Prosecution Insights
Last updated: July 17, 2026
Application No. 17/875,397

SEMICONDUCTOR DEVICE INCLUDING WRITE TRANSISTOR AND READ TRANSISTOR

Non-Final OA §102§103
Filed
Jul 27, 2022
Priority
Mar 14, 2022 — RE 10-2022-0031716
Examiner
SMITH, BRADLEY
Art Unit
2817
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
SK hynix Inc.
OA Round
1 (Non-Final)
80%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
77%
With Interview

Examiner Intelligence

Grants 80% — above average
80%
Career Allowance Rate
709 granted / 889 resolved
+11.8% vs TC avg
Minimal -3% lift
Without
With
+-3.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
31 currently pending
Career history
920
Total Applications
across all art units

Statute-Specific Performance

§101
1.1%
-38.9% vs TC avg
§103
69.3%
+29.3% vs TC avg
§102
6.8%
-33.2% vs TC avg
§112
14.6%
-25.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 889 resolved cases

Office Action

§102 §103
DETAILED ACTION Examiner’s Note The prior arts cited in PTO-892 but not used in the current rejection are related to the claimed novelty. Applicant is reminded that the Examiner is entitled to give the broadest reasonable interpretation to the language of the claims. Furthermore, the Examiner is not limited to Applicants' definition which is not specifically set forth in the claims. See MPEP 2111, 2123, 2125, 2141.02 VI, and 2182. Examiner has cited particular paragraphs, columns and line numbers in the references applied to the claims above for the convenience of the applicant. Although the specified citations are representative of the teachings of the art and are applied to specific limitations within the individual claim, other passages and figures may apply as well. It is respectfully requested from the applicant in preparing responses, to fully consider the references in their entirety as potentially teaching all or part of the claimed invention, as well as the context of the passage as taught by the prior art or disclosed by the Examiner. See MPEP 2141.02 VI. In the case of amending the claimed invention, Applicant is respectfully requested to indicate the portion(s) of the specification which dictate(s) the structure relied on for proper interpretation and also to verify and ascertain the metes and bounds of the claimed invention. Election/Restrictions Applicant’s election without traverse of species A/fig. 1-5, reflected in claims 1-9 in the reply filed on 02/27/2026 is acknowledged. Claims 10-22 are withdrawn from further consideration pursuant to 37 CFR 1.142 (b), as being drawn to the nonelected group. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-2 and 7-8 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Sharma et al. (US 20200091156 A1, hereinafter Sharma‘156). Regarding independent claim 1, Sharma‘156 teaches, “A semiconductor device (1-9; ¶ [0001] - ¶ [0176]) comprising a read transistor (220, fig. 4A-4B) and a write transistor (210) that are electrically connected to each other over a substrate (452, see annotated fig. 4A), wherein the read transistor (220) comprises: a read channel layer (402) disposed on a plane over the substrate (452); a read gate dielectric layer (406) disposed over the read channel layer (402); and a read gate electrode layer (413) disposed over the read gate dielectric layer (406), and wherein the write transistor (210) comprises: PNG media_image1.png 700 733 media_image1.png Greyscale a write channel layer (402) disposed over a portion of the read gate electrode layer (413); a write bit line (WBL) disposed on an upper surface of the write channel layer (402); a write gate dielectric layer (406) disposed on a side surface of the write channel layer (402); and a write word line (413, WWL) disposed to be adjacent to the write gate dielectric layer (406)”. Regarding claim 2, Sharma‘156 further teaches, “The semiconductor device of claim 1, wherein the read channel layer (220/402), the read gate dielectric layer (220/406), and the read gate electrode layer (220/413) are disposed on a plane that is substantially parallel to a surface of the substrate (see annotation)”. Regarding claim 4, Sharma‘156 further teaches, “The semiconductor device of claim 1, wherein the read gate electrode layer (220/413), the read gate dielectric layer (220/406), and the read channel layer (220/402) are disposed to overlap with each other in a direction substantially perpendicular to the surface of the substrate (see annotation)”. Regarding claim 5, Sharma‘156 further teaches, “The semiconductor device of claim 1, wherein the read gate dielectric layer comprises an antiferroelectric material (¶ [0069] - ¶ [0070])”. Regarding claim 6, Sharma‘156 further teaches, “The semiconductor device of claim 1, wherein the read gate dielectric layer comprises a paraelectric material having a high dielectric constant (¶ [0069] - ¶ [0070])”. Regarding claim 7, Sharma‘156 further teaches, “The semiconductor device of claim 1, further comprising a read word line (RWL2, RWL1) and a read bit line (RBL) that are respectively disposed at opposite ends of the read channel layer (220/402) and that extend in a first direction (Y) substantially parallel to the surface of the substrate”. Regarding claim 8, Sharma‘156 further teaches, “The semiconductor device of claim 7, wherein the write bit line (WBL1, fig. 4B) extends in a second direction (X) substantially parallel to the surface of the substrate and perpendicular to the first direction (Y), and wherein the write word line (WWL) extends in a third direction (Z) substantially perpendicular to the surface of the substrate”. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claim 3 is rejected under 35 U.S.C. 103 as being unpatentable over Sharma‘156 as applied to claim 1 as above, and further in view of Sano et al. (US 20070063287 A1, hereinafter Sano‘287). Regarding claim 3, Sharma‘156 teaches all the limitations described in claim 1. But Sharma‘156 is silent upon the provision of wherein 3. The semiconductor device of claim 1, wherein a cross-sectional area of the read gate electrode layer is greater than a cross-sectional area of the write channel layer on a cross-sectional plane that is substantially parallel to the surface of the substrate. However, Sano‘287 teaches a similar memory device, wherein a cross-sectional area of the read gate electrode layer (2G, fig. 62) is greater than a cross-sectional area of the write channel layer (4, fig. 3) on a cross-sectional plane that is substantially parallel to the surface of the substrate. Sharma‘156 and Sano‘287 are analogous art because they both are directed to semiconductor devices and one of ordinary skill in the art would have had a reasonable expectation of success to modify Sharma‘156 with the features of Sano‘287 because they are from the same field of endeavor. It would have been obvious to one of ordinary skill in the art before the effective filling date of the invention to combine the teachings of Sharma‘156 and Sano‘287 to form the read gate and write channel with claimed cross-sectional area according to the teachings of Sano‘287 with a motivation of achieving high integration of the read transistor cells. See Sano‘287, ¶ [0002] - ¶ [0010]. Claim 8 is rejected under 35 U.S.C. 103 as being unpatentable over Sharma‘156. Regarding claim 9, “The semiconductor device of claim 8, wherein a conductive carrier conducts in the second direction in the read channel layer, and the conductive carrier conducts in the third direction in the write channel layer”, Sharma‘156 teaches all the elements as claimed in claim 1 and 9 including the read channel layer and write channel layer. As the applicant’s claimed device and the device taught by Sharma‘156 teach a same structure, this is naturally recognized that the read channel layer and the write channel layer will possess the functionally of conducting conductive carriers. See MPEP § 2114.I. While features of an apparatus may be recited either structurally or functionally, claims directed to an apparatus must be distinguished from the prior art in terms of structure rather than function alone. If the examiner has a "reason to believe" that a functional limitation can be performed inherently without modification by the prior art structure, the examiner should establish a prima facie case, and then shift the burden to the applicant to prove otherwise. See In re Swinehart, 169 USPQ 226 (CCPA 1971); In re Schreiber, 44 USPQ2d 1429 (Fed. Cir. 1997). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to MOHAMMAD M HOQUE whose telephone number is (571)272-6266 and email address is mohammad.hoque@uspto.gov. The examiner can normally be reached 9AM-7PM EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Kretelia Graham can be reached on (571) 272-5055. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /MOHAMMAD M HOQUE/Primary Examiner, Art Unit 2817
Read full office action

Prosecution Timeline

Jul 27, 2022
Application Filed
May 05, 2026
Non-Final Rejection mailed — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
80%
Grant Probability
77%
With Interview (-3.2%)
2y 5m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 889 resolved cases by this examiner. Grant probability derived from career allowance rate.

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