to the drawings will not be held in abeyance. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claims 1, 5-6 and 8-14 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Any claim not specifically mentioned is rejected based on its dependence. Claim 1 recites the limitation "the AsH3 or PH3 injector outlets”. There is insufficient antecedent basis for this limitation in the claim. In order to expedite examination, Examiner has assumed the claim was meant to reference “the plurality of AsH3 or PH3 outlets” and has examined accordingly. Clarification and/or correction is requested. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. This application currently names joint inventors. In considering patentability of the claims the examiner presumes that the subject matter of the various claims was commonly owned as of the effective filing date of the claimed invention(s) absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and effective filing dates of each claim that was not commonly owned as of the effective filing date of the later invention in order for the examiner to consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2) prior art against the later invention. Claim(s) 1, 5-6 and 8-14 is/are rejected under 35 U.S.C. 103 as being unpatentable over U.S. Patent Pub. No. 2002/0155713 to Tsvetkov et al in view of U.S. Patent Pub. No. 2017/0204533 to Schunemann et al. Regarding claim 1: Tsvetkov et al. disclose a reactor (Fig. 2, 200) capable of deposition of at least one layer of a semiconductor device using hydride vapor phase epitaxy (HVPE) substantially as claimed, wherein the reactor is capable of producing the at least one layer of the semiconductor device at a rate of greater than 300 µm/h at a pressure of about 1 atm. See, e.g., paras. 11 and 29. The reactor may further comprise an injector inlet (portion of 223 and 224 connected to a gas source) capable of injecting AsH3 or PH3, a plurality of outlets (portions of 223 and 224 outletting to substrate) capable of outletting AsH3 or PH3; and source boats (227, 229, 231, 233, 235)). Additionally, Tsvetkov et al. teach that various materials may be used depending on the layers and structures that are to be fabricated (see, e.g., para. 30, 33 and 43). However, Tsvetkov et al. fails to explicitly disclose that the plurality of AsH3 or PH3 outlets positioned radially around a growth substrate. Schunemann et al. disclose providing arsine gas provided from a source (labeled AsH3) and through an injector inlet (portion of 24 connected to source) and a plurality of outlets positioned radially around a growth substrate (portion of 24 for outletting to substrate) provided in proximity to a deposition substrate in an HVPE method and apparatus for the purpose of, inter alia, producing a GaAs crystal with increased carrier lifetime (see, e.g., Figs. 5A-B, abstract, paras. 38-39, 42). In Fig. 5A, at least the outermost outlets of plurality of outlets are positioned radially around the growth substrate thereby meeting the claim limitation. Thus, it would have been obvious to one of ordinary skill in the art before Applicant’s invention was effectively filed to have provided an injector inlet and a plurality of outlets positioned radially around the growth substrate of Tsvetkov et al. in order, inter alia, produce a GaAs crystal with increased carrier lifetime as taught by Schunemann et al. Examiner notes that the claimed apparatus is capable of the plurality of recitations drawn to an intended use of the apparatus tied to various processing parameters (e.g., processing material identity, processing temperatures and resulting product) associated with a desired method that may be performed in the reactor. Additionally, Examiner notes the courts have ruled a claim containing a “recitation with respect to the manner in which a claimed apparatus is intended to be employed does not differentiate the claimed apparatus from a prior art apparatus” if the prior art apparatus teaches all the structural limitations of the claim. Ex parte Masham, 2 USPQ2d 1647 (Bd. Pat. App. & Inter. 1987); expressions relating the apparatus to contents thereof during an intended operation are of no significance in determining patentability of the apparatus claim. Ex parte Thibault, 164 USPQ 666, 667 (Bd. App. 1969); and the inclusion of material or article worked upon by a structure being claimed does not impart patentability to the claims. In re Young, 75 F.2d 966, 25 USPQ 69 (CCPA 1935) (as restated in In re Otto, 312 F.2d 937, 136 USPQ 458, 459 (CCPA 1963)). With respect to claim 5, the reactor of Tsvetkov et al. may further comprise a high temperature region (left side of chamber) and a low temperature region wherein the high temperature region contains the source boats and wherein the low temperature region contains the outlet capable of outletting a group V hydride material (see, e.g., paras. 29 and 34). Additionally, with respect to the recitations drawn to intended use of the reactor in claims 5-6 and 8-14, similar to claim 1, Examiner notes the courts have ruled claims directed to apparatus must be distinguished from the prior art in terms of structure rather than function. In re Danly, 263 F.2d 844, 847, 120 USPQ 528, 531 (CCPA 1959); a claim containing a “recitation with respect to the manner in which a claimed apparatus is intended to be employed does not differentiate the claimed apparatus from a prior art apparatus” if the prior art apparatus teaches all the structural limitations of the claim. Ex parte Masham, 2 USPQ2d 1647 (Bd. Pat. App. & Inter. 1987); expressions relating the apparatus to contents thereof during an intended operation are of no significance in determining patentability of the apparatus claim. Ex parte Thibault, 164 USPQ 666, 667 (Bd. App. 1969); and the inclusion of material or article worked upon by a structure being claimed does not impart patentability to the claims. In re Young, 75 F.2d 966, 25 USPQ 69 (CCPA 1935) (as restated in In re Otto, 312 F.2d 937, 136 USPQ 458, 459 (CCPA 1963)). Response to Arguments Applicant’s arguments with respect to claim(s) 1, 5-6 and 8-14 have been considered but are moot because the new ground of rejection does not rely on any reference applied in the prior rejection of record, as presently applied, for any teaching or matter specifically challenged in the argument. Examiner maintains that “a AsH3 or PH3 inlet” should be labeled in the drawings with respect to the embodiment under examination. Examiner notes the fact that Applicant themselves has pointed to a feature that is clearly not a feature of the elected embodiment (Fig. 2) represented by the present claims provides further evidence that the feature should be labeled for clarity. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. US Patent No. 5,254,210 discloses an HVPE system and reactor that includes a source of AsH3 or PH3. Also see above suggestions for expediting examination with respect to claiming an apparatus for performing a specific method. Any inquiry concerning this communication or earlier communications from the examiner should be directed to KARLA MOORE whose telephone number is (571)272-1440. The examiner can normally be reached Monday-Friday, 9am-6pm EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, PARVIZ HASSANZADEH can be reached on (571) 272-1435. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /KARLA A MOORE/Primary Examiner, Art Unit 1716
Read full office action

Prosecution Timeline

Dec 15, 2020
Application Filed
Mar 24, 2023
Non-Final Rejection — §103, §112
Sep 29, 2023
Response Filed
Nov 18, 2023
Final Rejection — §103, §112
Mar 25, 2024
Request for Continued Examination
Mar 26, 2024
Response after Non-Final Action
Jul 11, 2024
Non-Final Rejection — §103, §112
Dec 17, 2024
Response Filed
Jan 07, 2025
Final Rejection — §103, §112
May 13, 2025
Request for Continued Examination
May 14, 2025
Response after Non-Final Action
Nov 10, 2025
Response Filed
Jan 06, 2026
Non-Final Rejection — §103, §112 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

5-6
Expected OA Rounds
43%
Grant Probability
58%
With Interview (+14.6%)
4y 3m
Median Time to Grant
High
PTA Risk
Based on 765 resolved cases by this examiner. Grant probability derived from career allow rate.

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