Tech Center 1700 • Art Units: 1712 1713 1716 1718 1737 1782 1792
This examiner grants 43% of resolved cases
Karla A. Moore is an examiner in Tech Center 1700 and Art Unit 1712, with 785 resolved cases. Her allowance rate is 43.1%, and the median days to allowance is 1508. This indicates the prosecution success rate and the timeline for applications in this docket.
The interview lift is 14.0%, which provides a boost to the 43.1% allowance rate. Given the 1508-day median pendency, practitioners should seek ways to move the case forward. The 14.0% lift across 785 resolved cases suggests that the examiner is open to discussion, which may be necessary to overcome the hurdles that lead to the 43.1% allowance rate. Strategy should focus on using interviews to address the issues that contribute to the 1508-day timeline.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18428510 | ELECTROSTATIC CHUCKS AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18238874 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING THE SAME | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 19029464 | APPARATUS FOR MANUFACTURING DISPLAY DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE | Final Rejection | Samsung Display Co., Ltd. |
| 18678194 | MASK ASSEMBLY, APPARATUS FOR MANUFACTURING DISPLAY DEVICE, AND METHOD OF MANUFACTURING DISPLAY DEVICE | Non-Final OA | Samsung Display Co., Ltd. |
| 18636359 | DEPOSITION MASK | Final Rejection | Samsung Display Co., LTD. |
| 18519545 | CONTROL SYSTEM OF DEPOSITION SOURCE | Non-Final OA | Samsung Display Co., LTD. |
| 18331333 | APPARATUS FOR MANUFACTURING DISPLAY DEVICE | Final Rejection | SAMSUNG DISPLAY CO., LTD. |
| 18092362 | REMOTE PLASMA UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING REMOTE PLASMA | Final Rejection | ASM IP Holding B.V. |
| 17169440 | REACTOR SYSTEM WITH MULTI-DIRECTIONAL REACTION CHAMBER | Non-Final OA | ASM IP Holding B.V. |
| 18280578 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFACTURING APPARATUS | Final Rejection | HITACHI HIGH-TECH CORPORATION |
| 17273838 | PLASMA PROCESSING APPARATUS | Non-Final OA | Hitachi High-Tech Corporation |
| 18589750 | SUBSTRATE PROCESSING DEVICE | Final Rejection | Kioxia Corporation |
| 18983235 | APPARATUS, SYSTEMS, AND METHODS OF USING ATOMIC HYDROGEN RADICALS WITH SELECTIVE EPITAXIAL DEPOSITION | Non-Final OA | Applied Materials, Inc. |
| 18632421 | SUSCEPTOR | Non-Final OA | Applied Materials, Inc. |
| 18417016 | CELL ARCHITECTURAL STRUCTURES FOR ENHANCED THERMAL MANAGEMENT IN EPITAXIAL GROWTH PROCESSING CHAMBER | Non-Final OA | Applied Materials, Inc. |
| 18397234 | AIR-CORE COIL IN ANALOG CIRCUIT FILTERS FOR PLASMA PROCESSING | Non-Final OA | APPLIED MATERIALS, INC. |
| 18336036 | EVAPORATION DEVICE AND EVAPORATION METHOD | Non-Final OA | APPLIED MATERIALS, INC. |
| 18131212 | HIGH TEMPERATURE METAL SEALS FOR VACUUM SEGREGATION | Final Rejection | Applied Materials, Inc. |
| 17880310 | SINGLE PROCESS GAS FEED LINE ARCHITECTURE | Final Rejection | Applied Materials, Inc. |
| 16922931 | MULTI-LID STRUCTURE FOR SEMICONDUCTOR PROCESSING SYSTEM | Final Rejection | Applied Materials, Inc. |
| 18797266 | INJECTOR AND PROCESSING APPARATUS | Non-Final OA | TOKYO ELECTRON LIMITED |
| 18720641 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 18743589 | SUBSTRATE-PROCESSING APPARATUS AND FILM-FORMING METHOD | Non-Final OA | Tokyo Electron Limited |
| 18411359 | PLASMA PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 17501889 | PLASMA PROCESSING APPARATUS | Final Rejection | TOKYO ELECTRON LIMITED |
| 18402814 | SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | Non-Final OA | Kokusai Electric Corporation |
| 17484379 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM | Final Rejection | KOKUSAI ELECTRIC CORPORATION |
| 17313491 | SUBSTRATE PROCESSING APPARATUS | Final Rejection | KOKUSAI ELECTRIC CORPORATION |
| 18518300 | SYSTEMS AND METHODS FOR MANUFACTURING STRUCTURES USING ELECTRON-BEAM PHYSICAL VAPOR DEPOSITION | Non-Final OA | Blue Origin, LLC |
| 17961457 | COMPRESSIBLE TRAY FOR SOLID CHEMICAL VAPORIZING CHAMBER | Final Rejection | ENTEGRIS, INC. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy