Prosecution Insights
Last updated: April 19, 2026
Application No. 17/662,641

NON CONDUCTIVE FILM, METHOD FOR FORMING NON CONDUCTIVE FILM, CHIP PACKAGE STRUCTURE, AND METHOD FOR PACKAGING CHIP

Non-Final OA §102
Filed
May 09, 2022
Examiner
ISAAC, STANETTA D
Art Unit
2898
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Changxin Memory Technologies Inc.
OA Round
3 (Non-Final)
86%
Grant Probability
Favorable
3-4
OA Rounds
2y 7m
To Grant
48%
With Interview

Examiner Intelligence

Grants 86% — above average
86%
Career Allow Rate
811 granted / 948 resolved
+17.5% vs TC avg
Minimal -38% lift
Without
With
+-37.9%
Interview Lift
resolved cases with interview
Typical timeline
2y 7m
Avg Prosecution
57 currently pending
Career history
1005
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
49.5%
+9.5% vs TC avg
§102
44.6%
+4.6% vs TC avg
§112
5.4%
-34.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 948 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Continued Examination Under 37 CFR 1.114 A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after final rejection. Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, the finality of the previous Office action has been withdrawn pursuant to 37 CFR 1.114. Applicant's submission filed on 12/30/25 has been entered. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1-5 and 10 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Hohlfeld et al. (US PGPub 2012/0080799, hereinafter referred to as “Hohlfeld”). Hohlfeld discloses the semiconductor device as claimed. See figures 1-17 and corresponding text, where Hohlfeld teaches, in claim 1, a Non Conductive Film (NCF), at least comprising: (figure 3; [0040-0045]) a first film layer (3) and a second film layer (4), wherein a surface of the first film layer is provided with a grid-shaped groove structure (31, 32), and a depth (portions contacting the layer (21) and the base (1)) of each groove of the groove structure is less than a thickness of the first film layer (3), the second film layer (4) is located in the groove in the surface of the first film layer (3), and a top surface of the second film layer (4) is flush with a top surface of the first film layer (3), (the examiner views that the grid shape (3) is embedded into the second layer (4) thus flushes all aspects) and fluidity of the first film layer is greater than fluidity of the second film layer under a same condition (the examiner views that the grid shape is embedded into the second layer (4) fluidity with thus flushes all aspects). Hohlfeld teaches, in claim 2, wherein the first film layer comprises a non-conductive material with a first preset concentration, and the second film layer comprises a non-conductive material with a second preset concentration, and wherein the second preset concentration is greater than the first preset concentration (figure 3; [0040-0045]). Hohlfeld teaches, in claim 3, wherein the first film layer has a first melting point, and the second film layer has a second melting point, and wherein the second melting point is greater than the first melting point (figure 3; [0040-0045]). Hohlfeld teaches, in claim 4, wherein the second film layer is at least located at a corner of the NCF, or the second film layer is at least located at a position adjacent to the corner (figure 3, [0040-0045] the second film layer is at least located at a position adjacent to the corner). Hohlfeld teaches, in claim 5, further comprising a supporting layer (1), wherein a first surface of the first film layer (3) is provided with a grid-shaped groove structure, wherein the first surface is any surface of the first film layer (3) in a thickness direction of the first film layer, and the supporting layer is located on a surface of the second film layer and a part of the first surface of the first film layer (figure 3; [0040-0045]). Hohlfeld teaches, in claim 10, a chip package structure, comprising: a chip stack structure (8), wherein the chip stack structure comprises a plurality of chips (8) stacked onto one another, and any two adjacent chips of the plurality of chips are bonded together through the NCF; and a substrate (1), wherein the chip stack structure is bonded to the substrate, and the NCF is filled between the substrate (1) and the chip stack structure (figure 15; [0066-0067]). Response to Arguments Applicant’s arguments rely on language solely recited in preamble recitations in claim(s) A Non Conductive Film (NCF). When reading the preamble in the context of the entire claim, the recitation A Non Conductive Film (NCF) is not limiting because the body of the claim describes a complete invention and the language recited solely in the preamble does not provide any distinct definition of any of the claimed invention’s limitations. Thus, the preamble of the claim(s) is not considered a limitation and is of no significance to claim construction. See Pitney Bowes, Inc. v. Hewlett-Packard Co., 182 F.3d 1298, 1305, 51 USPQ2d 1161, 1165 (Fed. Cir. 1999). See MPEP § 2111.02. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to STANETTA D ISAAC whose telephone number is (571)272-1671. The examiner can normally be reached M-F 10-6. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Leonard Chang can be reached at 571-270-3691. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /STANETTA D ISAAC/Examiner, Art Unit 2898 March 7, 2026
Read full office action

Prosecution Timeline

May 09, 2022
Application Filed
Dec 28, 2024
Non-Final Rejection — §102
Mar 22, 2025
Response Filed
Oct 06, 2025
Final Rejection — §102
Dec 01, 2025
Response after Non-Final Action
Dec 30, 2025
Request for Continued Examination
Jan 17, 2026
Response after Non-Final Action
Mar 07, 2026
Non-Final Rejection — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
86%
Grant Probability
48%
With Interview (-37.9%)
2y 7m
Median Time to Grant
High
PTA Risk
Based on 948 resolved cases by this examiner. Grant probability derived from career allow rate.

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