Prosecution Insights
Last updated: April 19, 2026
Application No. 17/487,045

POLISHING PAD AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

Final Rejection §103
Filed
Sep 28, 2021
Examiner
ZHANG, RUIYUN
Art Unit
1782
Tech Center
1700 — Chemical & Materials Engineering
Assignee
SK Enpulse Co. Ltd.
OA Round
2 (Final)
70%
Grant Probability
Favorable
3-4
OA Rounds
2y 11m
To Grant
80%
With Interview

Examiner Intelligence

Grants 70% — above average
70%
Career Allow Rate
743 granted / 1061 resolved
+5.0% vs TC avg
Moderate +10% lift
Without
With
+10.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 11m
Avg Prosecution
68 currently pending
Career history
1129
Total Applications
across all art units

Statute-Specific Performance

§103
48.0%
+8.0% vs TC avg
§102
23.7%
-16.3% vs TC avg
§112
20.4%
-19.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1061 resolved cases

Office Action

§103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . DETAILED ACTION Response to Amendment0 Applicant's amendments filed on 01/21/2026 have been entered. Claims 1-10 are currently under examination on the merits. Any rejections and/or objections made in the previous Office action and not repeated below are hereby withdrawn. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries set forth in Graham v. John Deere Co., 383 U.S. 1, 148 USPQ 459 (1966), that are applied for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. This application currently names joint inventors. In considering patentability of the claims the examiner presumes that the subject matter of the various claims was commonly owned as of the effective filing date of the claimed invention(s) absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and effective filing dates of each claim that was not commonly owned as of the effective filing date of the later invention in order for the examiner to consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2) prior art against the later invention. Claims 1-10 are rejected under 35 U.S.C. 103 as unpatentable over Miyasaka et al (JP 2016-196058A, ‘058 hereafter) in view of Kimura (US 2016/0059378, ‘378 hereafter). Regarding claims 1-5, ‘058 discloses a polishing pad comprising a polishing layer which comprises a cured product of a composition containing a reaction product of an isocyanate compound and a polyol compound ([0009], [0015], [0019]); wherein the isocyanate compound comprises aromatic diisocyanate compounds including 2,4-toluene diisocyanate (2,4-TDI) and/or 2,6-toluene diisocyanate (2,6-TDI) ([0022]), and specifically a 2,4-TDI as in the examples satisfying present claim 5 ([0049]-[0053], Examples), and the polyol compound comprises a low-molecular-weight polyol being diethylene glycol (DEG) having a weight- average molecular weight being 106 g/mol ([0023]-[0024], or [0031], molecular weight of DEG is 106 ) and a high-molecular-weight polyol being polytetramethylene glycol (PTMG1000) having a number-average molecular weight of 650 satisfying present claim 4 ([0023]-[0024], [0049], Example 1, it is noted that polyether generally formed from a step polymerization with a maximum polydispersity index of 2, thus the weight average molecular weight being less than 650x2=1300, falls in the presently claimed range, it also noted that present application uses PTMG1000 in the examples). ‘058 does not further set forth the isocyanate compound comprises both aromatic diisocyanate compounds 2,4-TDI and 2,6-TDI in content ratio of 1 to 40 parts of 2.6-TDI per 100parts of 2,4-TDI. However, in the same filed of endeavor, ‘378 discloses that these two aromatic diisocyanate compounds can be used together in a content ratio of 25/100 ([0020]-[0023]), [0087], Example 1, 20/80=25/100), to render a flexible polyurethane for polishing pad having adjusted Asker hardness higher than 35 and can be precisely sliced into a predetermined thickness ([0013]-[0016]). In light of these teachings, one of ordinary skill in the art would have been motivated to use 2,4-TDI and 2,6-TDI together as taught by ‘378, to modify the polyurethane-based polishing layer of ‘058, in order to render a polishing layer having sufficient Asker hardness and being capable of being precisely sliced into a desired thickness. Modified ‘058 does not expressly set forth the processed polishing layer (decomposed by KOH as in claim 1) and layer’s preliminary composition have a nuclear magnetic resonance (NMR) 13C spectrum with peaks and peak areas as recited in the present claims 1-3, however, since polishing layer of prior art formed from a composition of a urethane-based prepolymer, which has chemical structure units (Formed from TDIs, DEG and PTMG1000) being substantially identical to the urethane-based prepolymer as used in the present application (See Examples of present application), it is reasonable to expect that the processed polishing layer and the composition for forming the polishing layer would have the NMR 13C peaks and peak areas as presently claimed, because the NMR spectrum is directly depending from chemical structure of the urethane-based prepolymer, in absence of an objective showing to the contrary (See MPEP 2112). Regarding claim 6, modified ‘058 teaches all the limitations of claim 1, ‘058 also discloses that the isocyanate group (NCO) equivalent of the prepolymer is in a preferred range of 500 to 600, thus the isocyanate group by weight in the composition falls in the present claimed range of 5 to 11 wt% ([0026], molecular weight of NCO is 42, 42/500=8.4 wt%, 42/600=7.0 wt%). Regarding claims 7-9, modified ’058 teaches all the limitations of claim 1, but does not expressly set forth that the processed polishing layer having molecular weights and polydispersity index as claimed. However, modified ‘058 suggests a polishing layer formed from TDIs, DEG and PTMG1000, being substantially identical to the urethane-based prepolymer as used in the present application (See Examples of present application), it is reasonable to expect that the processed polishing layer would render a decomposed composition having molecular weights satisfying equation 1 and limitations as recited in the present claims 7 and 8, and polydispersity index satisfying present claim 9, in absence of an objective showing to the contrary (See MPEP 2112). Regarding claim 10, modified ’058 teaches all the limitation of claim 1, but does not expressly set forth that the polishing layer has a tensile strength and a hardness as recited in the claim, however, modified ‘058 suggests a polishing layer formed from TDIs, DEG and PTMG 1000, being substantially identical to the urethane-based prepolymer as used in the present application (See Examples of present application), it is reasonable to expect that the polishing layer would have possessed the same properties including tensile strength and hardness as presently claimed, in absence of an objective showing to the contrary (See MPEP 2112). Response to Arguments Applicant's arguments filed on 01/21/2026 have been fully considered but they are moot in view of the new grounds of rejection in light of Applicant's amendment. Conclusion Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to RUIYUN ZHANG whose telephone number is (571)270-7934. The examiner can normally be reached on 8:00-5:00 PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Arron Austin can be reached on 571-272-8935. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://pair-direct.uspto.gov. Should you have questions on access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative or access to the automated information system, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /RUIYUN ZHANG/Primary Examiner, Art Unit 1782
Read full office action

Prosecution Timeline

Sep 28, 2021
Application Filed
Oct 20, 2025
Non-Final Rejection — §103
Jan 21, 2026
Response Filed
Feb 09, 2026
Final Rejection — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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2y 5m to grant Granted Apr 14, 2026
Patent 12600891
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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
70%
Grant Probability
80%
With Interview (+10.2%)
2y 11m
Median Time to Grant
Moderate
PTA Risk
Based on 1061 resolved cases by this examiner. Grant probability derived from career allow rate.

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