Prosecution Insights
Last updated: April 19, 2026
Application No. 17/954,215

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND JIG SET

Non-Final OA §103
Filed
Sep 27, 2022
Examiner
VALENZUELA, PATRICIA D
Art Unit
2812
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Fuji Electric Co. Ltd.
OA Round
1 (Non-Final)
90%
Grant Probability
Favorable
1-2
OA Rounds
2y 4m
To Grant
92%
With Interview

Examiner Intelligence

Grants 90% — above average
90%
Career Allow Rate
645 granted / 715 resolved
+22.2% vs TC avg
Minimal +2% lift
Without
With
+2.1%
Interview Lift
resolved cases with interview
Typical timeline
2y 4m
Avg Prosecution
63 currently pending
Career history
778
Total Applications
across all art units

Statute-Specific Performance

§101
1.3%
-38.7% vs TC avg
§103
60.1%
+20.1% vs TC avg
§102
19.9%
-20.1% vs TC avg
§112
8.6%
-31.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 715 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of claims 1-11 in the reply filed on 10/29/25 is acknowledged. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1-11 is/are rejected under 35 U.S.C. 103 as being unpatentable over Nishida(USPGPUB DOCUMENT: 2019/0189529, hereinafter Nishida) in view of Nakamura (USPGPUB DOCUMENT: 2019/0287887, hereinafter Nakamura). Re claim 1 Nishida discloses a semiconductor device manufacturing method, comprising: a preparing process for preparing a conductive plate(3a)[0117], a semiconductor chip(semiconductor chip)[0041] arranged over the conductive plate(3a)[0117], and a connection terminal(7a/7b)[0048] including a bonding portion(5a/8) arranged over the semiconductor chip(semiconductor chip)[0041] ; a first jig arrangement process for arranging a first guide jig, through which a first guide hole(5a1) pierces, over the conductive plate(3a)[0117], such that the first guide hole(5a1) corresponds to the bonding portion(5a/8) in a plan view of the semiconductor device; and a first pressing process[0054] for inserting a pillar-shaped pressing jig(7a), which includes a pressing portion[0059,0060] at a lower end portion thereof, into the first guide hole(5a1), and pressing the bonding portion(5a/8) of the connection terminal(7a/7b)[0048] to a side of the conductive plate(3a)[0117] with the pressing portion[0059,0060]. Nishida does not discloses a semiconductor chip(semiconductor chip)[0041] arranged over the conductive plate(3a)[0117] with a first bonding material therebetween, and a connection terminal(7a/7b)[0048] including a bonding portion(5a/8) arranged over the semiconductor chip(semiconductor chip)[0041] with a second bonding material therebetween; Nakamura discloses a bonding material (7) It would have been obvious to one of ordinary skill in the art before the effective filling date of the invention to apply the teachings of Nakamura to the teachings of Nishida in order to offer increased bond strength between an insulated circuit board, external terminals, and a printed circuit board and also offer excellent manufacturability [0017, Nakamura]. In doing so, a semiconductor chip(semiconductor chip)[0041] arranged over the conductive plate(3a)[0117] with a first bonding material (7 of Nakamura) therebetween, and a connection terminal(7a/7b)[0048] including a bonding portion(5a/8) arranged over the semiconductor chip(semiconductor chip)[0041] with a second bonding material (7 of Nakamura) therebetween; Re claim 2 Nishida and Nakamura disclose the semiconductor device manufacturing method according to claim 1, wherein the first pressing process[0054] further includes performing heating while pressing the bonding portion(5a/8) of the connection terminal(7a/7b)[0048] with the pressing portion[0059,0060] of the pressing jig(7a). Re claim 3 Nishida and Nakamura disclose the semiconductor device manufacturing method according to claim 1, wherein the pressing jig(7a) further includes, at an upper end portion thereof, a locking portion lockable by the first guide jig(7a). Re claim 4 Nishida and Nakamura disclose the semiconductor device manufacturing method according to claim 1, wherein the preparing process further includes providing an insulated circuit board that has: an insulating plate, the conductive plate(3a)[0117], which is formed on a front surface of the insulating plate, and a metal plate formed on a back surface of the insulating plate. Re claim 5 Nishida and Nakamura disclose the semiconductor device manufacturing method according to claim 4, wherein the preparing process further includes preparing a radiation plate and the insulated circuit board, and the semiconductor device manufacturing method further includes, after the first pressing process[0054], a second pressing process[0054] for arranging the insulated circuit board, to which the semiconductor chip(semiconductor chip)[0041] and the bonding portion(5a/8) of the connection terminal(7a/7b)[0048] are bonded in order, over the radiation plate with a third bonding material therebetween, and pressing the bonding portion(5a/8) of the connection terminal(7a/7b)[0048] with the pressing jig(7a). Re claim 6 Nishida and Nakamura disclose the semiconductor device manufacturing method according to claim 5, wherein the second pressing process[0054] further includes performing heating while pressing the bonding portion(5a/8) of the connection terminal(7a/7b)[0048] with the pressing portion[0059,0060] of the pressing jig(7a). Re claim 7 Nishida and Nakamura disclose the semiconductor device manufacturing method according to claim 5, wherein the second pressing process[0054] further includes arranging a spacer jig(7a) having an opening portion, such that the opening portion corresponds to the semiconductor chip(semiconductor chip)[0041], and the semiconductor chip(semiconductor chip)[0041] and the bonding portion(5a/8) of the connection terminal(7a/7b)[0048] are in the opening portion in the plan view, and arranging the first guide jig(7a) on the spacer jig. Re claim 8 Nishida and Nakamura disclose the semiconductor device manufacturing method according to claim 7, wherein a height of the opening portion of the spacer jig is greater than a sum of a height of the semiconductor chip(semiconductor chip)[0041] and a height of the bonding portion(5a/8) of the connection terminal(7a/7b)[0048] arranged over the semiconductor chip(semiconductor chip)[0041]. Re claim 9 Nishida and Nakamura disclose the semiconductor device manufacturing method according to claim 7, wherein arranging the spacer jig(7a) includes forming a guide portion extending toward the bonding portion(5a/8) on an inside of the opening portion of the spacer jig. Re claim 10 Nishida and Nakamura disclose the semiconductor device manufacturing method according to claim 1, wherein the first pressing process[0054] further includes forming a semiconductor unit by bonding the semiconductor chip(semiconductor chip)[0041] to the conductive plate(3a)[0117] with the first bonding material, and by bonding the bonding portion(5a/8) of the connection terminal(7a/7b)[0048] to the semiconductor chip(semiconductor chip)[0041] with the second bonding material. Re claim 11 Nishida and Nakamura disclose the semiconductor device manufacturing method according to claim 1, wherein: the pressing portion[0059,0060] of the pressing jig(7a) has a flat surface, with a concave housing portion formed in the flat surface for the bonding portion(5a/8) of the connection terminal(7a/7b)[0048] to be housed therein. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to PATRICIA D VALENZUELA whose telephone number is (571)272-9242. The examiner can normally be reached Monday-Friday 10am-6pm EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, William Partridge can be reached at 571-270-1402. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /PATRICIA D VALENZUELA/Primary Examiner, Art Unit 2812
Read full office action

Prosecution Timeline

Sep 27, 2022
Application Filed
Feb 04, 2026
Non-Final Rejection — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12604686
SEMICONDUCTOR CHIP AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME
2y 5m to grant Granted Apr 14, 2026
Patent 12604749
SEMICONDUCTOR PACKAGE
2y 5m to grant Granted Apr 14, 2026
Patent 12598990
ELECTRICALLY ISOLATED DISCRETE PACKAGE WITH HIGH PERFORMANCE CERAMIC SUBSTRATE
2y 5m to grant Granted Apr 07, 2026
Patent 12598986
METAL INSULATOR METAL CAPACITOR (MIM CAPACITOR)
2y 5m to grant Granted Apr 07, 2026
Patent 12593675
RETICLE STITCHING TO ACHIEVE HIGH-CAPACITY INTEGRATED CIRCUIT
2y 5m to grant Granted Mar 31, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
90%
Grant Probability
92%
With Interview (+2.1%)
2y 4m
Median Time to Grant
Low
PTA Risk
Based on 715 resolved cases by this examiner. Grant probability derived from career allow rate.

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