Prosecution Insights
Last updated: April 19, 2026
Application No. 17/405,138

PHOTORESIST COMPOSITIONS, METHODS FOR FORMING PATTERN USING THE SAME, AND METHODS FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

Final Rejection §102§103
Filed
Aug 18, 2021
Examiner
CHU, JOHN S Y
Art Unit
1737
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Samsung Electronics Co., Ltd.
OA Round
9 (Final)
77%
Grant Probability
Favorable
10-11
OA Rounds
3y 1m
To Grant
82%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allow Rate
740 granted / 959 resolved
+12.2% vs TC avg
Moderate +5% lift
Without
With
+5.1%
Interview Lift
resolved cases with interview
Typical timeline
3y 1m
Avg Prosecution
65 currently pending
Career history
1024
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
48.2%
+8.2% vs TC avg
§102
29.9%
-10.1% vs TC avg
§112
12.1%
-27.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 959 resolved cases

Office Action

§102 §103
DETAILED CORRESPONDENCE This Office action is in response to the amendment filed of November 26, 2025. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries set forth in Graham v. John Deere Co., 383 U.S. 1, 148 USPQ 459 (1966), that are applied for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claim(s) 1, 4, 7, 26 and 27 are rejected under 35 U.S.C. 103 as unpatentable over ANRYU et al (2021/0286261) in view of MARUYAMA et al (2013/0183624). The claimed invention now recites the following: PNG media_image1.png 574 672 media_image1.png Greyscale ANRYU et al disclose compositions 1 and 2 in Table 1 on page 105, see below: PNG media_image2.png 508 780 media_image2.png Greyscale Compound I-1 is found on page 98 having the following structure: PNG media_image3.png 150 392 media_image3.png Greyscale Claim 4 is met by the copolymer A1 on page 104, PNG media_image4.png 506 400 media_image4.png Greyscale Claims 7 is met by the parts by mass of the photoacid seen in Compositions 1 and 2 above at 3.4 parts per 10 parts of the photosensitive resin. Claim 26 for the copolymer having a hydroxstyrene/propylcyclopentyl methacrylate is seen in the resin above that have been highlighted. Further the claimed resin includes at least a structural unit units of (a1) and (a2) Claim 27 is met at para. [0189]. MARUYAMA et al report radiation sensitive composition comprising an acid labile containing resin, a photoacid generator and a sensitizers, wherein the sensitizers include benzophenones, anthracenes and other as seen in para. [0206] to [0208]. The content of the sensitizers is normally used in an amount of less than 50 parts by mass based on 100 parts by mass of the polymer, see below: PNG media_image5.png 178 434 media_image5.png Greyscale It would have been prima facie obvious to one of ordinary skill in the art of photosensitive compositions to add a sensitizer such as anthracene in an amount of less than 50 parts by mass such as 40 parts by mass based on 100 parts by mass of the polymer with the reasonable expectation of same or similar results for improved pattern profile, mask error, and LWR. The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Each of MATSUDA et al (9,104,102), EBATA et al (2007/0054214), and MIYAMATSU et al (2006/0141383) report sensitizers used in a radiation sensitive composition an amount of less than 50 parts by mass to 100 parts by mass of the polymer, see col. 44, lines 56-67, para. [0231] and para. [0237], respectively. Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to JOHN S CHU whose telephone number is (571)272-1329. The examiner can normally be reached on M-F, IFP-Flex. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Mark Huff, can be reached at telephone number 571-272-1385. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://portal.uspto.gov/external/portal. Should you have questions about access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. /John S. Chu/ Primary Examiner, Art Unit 1737 J. Chu January 20, 2026
Read full office action

Prosecution Timeline

Aug 18, 2021
Application Filed
Aug 18, 2021
Response after Non-Final Action
May 15, 2023
Applicant Interview (Telephonic)
May 21, 2023
Non-Final Rejection — §102, §103
Jun 28, 2023
Interview Requested
Jul 13, 2023
Applicant Interview (Telephonic)
Jul 13, 2023
Examiner Interview Summary
Aug 14, 2023
Response Filed
Aug 26, 2023
Final Rejection — §102, §103
Sep 12, 2023
Interview Requested
Sep 22, 2023
Applicant Interview (Telephonic)
Sep 23, 2023
Examiner Interview Summary
Oct 26, 2023
Response after Non-Final Action
Nov 03, 2023
Response after Non-Final Action
Nov 29, 2023
Request for Continued Examination
Dec 03, 2023
Response after Non-Final Action
Dec 15, 2023
Non-Final Rejection — §102, §103
Jan 23, 2024
Applicant Interview (Telephonic)
Jan 23, 2024
Examiner Interview Summary
Mar 21, 2024
Response Filed
Apr 06, 2024
Final Rejection — §102, §103
Jun 10, 2024
Request for Continued Examination
Jun 12, 2024
Response after Non-Final Action
Jun 20, 2024
Non-Final Rejection — §102, §103
Aug 01, 2024
Examiner Interview Summary
Aug 01, 2024
Applicant Interview (Telephonic)
Sep 13, 2024
Response Filed
Dec 03, 2024
Final Rejection — §102, §103
Jan 07, 2025
Applicant Interview (Telephonic)
Jan 07, 2025
Examiner Interview Summary
Feb 06, 2025
Request for Continued Examination
Feb 10, 2025
Response after Non-Final Action
Feb 12, 2025
Non-Final Rejection — §102, §103
Mar 13, 2025
Examiner Interview Summary
Mar 13, 2025
Applicant Interview (Telephonic)
May 15, 2025
Response Filed
Aug 01, 2025
Request for Continued Examination
Aug 05, 2025
Response after Non-Final Action
Aug 22, 2025
Non-Final Rejection — §102, §103
Sep 25, 2025
Examiner Interview Summary
Sep 25, 2025
Applicant Interview (Telephonic)
Nov 26, 2025
Response Filed
Jan 20, 2026
Final Rejection — §102, §103
Feb 13, 2026
Interview Requested
Feb 24, 2026
Examiner Interview Summary
Feb 24, 2026
Applicant Interview (Telephonic)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

10-11
Expected OA Rounds
77%
Grant Probability
82%
With Interview (+5.1%)
3y 1m
Median Time to Grant
High
PTA Risk
Based on 959 resolved cases by this examiner. Grant probability derived from career allow rate.

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