Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 1722 1737 1795 2881
This examiner grants 77% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18377365 | PHOTORESIST COMPOSITION FOR EXTREME ULTRAVIOLET, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18212913 | PHOTORESIST COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18098233 | PHOTOSENSITIVE POLYMER CAPABLE OF MULTI-STEP DEPROTECTION REACTION, PHOTORESIST COMPOSITION INCLUDING THE PHOTOSENSITIVE POLYMER, AND METHOD OF MANUFACTURING THE INTEGRATED CIRCUIT DEVICE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 17858924 | METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF FORMING PATTERNS INCLUDING DEVELOPING STEP USING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 17858921 | COMPOSITION FOR REMOVING EDGE BEADS FROM METAL CONTAINING RESISTS, AND METHOD OF FORMING PATTERNS INCLUDING STEP OF REMOVING EDGE BEADS USING THE COMPOSITION | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 17405138 | PHOTORESIST COMPOSITIONS, METHODS FOR FORMING PATTERN USING THE SAME, AND METHODS FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | Final Rejection | Samsung Electronics Co., Ltd. |
| 17935185 | PHOTOSENSITIVE STRUCTURAL BODY AND METHOD OF PRODUCING THE PHOTOSENSITIVE STRUCTURAL BODY, AND INKJET RECORDING HEAD | Final Rejection | CANON KABUSHIKI KAISHA |
| 18485674 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND | Non-Final OA | FUJIFILM Corporation |
| 18214200 | PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND KIT | Non-Final OA | FUJIFILM Corporation |
| 18059205 | LAMINATE | Final Rejection | FUJIFILM Corporation |
| 18059198 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | Final Rejection | FUJIFILM Corporation |
| 17902404 | TRANSFER FILM, PHOTOSENSITIVE MATERIAL, PATTERN FORMING METHOD, MANUFACTURING METHOD OF CIRCUIT BOARD, AND MANUFACTURING METHOD OF TOUCH PANEL | Final Rejection | FUJIFILM Corporation |
| 18147472 | LIGHT RESPONSIVE PHOTORESISTS AND METHODS | Final Rejection | Intel Corporation |
| 19070505 | SEMICONDUCTOR PHOTORESIST COMPOSITION, METHOD FOR PREPARING THEREOF AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | Non-Final OA | SAMSUNG SDI CO., LTD. |
| 18404506 | ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18377117 | Onium Salt, Resist Composition, And Patterning Process | Non-Final OA | SHIN-ETSU CHEMICAL CO., LTD. |
| 18200892 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Final Rejection | Shin-Etsu Chemical Co., Ltd. |
| 18095235 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 17691352 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Final Rejection | Shin-Etsu Chemical Co., Ltd. |
| 17545062 | ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Final Rejection | Shin-Etsu Chemical Co., Ltd. |
| 18782565 | RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18757949 | PHOTORESIST FOR SEMICONDUCTOR FABRICATION | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18312199 | COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17726036 | PHOTORESIST COMPOSITION WITH NOVEL SOLVENT | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18783765 | EUV METALLIC RESIST PERFORMANCE ENHANCEMENT VIA ADDITIVES | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18500593 | SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 17429015 | FLEXOGRAPHIC PRINTING RAW PLATE AND MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE | Final Rejection | ASAHI KASEI KABUSHIKI KAISHA |
| 17909999 | NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION COMPRISING REFLECTANCE MODIFIER | Non-Final OA | Merck Patent GmbH |
| 18258533 | PHOTOSENSITIVE DRY FILM, LAMINATED FILM, METHOD FOR PRODUCING LAMINATED FILM, AND METHOD FOR PRODUCING PATTERNED RESIST FILM | Non-Final OA | TOKYO OHKA KOGYO CO., LTD. |
| 18256899 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | Final Rejection | TOKYO OHKA KOGYO CO., LTD. |
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