Prosecution Insights
Last updated: August 18, 2026
Application No. 17/893,718

FOLDED STAIRCASE VIA ROUTING FOR MEMORY

Final Rejection §103
Filed
Aug 23, 2022
Examiner
TRAN, TONY
Art Unit
2893
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Micron Technology Inc.
OA Round
4 (Final)
71%
Grant Probability
Favorable
5-6
OA Rounds
0m
Est. Remaining
99%
With Interview

Examiner Intelligence

Grants 71% — above average
71%
Career Allowance Rate
615 granted / 870 resolved
+2.7% vs TC avg
Strong +34% interview lift
Without
With
+33.6%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
48 currently pending
Career history
923
Total Applications
across all art units

Statute-Specific Performance

§101
0.8%
-39.2% vs TC avg
§103
60.5%
+20.5% vs TC avg
§102
33.3%
-6.7% vs TC avg
§112
3.7%
-36.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 870 resolved cases

Office Action

§103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 10, 12-14, 17-18 and 26-27, 28 is/are rejected under 35 U.S.C. 103 as being unpatentable over SHIMOMURA (Pub. No.: US 2022/0302146). PNG media_image1.png 699 1537 media_image1.png Greyscale Re claim 10, SHIMOMURA, FIGS. 42C-D [as shown above] teaches an apparatus, comprising: a set of word lines (146/246, ¶ [0205]) extending in a first direction; a first via [FV] in a trench (265) wherein the first via [FV] extends in a second direction (vertical) different than the first direction (horizontal), wherein the trench (265) extends through at least a portion of the set of word lines (upper sets of word lines 246), and wherein the first via [FV] is surrounded by a first dielectric line ([FDL]/52 on the right); a second via (76) in the trench (265), wherein the second via extends in the second direction (vertical) and is coupled with a word line of the set of word lines (146/246), and wherein the second via (76B) is surrounded by a second dielectric liner (76A); and a third via [TV] in the trench (265), wherein the second via [SV] is between the first via [FV] and the third via [TV] along the first direction (horizontal), wherein the first via ([FV], by dielectric layer 52 of FIG. 11B, [0177]) and the third via ([TV], by dielectric layer 52 on the left) are electrically isolated from the word line of the set of word lines (146/246), and wherein the third via (TV] is surrounded by a third dielectric liner [TDL], a thickness of the second dielectric liner (76A) being greater than a thickness of the first dielectric liner ([FDL] on the DRAWING SCALE) and greater than a thickness of the third dielectric liner [TDL]. In re claim 10, however, Drawings and pictures can anticipate claims if they clearly show the structure which is claimed. In re Mraz, 455 F.2d 1069, 173 USPQ 25 (CCPA 1972). However, the picture must show all the claimed structural features and how they are put together. Jockmus v. Leviton, 28 F.2d 812 (2d Cir. 1928). The origin of the drawing is immaterial. For instance, drawings in a design patent can anticipate or make obvious the claimed invention as can drawings in utility patents. When the reference is a utility patent, it does not matter that the feature shown is unintended or unexplained in the specification. The drawings must be evaluated for what they reasonably disclose and suggest to one of ordinary skill in the art. In re Aslanian, 590 F.2d 911, 200 USPQ 500 (CCPA 1979). See MPEP § 2121.04 for more information on prior art drawings as “enabled disclosures.” Re claim 12, SHIMOMURA, FIGS. 42C-D teaches the apparatus of claim 10, wherein the second via being coupled with the word line [FWL] is based at least in part on a first material (76A) surrounding the second via contacting the trench at a first level of the trench along the second direction. Re claim 13, SHIMOMURA, FIGS. 42C-D teaches the apparatus of claim 10, further comprising: a first contact [FC] and a second contact [SC] on the trench, wherein the first contact and the second contact are aligned along the first direction, wherein the first contact contacts the trench at a first level of the trench along the second direction (horizontal). Re claim 14, SHIMOMURA, FIGS. 42C-D teaches the apparatus of claim 13, wherein: the second contact [SC] is coupled with a fourth via [FourV], and the fourth via is aligned with the second via along a third direction (Z-direction) different than the first direction and the second direction. Re claim 17, SHIMOMURA, FIGS. 42C-D teaches the apparatus of claim 10, wherein the second dielectric liner comprises an oxide material (76A, [0207]). Re claim 18, SHIMOMURA, FIGS. 42C-D teaches the apparatus of claim 10, wherein the second contact via structure (76B, ¶ [0264]). SHIMOMURA differs from the invention by not showing wherein the second via comprises titanium, or titanium nitride, or tungsten, or any combination thereof. However, it would have been obvious to one having ordinary skill in the art at the time of the invention was made to include the above said teaching because SHIMOMURA paragraph [0214] does disclosed “The at least one conductive material can include, for example, a metallic barrier material (such as TiN, TaN, and/or WN) and a metallic fill material (such as W, Cu, Mo, Co, Ru, etc.)” since it has been held to be within the general skill of a worker in the art to select a known material on the basis of its suitability for the intended use as a matter of obvious design choice. In re Leshin, 277 F.2d 197, 125 USPQ 416. Re claim 26, SHIMOMURA, FIG. 42D [as shown above] teaches the apparatus of claim 10, wherein the first via [FV] penetrates a first wall of the trench (right wall of 265), the second via [SV] penetrates a floor of the trench (bottom of 265), and the third via [TV] penetrates a second wall of the trench (left wall of 265). Re claim 27, SHIMOMURA, FIGS. 42C-D teaches the apparatus of claim 26, wherein the first wall of the trench (right wall of 265) and the second wall (left wall of 265) of the trench are coated in an oxide material (oxide material of 232, [0364), and the floor of the trench (contact 246/146) is not coated in the oxide material. Re claim 28, SHIMOMURA, FIGS. 42C-D teaches the apparatus of claim 10, further comprising a staircase contact coupled (electrically thru 61) with the second via [SV] by a connection that comprises metal routing (76B), wherein the staircase contact is coupled with the word line (246, [0205]) through the second via. Claim(s) 10, 17 and 26-27, 28 is/are rejected under 35 U.S.C. 103 as being unpatentable over SHIN (Pub. No.: US 2022/0406714) in view of SHIMOMURA PNG media_image2.png 662 1065 media_image2.png Greyscale Re claim 10, SHIN, FIG. 32 [as shown above] teaches an apparatus, comprising: a set of word lines ¶ [0065] extending in a first direction; a first via [FV] in a trench [T] wherein the first via [FV] extends in a second direction (vertical) different than the first direction (horizontal), and wherein the trench [T] extends through at least a portion of the set of word lines ¶ [0065]; a second via [SV] in the trench [T], wherein the second via extends in the second direction (vertical) and is coupled with a word line of the set of word lines; and a third via [TV] in the trench (265), wherein the second via [SV] is between the first via [FV] and the third via [TV] along the first direction (horizontal), and wherein the first via [FV] and the third via [TV] are electrically isolated (by dielectric layer 202c, [0035]) from the word line of the set of word lines. SHIN fails to teach wherein the first via is surrounded by a first dielectric line; wherein the second via is surrounded by a second dielectric liner; and wherein the third via is surrounded by a third dielectric liner, a thickness of the second dielectric liner being greater than a thickness of the first dielectric liner and greater than a thickness of the third dielectric liner. SHIMOMURA teaches wherein the first via [FV] is surrounded by a first dielectric line ([FDL]/52 on the right); wherein the second via (76B) is surrounded by a second dielectric liner (76A); and wherein the third via (TV] is surrounded by a third dielectric liner [TDL], a thickness of the second dielectric liner (76A) being greater than a thickness of the first dielectric liner ([FDL] on the DRAWING SCALE) and greater than a thickness of the third dielectric liner [TDL]. It would have been obvious for a person of ordinary skill in the art before the effective filing date of the claim invention to include the above said teaching for the purpose of enhancing the electrical contract through stack structure as taught by SHIMOMURA, [0006]. Re claim 17, in the combination, SHIMOMURA, FIGS. 42C-D teaches the apparatus of claim 10, wherein the second dielectric liner comprises an oxide material (76A, [0207]). Re claim 26, in the combination, SHIN, FIG. 32 [as shown above] teaches the apparatus of claim 10, wherein the first via [FV] penetrates a first wall of the trench (right side wall of [T]), the second via [SV] penetrates a floor of the trench (bottom of [T]), and the third via [TV] penetrates a second wall of the trench (left side wall of [T]). Re claim 27, in the combination, SHIN, FIG. 4 teaches the apparatus of claim 26, wherein the first wall of the trench and the second wall of the trench are coated in an oxide material (oxide material of 110, [0090]), and the floor of the trench (contact 240 of metal material) is not coated in the oxide material. Re claim 28, in the combination, SHIN, FIG. 4 teaches the apparatus of claim 10, further comprising a staircase contact coupled with the second via [SV] by a connection that comprises metal routing (314, FIG. 28, [0071]), wherein the staircase contact is coupled with the word line (240, [0031]) through the second via. Response to Arguments Applicant's arguments filed 06/12/2026 have been fully considered but they are moot due to a new ground of rejection [due to the new matching elements] and under 103 rejections. Conclusion Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to TONY TRAN whose telephone number is (571)270-1749. The examiner can normally be reached Monday-Friday, 8AM-5PM, EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Britt Hanley can be reached at 571-270-3042. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /TONY TRAN/Primary Examiner, Art Unit 2893
Read full office action

Prosecution Timeline

Show 2 earlier events
Sep 25, 2025
Response Filed
Nov 17, 2025
Final Rejection mailed — §103
Jan 20, 2026
Response after Non-Final Action
Feb 03, 2026
Request for Continued Examination
Feb 10, 2026
Response after Non-Final Action
Mar 13, 2026
Non-Final Rejection mailed — §103
Jun 12, 2026
Response Filed
Aug 03, 2026
Final Rejection mailed — §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

5-6
Expected OA Rounds
71%
Grant Probability
99%
With Interview (+33.6%)
2y 9m (~0m remaining)
Median Time to Grant
High
PTA Risk
Based on 870 resolved cases by this examiner. Grant probability derived from career allowance rate.

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