Prosecution Insights
Last updated: April 19, 2026
Application No. 17/965,554

TREATMENT LIQUID, CHEMICAL MECHANICAL POLISHING METHOD, AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE

Final Rejection §102§103
Filed
Oct 13, 2022
Examiner
ALANKO, ANITA KAREN
Art Unit
1713
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Fujifilm Corporation
OA Round
4 (Final)
69%
Grant Probability
Favorable
5-6
OA Rounds
3y 1m
To Grant
52%
With Interview

Examiner Intelligence

Grants 69% — above average
69%
Career Allow Rate
470 granted / 677 resolved
+4.4% vs TC avg
Minimal -17% lift
Without
With
+-17.2%
Interview Lift
resolved cases with interview
Typical timeline
3y 1m
Avg Prosecution
36 currently pending
Career history
713
Total Applications
across all art units

Statute-Specific Performance

§101
0.6%
-39.4% vs TC avg
§103
45.1%
+5.1% vs TC avg
§102
20.7%
-19.3% vs TC avg
§112
20.0%
-20.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 677 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Continued Examination Under 37 CFR 1.114 A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after final rejection. Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, the finality of the previous Office action has been withdrawn pursuant to 37 CFR 1.114. Applicant's submission filed on June 23, 2025, has been entered. Election/Restrictions Applicant’s election without traverse of Invention I (treatment liquid), Species A (ammonium) and Species a (heteroaromatic compound) in the reply filed on November 7, 2024, is acknowledged. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The text of those sections of Title 35, U.S. Code not included in this action can be found in a prior Office action. Claims 1, 8-9, 12, 15, 17-18 and 21-27 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Yamada et al (JP 2010-129871 A). Yamada discloses a treatment liquid for a semiconductor substrate (abstract), comprising: a component A having two or more onium structures in a molecule (general formula 2, [0008]-[0009], page 6, line 26-page 7, line 1 of English translation; [0030]-[0033], page 12, line 21-page 13, line 2); water ([0013], page 8, lines 30-31); and a heteroaromatic compound ([0049], page 17, lines 18-22), wherein the treatment liquid has a pH of 14 or less ([0067], page 21, lines 40-41), which encompasses the cited range of 8.0 to 13.5, and the component A is a compound represented by General Formula (I), PNG media_image1.png 251 661 media_image1.png Greyscale (general formula 2), where in General Formula (I), R1 to R6 each independently represents a monovalent organic group (page 3, lines 11-12), two of R1 to R6 may be bonded to each other (page 3, lines 15-16), L1 represents a divalent linking group which is an aromatic hydrocarbon group (M as an arylene group, page 3, line 13), or a group formed by a combination of an aliphatic hydrocarbon group and an aromatic hydrocarbon group (“alkylene group, …, arylene group, or a group combining two or more of these groups”, page 3, lines 12-14), n represents 1 or 2 and X(2/n)- represents a (2/n)- valent counterion (“X- represents a monovalent anion, and Y2- represents a divalent anion” page 3, lines 14-15). As to claims 8 and 21, Yamada discloses, in one example, component A is present at 2.0 g/L (Example 1, composition 1, page 26, line 37), which for a 1000 mL treatment liquid (page 26, line 38) is about 0.2% by mass, which is within the cited ranges. A specific example in the prior art that is within a claimed range anticipates the range. MPEP 2131.03. As to claim 9, Yamada discloses to include an organic acid ([0062], page 20, lines 35-39). As to claim 12, Yamada discloses that the heteroaromatic compound is a tetrazole compound (page 20, line 3), a triazole (page 20, lines 6-10), imidazole (page 19, line 38), or a pyrazole compound (page 17, line 38). As to claim 15, Yamada discloses to include a surfactant ([0017], page 9, lines 27-34). As to claims 17-18, Yamada discloses to include colloidal silica having an average primary particle diameter of 5-200 nm (page 9, lines 6-7), which overlaps with the cited range. As to claim 22, Yamada discloses that the heteroaromatic compound is, in one example, present at 2.0 g/L (page 26, line 33), which for a 1000 mL treatment liquid (page 26, line 38) is about 0.2% by mass, which is within the cited range. A specific example in the prior art that is within a claimed range anticipates the range. MPEP 2131.03. As to claim 23, Yamada discloses that the treatment liquid may further comprise an amino alcohol (e.g. diethanolamine, page 22, lines 5-6). As to claim 24, Yamada discloses to add the amino alcohol at 0.0001 to 2.0 mol (page 22, line 12), which for a 1000 mL solution (page 26, line 38), is 0.0001 mol/L at its lower limit, for diethanolamine, is about 0.01% by mass, which is within the cited range. As to claim 25, Yamada discloses a dilution ratio of 1 to 20 times by volume (page 8, line 31), which is within the cited range. A specific example in the prior art that is within a claimed range anticipates the range. MPEP 2131.03. As to claims 26-27, Yamada discloses a phenylene group ([0039], page 14, line 24, A23 on page 15) and a biphenyl group (A32 on page 16, [0043]). Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The text of those sections of Title 35, U.S. Code not included in this action can be found in a prior Office action. Claim 6 is rejected under 35 U.S.C. 103 as being unpatentable over Yamada et al (JP 2010-129871 A) in view of Mizutani et al (JP 2010-251680 A). As to claim 6, Yamada fails to disclose the composition of the counterion. Mizutani teaches treatment liquids similar to the composition of Yamada with a component A (formula II, page 6, line 1; page 13, line 23-page 14 line 7) with hydroxide ion as the counterion (page 15, line 29). It would have been obvious to one with ordinary skill in the art before the effective filing date of the claimed invention to include hydroxide ion as cited in the treatment liquid of Yamada because Mizutani teaches that it is a useful counterion in similar components and is expected to give the predictable result of a treatment liquid suitable for treating semiconductor substrates. Claim 14 is rejected under 35 U.S.C. 103 as being unpatentable over Yamada et al (JP 2010-129871 A) in view of Kikkawa et al (US 2022/0073820 A1). As to claim 14, Yamada fails to disclose to include an organic solvent. Kikkawa teaches a treatment liquid for a semiconductor substrate (see abstract, e.g., CMP [0244]) similar to Yamada comprising a component A [0248]. Kikkawa teaches that the treatment liquid may include an organic solvent [0261], [0266]. It would have been obvious to one with ordinary skill in the art before the effective filing date of the claimed invention to include an organic solvent in the treatment liquid of Yamada because Kikkawa teaches that it is useful and such is expected to give the predictable result of a treatment liquid suitable for treating semiconductor substrates. Terminal Disclaimer The terminal disclaimer filed on March 13, 2025, disclaiming the terminal portion of any patent granted on this application which would extend beyond the expiration date of any patent granted on 18/046,701 or 18/463,754 has been reviewed and is accepted. The terminal disclaimer has been recorded. Response to Amendment Applicant’s arguments, see page 8, filed June 23, 2025, with respect to the 35 USC 103 rejections over Kikkawa et al in view of Mizutani, or over Kikkawa in view of Mizutani and White have been fully considered and are persuasive. The rejections of the claims have been withdrawn. The claims are rejected over newly cited Yamada et al JP 2010-129871 A, which teaches a compound with an aromatic hydrocarbon group between two nitrogen atoms, as in claim 1. Response to Arguments Applicant’s arguments with respect to the claims have been considered but are moot because the new ground of rejection does not rely on any reference applied in the prior rejection of record for any teaching or matter specifically challenged in the argument. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to ANITA K ALANKO whose telephone number is (571)270-0297. The examiner can normally be reached Monday-Friday, 9 am-5pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Joshua Allen can be reached on 571-270-3176. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /ANITA K ALANKO/Patent Examiner, Art Unit 1713
Read full office action

Prosecution Timeline

Oct 13, 2022
Application Filed
Dec 09, 2024
Non-Final Rejection — §102, §103
Mar 13, 2025
Response Filed
Mar 18, 2025
Final Rejection — §102, §103
Jun 23, 2025
Request for Continued Examination
Jun 27, 2025
Response after Non-Final Action
Jul 05, 2025
Non-Final Rejection — §102, §103
Oct 08, 2025
Response Filed
Dec 20, 2025
Final Rejection — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12577178
SLIDING MEMBER AND METHOD OF MANUFACTURING SLIDING MEMBER
2y 5m to grant Granted Mar 17, 2026
Patent 12577465
METHOD FOR PRODUCING SEMICONDUCTOR TREATMENT LIQUID AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT
2y 5m to grant Granted Mar 17, 2026
Patent 12552962
CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN PATTERN WAFER AND METHOD OF POLISHING TUNGSTEN PATTERN WAFER USING THE SAME
2y 5m to grant Granted Feb 17, 2026
Patent 12545839
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
2y 5m to grant Granted Feb 10, 2026
Patent 12534640
POLISHING LIQUID AND POLISHING METHOD
2y 5m to grant Granted Jan 27, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

5-6
Expected OA Rounds
69%
Grant Probability
52%
With Interview (-17.2%)
3y 1m
Median Time to Grant
High
PTA Risk
Based on 677 resolved cases by this examiner. Grant probability derived from career allow rate.

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