Prosecution Insights
Last updated: April 19, 2026
Application No. 17/819,039

METHOD FOR MANUFACTURING OXIDE FILM, METHOD FOR MANUFACTURING SEMICONDUCTOR MEMORY DEVICE, SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR MEMORY DEVICE

Non-Final OA §112
Filed
Aug 11, 2022
Examiner
CHI, SUBERR L
Art Unit
2893
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Kioxia Corporation
OA Round
3 (Non-Final)
84%
Grant Probability
Favorable
3-4
OA Rounds
2y 10m
To Grant
87%
With Interview

Examiner Intelligence

Grants 84% — above average
84%
Career Allow Rate
538 granted / 640 resolved
+16.1% vs TC avg
Minimal +3% lift
Without
With
+2.9%
Interview Lift
resolved cases with interview
Typical timeline
2y 10m
Avg Prosecution
22 currently pending
Career history
662
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
49.8%
+9.8% vs TC avg
§102
11.1%
-28.9% vs TC avg
§112
33.2%
-6.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 640 resolved cases

Office Action

§112
DETAILED ACTION Notice of AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Continued Examination Under 37 CFR 1.114 A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after final rejection. Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, the finality of the previous Office action has been withdrawn pursuant to 37 CFR 1.114. Applicant's submission filed on January 27, 2026 has been entered. Response to Arguments The Applicant’s remarks with respect to claims #1-3, 5-11, 13, and 29-34 in the reply filed on January 27, 2026 have been carefully considered, but are moot in view of the new grounds of rejection. Claim Rejections – 35 U.S.C. § 112(b) The following is a quotation of 35 U.S.C. § 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. Claims 1-3, 5-11, 13, and 29-34 are rejected under 35 U.S.C. § 112(b) or pre-AIA 35 U.S.C. § 112, second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor, or for pre-AIA the applicant, regards as the invention. As to claims 1 and 6, it is unclear what is meant by “an element having a concentration higher than concentrations of aluminum (Al) and oxygen (O) is not present among elements contained in the aluminum oxide film”. If an element is not present among elements contained in the aluminum oxide film then it is unclear how this element is relevant to the invention. Is the element even present in the aluminum oxide film? Applicant’s published specification paragraphs [0056] and [0060] do not clarify this issue. Claims 1 and 6 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being incomplete for omitting essential elements, such omission amounting to a gap between the elements. See MPEP § 2172.01. The omitted elements are: the relationship between the element having a concentration higher than concentrations of Al and O and the [other] elements contained in the aluminum oxide film and the aluminum oxide film itself. No Prior Art Applied The Examiner was unable to find prior art applicable to the claims as presently written in view of the very unclear claim language. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to SUBERR CHI whose telephone number is (571)270-3955. The examiner can normally be reached 10am to 6pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Sue Purvis can be reached on (571) 272-1236. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /SUBERR L CHI/Primary Examiner, Art Unit 2893
Read full office action

Prosecution Timeline

Aug 11, 2022
Application Filed
May 01, 2025
Non-Final Rejection — §112
Jul 28, 2025
Examiner Interview Summary
Jul 28, 2025
Applicant Interview (Telephonic)
Jul 30, 2025
Examiner Interview Summary
Aug 06, 2025
Response Filed
Oct 21, 2025
Final Rejection — §112
Jan 27, 2026
Request for Continued Examination
Feb 04, 2026
Response after Non-Final Action
Feb 20, 2026
Non-Final Rejection — §112 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12603479
METHOD OF MANUFACTURING VERTICAL-CAVITY SURFACE-EMITTING LASER ELEMENT
2y 5m to grant Granted Apr 14, 2026
Patent 12598766
Contact Interface Engineering for Reducing Contact Resistance
2y 5m to grant Granted Apr 07, 2026
Patent 12593676
SEMICONDUCTOR DEVICE WITH METAL SPACERS AND METHOD FOR FABRICATING THE SAME
2y 5m to grant Granted Mar 31, 2026
Patent 12581662
SEMICONDUCTOR DEVICE AND ELECTRONIC SYSTEM INCLUDING THE SAME
2y 5m to grant Granted Mar 17, 2026
Patent 12568828
METHOD AND SYSTEM FOR FABRICATING REGROWN FIDUCIALS FOR SEMICONDUCTOR DEVICES
2y 5m to grant Granted Mar 03, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
84%
Grant Probability
87%
With Interview (+2.9%)
2y 10m
Median Time to Grant
High
PTA Risk
Based on 640 resolved cases by this examiner. Grant probability derived from career allow rate.

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