Technology areas: Chemistry & Materials • Medical Devices & Mechanical Engineering
3 pending office actions • 3 art units • 3 examiners • 0 of 3 (0%) have an AI response strategy ready • 23 patents granted in the last 365 days
SK Enpulse Co. Ltd. has 3 pending office actions in the Chemistry & Materials technology area. These matters are spread across 3 distinct examiners and 3 distinct art units, suggesting a diverse range of subject matter within this technology sector. The distribution across 3 art units indicates that the company's chemistry-related innovations are being evaluated by different specialized groups within the patent office, which may lead to varying timelines and examination standards for each application.
The busiest examiner, ZAWORSKI, JONATHAN R, is responsible for 1 pending office action. With the busiest examiner pending count at 1 and the total pending office actions at 3, the workload is distributed among the assigned examiners. This spread of 1 action per examiner across 3 different units means the company is dealing with 3 separate sets of examination criteria. This variety in prosecution environments may require a multifaceted approach to managing the portfolio, as each of the 3 examiners will bring a unique perspective to the review process.
Based on the USPTO statutory response window for each pending office action. 2 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 1 (33%) |
| Multi-statute (no §101) | 2 (67%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| ZAWORSKI, JONATHAN R | 1 | 52.7% | +26.7% |
| CASE, SARAH CATHERINE | 1 | 41.1% | +50.8% |
| ZHANG, RUIYUN | 1 | 70.4% | +10.6% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17487045 | POLISHING PAD AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | ZHANG, RUIYUN | 17d overdue |
| 17564742 | POLISHING PAD, MANUFACTURING METHOD THEREOF, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | CASE, SARAH CATHERINE | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 3 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17487045 | POLISHING PAD AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | ZHANG, RUIYUN | 17d overdue |
| 17735244 | POLISHING PAD, MANUFACTURING METHOD THEREOF, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | ZAWORSKI, JONATHAN R | 5d overdue |
| 17564742 | POLISHING PAD, MANUFACTURING METHOD THEREOF, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | CASE, SARAH CATHERINE | — |
| Art Unit | Apps |
|---|---|
| 3723 | 1 |
| 1731 | 1 |
| 1782 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 17735244 | POLISHING PAD, MANUFACTURING METHOD THEREOF, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | ZAWORSKI, JONATHAN R | 3723 | §103 | Final Rejection | 5d overdue | Pending | May 03, 2022 |
| 17564742 | POLISHING PAD, MANUFACTURING METHOD THEREOF, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | CASE, SARAH CATHERINE | 1731 | §102§103 | Non-Final OA | — | Pending | Dec 29, 2021 |
| 17487045 | POLISHING PAD AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | ZHANG, RUIYUN | 1782 | §102§103 | Non-Final OA | 17d overdue | Pending | Sep 28, 2021 |
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