Prosecution Insights
Last updated: April 19, 2026
Application No. 17/889,136

METHOD FOR TREATING OBJECT TO BE TREATED AND TREATMENT LIQUID

Non-Final OA §103
Filed
Aug 16, 2022
Examiner
PHAM, THOMAS T
Art Unit
1713
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Fujifilm Corporation
OA Round
3 (Non-Final)
52%
Grant Probability
Moderate
3-4
OA Rounds
3y 3m
To Grant
67%
With Interview

Examiner Intelligence

Grants 52% of resolved cases
52%
Career Allow Rate
292 granted / 565 resolved
-13.3% vs TC avg
Strong +15% interview lift
Without
With
+15.3%
Interview Lift
resolved cases with interview
Typical timeline
3y 3m
Avg Prosecution
69 currently pending
Career history
634
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
49.1%
+9.1% vs TC avg
§102
17.6%
-22.4% vs TC avg
§112
30.3%
-9.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 565 resolved cases

Office Action

§103
DETAILED ACTION This is the Office action based on the 17889136 application filed August 16, 2022, and in response to applicant’s argument/remark filed on January 28, 2026. Claims 1-24 and 28 are currently pending and have been considered below. Applicant’s cancellation of claims 25-27 acknowledged. Claims 1-16 withdrawn from consideration. Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. Continued Examination Under 37 CFR 1.114 A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after final rejection. Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, the finality of the previous Office action has been withdrawn pursuant to 37 CFR 1.114. Applicant's submission filed on March 5, 2026 has been entered. Claim Interpretations Applicant has elected Group II, which is drawn to a chemical composition, in response to the Election/Restriction requirement. Note that the claims are directed towards a chemical composition and as such will be examined under such conditions. The process of using the composition or the material that the composition acts upon are viewed as recitation of intended use and are given little patentable weight (Please see MPEP 2114 R1-2115 R2 for further details). It has been held that claim language that simply specifies an intended use or field of use for the invention generally will not limit the scope of a claim (See MPEP 2106; Walter, 618 F.2d at 769, 205 USPQ at 409). When apparatus is capable of performing such functions, it is considered to meet the claim limitations. Additionally, in apparatus claims, intended use must result in a structural difference between the claimed invention and the prior art in order to patentably distinguish the claimed invention from the prior art. If the prior art structure is capable of performing the intended use, then it meets the claim (See MPEP 2111.02, 2115; In re Casey, 152 USPQ 235 (CCPA 1967); In re Otto, 136 USPQ 458,459 (CCPA 1963). When the structure recited in the reference is substantially identical to that of the claims, claimed properties or functions are presumed to be inherent (See MPEP 2112.01; In re Best, 562 F.2d 1252, 1255, 195 USPQ 430,433 (CCPA 1977). It has further been held that expressions relating the apparatus to contents thereof during an intended operation are of no significance in determining patentability of the apparatus claim. Ex parte Thibault, 164 USPQ 666, 667 (Bd. App. 1969); and the inclusion of material or article worked upon by a structure being claimed does not impart patentability to the claims. In re Young, 75 F.2d 966, 25 USPQ 69 (CCPA 1935) (as restated in In re Otto, 312 F.2d 937, 136 USPQ 458, 459 (CCPA 1963)). While features of an apparatus may be described either structurally or functionally, claims directed to an apparatus MUST be distinguished from prior art in terms of structure rather than function (See MPEP §2114). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102 of this title, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries set forth in Graham v. John Deere Co., 383 U.S. 1, 148 USPQ 459 (1966), that are applied for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claims 17-24 and 28 rejected under 35 U.S.C. 103 as being obvious over Takahashi et al. (U.S. PGPub. No. 20160056054), hereinafter “Takahashi”:--Claims 17, 19, 23, 24: Takahashi teaches an etching composition (Claim 15) for etching a cobalt layer (abstract), comprising one or more organic solvent ([0278, 0304]), wherein the organic solvent may include an alcohol compound, such as 2-butanol ([0279-0284]), presented at a concentration 50-98 wt.% ([0303]);oxalic acid, presented at a concentration 0.1-20 wt.% ([0314-0316]). Therefore, it would have been obvious to one of ordinary skill in the art at the effective filing date of the invention, in routine experimentations, to select oxalic acid and beta-diketone, among the list of possible compounds, for the polishing composition in the invention of Takahashi. It is noted that 2-butanol is an alcohol having 4 carbon atoms, and oxalic is an aliphatic dicarboxylic acid having 2 carbon atoms.--Claim 18: Applicant has elected Group II, which is drawn to a chemical composition, in response to the Election/Restriction requirement. Note that the claims are directed towards a chemical composition and as such will be examined under such conditions. The process of using the composition or the material that the composition acts upon are viewed as recitation of intended use and are given little patentable weight (Please see MPEP 2114 R1-2115 R2 for further details). It is noted that since the etching composition taught by Takahashi is the same as Applicant’s , it must be capable of etching a cobalt oxide layer, as taught by Applicant.--Claims 20, 21: Takahashi further teaches that water may be presented as a concentration 0.1 wt.% to 50 wt.% ([0322]).--Claim 22: It is noted that an etching composition containing 0.1 wt.% may be considered substantially does not contain water.--Claim 28: Takahashi does not teach adding any Ni or Cu to the etching composition. Therefore, it would have been obvious to one of ordinary skill in the art at the effective filing date of the invention, in routine experimentations, to form an etching composition containing less than 10 ppb of Ni or Cu. Response to Arguments Applicant's arguments filed January 28, 2026 have been fully considered as follows:--Regarding Applicant’s argument that the previously cited prior arts do not teach the amended features, this arguments is not persuasive. While Zandi and Misra fail to teach all those features, Takahashi clearly teaches those features, as shown above. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to THOMAS PHAM whose telephone number is (571) 270-7670 and fax number is (571) 270-8670. The examiner can normally be reached on MTWThF9to6 PST. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Joshua Allen can be reached on (571) 270-3176. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://pair-direct.uspto.gov. Should you have questions on access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative or access to the automated information system, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /THOMAS T PHAM/Primary Examiner, Art Unit 1713
Read full office action

Prosecution Timeline

Aug 16, 2022
Application Filed
May 31, 2025
Non-Final Rejection — §103
Aug 27, 2025
Response Filed
Oct 28, 2025
Final Rejection — §103
Jan 28, 2026
Response after Non-Final Action
Mar 05, 2026
Request for Continued Examination
Mar 10, 2026
Response after Non-Final Action
Mar 14, 2026
Non-Final Rejection — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12604743
METHOD FOR MAKING A RECESS OR OPENING INTO A PLANAR WORKPIECE USING SUCCESSIVE ETCHING
2y 5m to grant Granted Apr 14, 2026
Patent 12599003
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2y 5m to grant Granted Apr 07, 2026
Patent 12590249
ETCHANT COMPOSITION
2y 5m to grant Granted Mar 31, 2026
Patent 12593634
SELECTIVE GAS PHASE ETCH OF SILICON GERMANIUM ALLOYS
2y 5m to grant Granted Mar 31, 2026
Patent 12575361
METHOD OF ETCHING THIN FILM AND SUBSTRATE PROCESSING APPARATUS
2y 5m to grant Granted Mar 10, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
52%
Grant Probability
67%
With Interview (+15.3%)
3y 3m
Median Time to Grant
High
PTA Risk
Based on 565 resolved cases by this examiner. Grant probability derived from career allow rate.

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