Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1712 1713 1716 1718 1737 1782 1792
This examiner grants 43% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19029464 | APPARATUS FOR MANUFACTURING DISPLAY DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE | Non-Final OA | Samsung Display Co., Ltd. |
| 18636359 | DEPOSITION MASK | Non-Final OA | Samsung Display Co., LTD. |
| 18318832 | MASK FRAME, MASK ASSEMBLY, AND METHOD OF MANUFACTURING THE MASK ASSEMBLY | Non-Final OA | Samsung Display Co., Ltd. |
| 18172158 | PROCESSING SYSTEM FOR SEMICONDUCTOR WAFERS | Non-Final OA | ASM IP Holding, B.V. |
| 18092362 | REMOTE PLASMA UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING REMOTE PLASMA | Final Rejection | ASM IP Holding B.V. |
| 17169440 | REACTOR SYSTEM WITH MULTI-DIRECTIONAL REACTION CHAMBER | Non-Final OA | ASM IP Holding B.V. |
| 18692128 | PLASMA PROCESSING APPARATUS | Non-Final OA | HITACHI HIGH-TECH CORPORATION |
| 18280578 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFACTURING APPARATUS | Final Rejection | HITACHI HIGH-TECH CORPORATION |
| 17273838 | PLASMA PROCESSING APPARATUS | Non-Final OA | Hitachi High-Tech Corporation |
| 17811876 | THIN FILM DEPOSITION WITH IMPROVED CONTROL OF PRECURSOR | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18417016 | CELL ARCHITECTURAL STRUCTURES FOR ENHANCED THERMAL MANAGEMENT IN EPITAXIAL GROWTH PROCESSING CHAMBER | Non-Final OA | Applied Materials, Inc. |
| 18131212 | HIGH TEMPERATURE METAL SEALS FOR VACUUM SEGREGATION | Final Rejection | Applied Materials, Inc. |
| 17880310 | SINGLE PROCESS GAS FEED LINE ARCHITECTURE | Final Rejection | Applied Materials, Inc. |
| 18402784 | METAL MASK STRUCTURE, PHOTOMASK FOR PREPARING SHIELDING LAYER, AND METHOD FOR PREPARING METAL MASK STRUCTURE BY USING PHOTOMASK | Non-Final OA | Darwin Precisions Corporation |
| 18589750 | SUBSTRATE PROCESSING DEVICE | Non-Final OA | Kioxia Corporation |
| 18797266 | INJECTOR AND PROCESSING APPARATUS | Non-Final OA | TOKYO ELECTRON LIMITED |
| 18743589 | SUBSTRATE-PROCESSING APPARATUS AND FILM-FORMING METHOD | Non-Final OA | Tokyo Electron Limited |
| 18427838 | PLASMA PROCESSING APPARATUS, ELECTROSTATIC CHUCK, AND PLASMA PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 18411359 | PLASMA PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 17949520 | GATE VALVE, SUBSTRATE PROCESSING SYSTEM, AND METHOD OF OPERATING GATE VALVE | Non-Final OA | Tokyo Electron Limited |
| 17542874 | PLASMA PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 17501889 | PLASMA PROCESSING APPARATUS | Final Rejection | TOKYO ELECTRON LIMITED |
| 18395777 | CONTROLLING METHOD FOR SEMICONDUCTOR PROCESS AUXILIARY APPARATUS, CONTROL ASSEMBLY AND MANUFACTURING SYSTEM | Non-Final OA | United Microelectronics Corp. |
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