Prosecution Insights
Prosecution Insights
5 pending office actions • 4 art units • 5 examiners • 0 of 5 (0%) have an AI response strategy ready • 18 patents granted in the last 365 days
Based on the USPTO statutory response window for each pending office action. 5 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 5 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 4 (80%) |
| §112 only | 1 (20%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| MARKOFF, ALEXANDER | 1 | 48.8% | +32.1% |
| SOTO, CHRISTOPHER ASHLEY | 1 | 53.1% | +29.3% |
| ZAWORSKI, JONATHAN R | 1 | 55.5% | +27.1% |
| PHAM, THOMAS T | 1 | 51.7% | +16.3% |
| ZHANG, RUIYUN | 1 | 70.2% | +10.2% |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 5 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17712945 | POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME | PHAM, THOMAS T | 17d overdue |
| 17487045 | POLISHING PAD AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | ZHANG, RUIYUN | 17d overdue |
| 17735244 | POLISHING PAD, MANUFACTURING METHOD THEREOF, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | ZAWORSKI, JONATHAN R | 5d overdue |
| 17874989 | POLISHING PAD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | SOTO, CHRISTOPHER ASHLEY | 4d overdue |
| 17888726 | METHOD OF CLEANING SUBSTRATE FOR BLANK MASK, SUBSTRATE FOR BLANK MASK, AND BLANK MASK INCLUDING THE SAME | MARKOFF, ALEXANDER | 22d |
| Art Unit | Apps |
|---|---|
| 3723 | 2 |
| 1711 | 1 |
| 1713 | 1 |
| 1782 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 17888726 | METHOD OF CLEANING SUBSTRATE FOR BLANK MASK, SUBSTRATE FOR BLANK MASK, AND BLANK MASK INCLUDING THE SAME | MARKOFF, ALEXANDER | 1711 | §103 | Non-Final OA | 22d | Pending | Aug 16, 2022 |
| 17874989 | POLISHING PAD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | SOTO, CHRISTOPHER ASHLEY | 3723 | §103 | Non-Final OA | 4d overdue | Pending | Jul 27, 2022 |
| 17735244 | POLISHING PAD, MANUFACTURING METHOD THEREOF, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | ZAWORSKI, JONATHAN R | 3723 | §103 | Non-Final OA | 5d overdue | Pending | May 03, 2022 |
| 17712945 | POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME | PHAM, THOMAS T | 1713 | §112 | Final Rejection | 17d overdue | Pending | Apr 04, 2022 |
| 17487045 | POLISHING PAD AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | ZHANG, RUIYUN | 1782 | §103 | Final Rejection | 17d overdue | Pending | Sep 28, 2021 |
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