Prosecution Insights
Last updated: August 16, 2026
Application No. 17/814,718

CONDUCTIVE COMPOSITE, RESIST COATING MATERIAL, RESIST, AND METHOD FOR FORMING RESIST PATTERN

Final Rejection §102§103
Filed
Jul 25, 2022
Priority
Jan 29, 2020 — JP 2020-012623 +1 more
Examiner
CHU, JOHN S Y
Art Unit
1737
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Mitsubishi Chemical Corporation
OA Round
4 (Final)
77%
Grant Probability
Favorable
5-6
OA Rounds
0m
Est. Remaining
83%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allowance Rate
750 granted / 973 resolved
+12.1% vs TC avg
Moderate +6% lift
Without
With
+5.7%
Interview Lift
resolved cases with interview
Typical timeline
2y 11m
Avg Prosecution
50 currently pending
Career history
1036
Total Applications
across all art units

Statute-Specific Performance

§101
0.9%
-39.1% vs TC avg
§103
55.1%
+15.1% vs TC avg
§102
20.9%
-19.1% vs TC avg
§112
14.1%
-25.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 973 resolved cases

Office Action

§102 §103
DETAILED CORRESPONDENCE This Office action is in response to the amendment filed April 8, 2026. The rejection under 35 U.S.C. 103 as obvious over SAWAI et al (2015/0140492) is withdrawn in view of the amendment to claims 1, 3, 5, and 13 by defining the surfactant as non-ionic and has main chain hydrophilic portion having nitrogen containing functional groups and terminals hydrophobic groups. Bolded text is new to the office action. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries set forth in Graham v. John Deere Co., 383 U.S. 1, 148 USPQ 459 (1966), that are applied for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claim(s) 1-20 is/are rejected under 35 U.S.C. 102 (a) (1) as anticipated by or, in the alternative, under 35 U.S.C. 103 as obvious over FUKUDA et al (2018/0174698) and as evidence by UZAWA et al (JP-2002-226721A). The claimed invention now recites the following: PNG media_image1.png 472 658 media_image1.png Greyscale PNG media_image2.png 250 652 media_image2.png Greyscale FUKUDA et al report a conductive resin compositions in Table 1 that anticipates the claimed conductive composite on page 31, para, [0586], see Examples 1A through 5A below: PNG media_image3.png 274 378 media_image3.png Greyscale (A-1) is a defined as a conductive polymer having sulfonic acid groups and is the same or similar to the conductive polymer recited in claim 1, see para. [0573], below: PNG media_image4.png 282 382 media_image4.png Greyscale (C-1) is a surfactant that is the same or similar to the claimed non-ionic surfactant having a hydrophilic group with nitrogen and hydrophobic end groups, see para. [0581], below: PNG media_image5.png 428 384 media_image5.png Greyscale The parts by weight of the nonionic surfactant to the conductive polymer in Example 1A is 1 to 1, meeting claims 1 and 2. With respect to the critical micelle concentration, the identical surfactant as reported as Polymer (C-1) would have the same critical micelle concentration as claimed; thus, the rejection is inherent as the actual property is not disclosed in FUKUDA et al. The nonionic surfactant also preferred are the ones disclosed in UZAWA et al (JP-2002-226721A) as disclosed in Production Example 6 having hydrophobic-group terminated water-soluble polymer, dodecyl-terminated N-vinylpyrrolidone. ( reported in para. [0397] of FUKUDA et al.) Claims 2 to the content of the surfactant with respect to the conductive polymer is met in the Examples 1A through 5A of Table 1. Claims 3 and 4 for the content of the surfactant to the conductive polymer is met by the disclosure in para. [0364] wherein the mass % of the conductive polymer is 0.1 5 to 20% while the surfactant content can be 0.01 % to 50% demonstrating that more of the surfactant polymer is in the conductive composition. Claims 5 and 13 are reported in Polymer (C-1) above for the hydrophobic terminal group. Claims 6 and 7, 14, and 15 are reported on page 22, para. [0389] wherein the acid dissociation constant, the molecular weight and the content is inherent based on the same or similar basic compounds disclosed in Table 5. Claims 8 and 16 to the conductive polymer having an acid group is found in the para. [0573] above. Claims 9 and 17 recites a surface resistivity which is less than 1 x 1010 Ω/□ which is disclosed in Tables 2,5 and 6 of FUKUDA et al, see below: PNG media_image6.png 206 522 media_image6.png Greyscale PNG media_image7.png 312 632 media_image7.png Greyscale PNG media_image8.png 332 564 media_image8.png Greyscale Claims 10, 11, 18 and 19 are disclosed in Table 1 wherein the Examples form a coating material. Claims 12 and 20 to the method is found in para. [0431]. It would have been prima facie obvious to one of ordinary skill in the art of conductive composition to duplicate the conductive film of FUKUDA et al with the reasonable expectation of same or similar results for excellent antistatic performance and excellent application properties, does not adversely affect a resist and is suitable for electron beam lithography. Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to JOHN S CHU whose telephone number is (571)272-1329. The examiner can normally be reached M-F, IFP-Flex. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Mark Huff, can be reached at telephone number 571-272-1385. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://portal.uspto.gov/external/portal. Should you have questions about access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. /John S. Chu/ Primary Examiner, Art Unit 1737 J. Chu June 22, 2026
Read full office action

Prosecution Timeline

Show 1 earlier event
Mar 13, 2025
Non-Final Rejection mailed — §102, §103
Jun 13, 2025
Response Filed
Sep 24, 2025
Final Rejection mailed — §102, §103
Dec 23, 2025
Request for Continued Examination
Dec 28, 2025
Response after Non-Final Action
Jan 08, 2026
Non-Final Rejection mailed — §102, §103
Apr 08, 2026
Response Filed
Jun 25, 2026
Final Rejection mailed — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12704781
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
3y 1m to grant Granted Aug 11, 2026
Patent 12699320
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
2y 12m to grant Granted Aug 04, 2026
Patent 12692218
RESIST MATERIAL AND PATTERN FORMING METHOD
1y 10m to grant Granted Jul 28, 2026
Patent 12681385
PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURING METHOD OF DISPLAY DEVICE USING THE SAME
3y 12m to grant Granted Jul 14, 2026
Patent 12663714
RESIST COMPOSITION AND PATTERN FORMING PROCESS
2y 11m to grant Granted Jun 23, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

5-6
Expected OA Rounds
77%
Grant Probability
83%
With Interview (+5.7%)
2y 11m (~0m remaining)
Median Time to Grant
High
PTA Risk
Based on 973 resolved cases by this examiner. Grant probability derived from career allowance rate.

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