Prosecution Insights
Last updated: July 17, 2026
Application No. 17/969,104

DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME

Non-Final OA §103§112
Filed
Oct 19, 2022
Priority
Jan 12, 2022 — RE 10-2022-0004543
Examiner
HSIEH, HSIN YI
Art Unit
2899
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Samsung Display Co., Ltd.
OA Round
2 (Non-Final)
51%
Grant Probability
Moderate
2-3
OA Rounds
1m
Est. Remaining
56%
With Interview

Examiner Intelligence

Grants 51% of resolved cases
51%
Career Allowance Rate
326 granted / 638 resolved
-16.9% vs TC avg
Moderate +5% lift
Without
With
+5.4%
Interview Lift
resolved cases with interview
Typical timeline
3y 11m
Avg Prosecution
28 currently pending
Career history
693
Total Applications
across all art units

Statute-Specific Performance

§103
35.8%
-4.2% vs TC avg
§102
5.9%
-34.1% vs TC avg
§112
57.1%
+17.1% vs TC avg
Black line = Tech Center average estimate • Based on career data from 638 resolved cases

Office Action

§103 §112
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claim(s) 1-5 and 9-12 is/are rejected under 35 U.S.C. 103 as being unpatentable over Lee (WO2021246741A1, please the machine translation attached in this office action) in view of Brueck et al. (US 20210234070 A1). Regarding claim 1, Lee teaches in Fig. 13, a display device (PNL; Fig. 7, [0068]) comprising: first banks (PW1, PW2, PW3; Fig. 13, [0132]) spaced apart from one another and disposed on a substrate (BSL; Fig. 13, [0136]); a first electrode (ET1; Fig. 13, [0081]) and a second electrode (ET2; Fig. 13, [0081]), each disposed on one of the first banks (PW1, PW2, PW3) to cover each respective one of the first banks (PW1, PW2, PW3) and spaced apart from each other; and a light-emitting element (LD1; Fig. 13, [0133]) disposed between the first electrode (ET1) and the second electrode (ET2), wherein the light-emitting element (LD1) comprises an active layer (12; Fig. 2, [0131]). Lee does not teach the active layer is in a non-polarized state, and the active layer includes cubic gallium nitride (c-GaN). In the same field of endeavor of light emitting device, Brueck et al. teach the active layer (active region; Fig. 16A, [0126]) is in a non-polarized state (nonpolar; [0157]), and the active layer (active region) includes cubic gallium nitride (c-GaN) ([0126]). It would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to combine the inventions of Lee and Brueck et al., and to use the c-GaN as the material of the active layer as taught by Brueck et al., because the c-GaN has the advantage that the strain associated with adding the InGaN quantum wells does not induce a polarization field that acts to separate electrons and holes in a polar device as taught by Brueck et al. ([0157]). Regarding claim 2, Lee teaches the display device of claim 1, wherein the active layer (12). Lee does not teach the active layer comprises only cubic gallium nitride (c-GaN). In the same field of endeavor of light emitting device, Brueck et al. teach the active layer (active region; Fig. 16A, [0126]) comprises only cubic gallium nitride (c-GaN) ([0126]). It would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to combine the inventions of Lee and Brueck et al., and to use the c-GaN as the material of the active layer as taught by Brueck et al., because the c-GaN has the advantage that the strain associated with adding the InGaN quantum wells does not induce a polarization field that acts to separate electrons and holes in a polar device as taught by Brueck et al. ([0157]). Regarding claim 3, Lee teaches the display device of claim 1, wherein the light-emitting element (LD1) further comprises: a first semiconductor layer (11; Fig. 15, [0168]) between the active layer (12) and the second electrode (ET2); and a second semiconductor layer (13; Fig. 15, [0168]) between the active layer (12) and the first electrode (ET1). Regarding claim 4, Lee teaches the display device of claim 3, wherein the first semiconductor layer (11) includes GaN doped with n-type Si ([0051]). Regarding claim 5, Lee teaches the display device of claim 4, wherein the first semiconductor layer (11) includes n-type Si doped gallium nitride ([0051]). Lee does not teach gallium nitride is hexagonal gallium nitride (h-GaN) and cubic gallium nitride (c-GaN). In the same field of endeavor of light emitting device, Brueck et al. teach gallium nitride (GaN layers under the active region; Fig. 16A, [0126]) is hexagonal gallium nitride (h-GaN) (wurtzite GaN, i.e. hexagonal GaN; Fig. 16A, [0126, 0005]) and cubic gallium nitride (c-GaN) (cubic GaN under the active region; Fig. 16A, [0126]). It would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to combine the inventions of Lee and Brueck et al., and to use the active layer of c-GaN and the first semiconductor layer of h-GaN and c-GaN as taught by Brueck et al., because the c-GaN has the advantage that the strain associated with adding the InGaN quantum wells does not induce a polarization field that acts to separate electrons and holes in a polar device as taught by Brueck et al. ([0157]). Regarding claim 9, Lee teaches the display device of claim 3, further comprising: a first contact electrode (CE1; Fig. 13, [0133]) electrically connected to the first electrode (ET1) and contacting the second semiconductor layer (13) of the light-emitting element (LD1; see Fig. 15). Regarding claim 10, Lee teaches the display device of claim 9, further comprising: a second contact electrode (CE2; Fig. 13, [0133]) electrically connected to the second electrode (ET2) and contacting the first semiconductor layer (11) of the light-emitting element (LD1; see Fig. 15). Regarding claim 11, Lee teaches the display device of claim 10, further comprising: a first element insulating layer (INS1; Fig. 13, [0161]) disposed between the first electrode (ET1), the second electrode (ET2), and the light-emitting element (LD1); and a second element insulating layer (the upper INP; Fig. 13, [0176]) disposed on an upper surface of the light-emitting element (LD1), wherein the first contact electrode (CE1) directly contacts a portion of an upper surface of the second element insulating layer (the upper INP; see Fig. 13), the second contact electrode (CE2) directly contacts another portion of the upper surface of the second element insulating layer (the upper INP; see Fig. 13), and each of the first contact electrode (CE1) and the second contact electrode (CE2) exposes a central portion of the upper surface of the second element insulating layer (the upper INP; see Fig. 15). Regarding claim 12, Lee teaches the display device of claim 11, further comprising: a third element insulating layer (INS2; Fig. 13, [0184]) integrally formed to cover the first contact electrode (CE1) and the second contact electrode (CE2) and contacting the first contact electrode (CE1) and the second contact electrode (CE2; see Fig. 13). Claim(s) 6 is/are rejected under 35 U.S.C. 103 as being unpatentable over Lee and Brueck et al. as applied to claim 5 above, and further in view of Jeong (CN 101728411 B, please the machine translation attached in this office action). Regarding claim 6, Lee teaches the display device of claim 5, wherein the second semiconductor layer (13) includes GaN doped with p-type dopant ([0054]). Lee does not teach p-type dopant is p-type Si. In the same field of endeavor of light emitting devices, Jeong teaches p-type dopant is p-type Si ([0033]). Lee teach all the claimed elements except that Lee is using Mg for p-type dopant of GaN ([0054]) rather than Si. In the same field of endeavor of light emitting devices, Jeong teaches using Si for p-type dopant of GaN ([0033]). One of ordinary skill in the art would have recognized that Mg and Si are known equivalents for providing p-type dopant for GaN within the semiconductor art. It would have been obvious to one of ordinary skill in the art at the time of invention was made to substitute one know element (Mg) for another known equivalent element (Si) resulting in the predictable result of providing p-type dopant for GaN (KSR rationales B). Allowable Subject Matter Claims 7-8 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is a statement of reasons for the indication of allowable subject matter: The prior art of record does not teach or suggest, singularly or in combination, at least the limitations of "wherein the second semiconductor layer includes p-type Si doped hexagonal gallium nitride (h-GaN) and cubic gallium nitride (c-GaN)" as recited in claim 7. Response to Arguments Applicant’s amendments, filed 12/11/2025, overcome the rejections to claims 1-12 under 35 U.S.C. 112. The rejections to claims 1-12 under 35 U.S.C. 112 have been withdrawn. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to HSIN YI HSIEH whose telephone number is (571)270-3043. The examiner can normally be reached 8:30 - 5:00 pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Zandra V Smith can be reached on 571-272-2429. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /HSIN YI HSIEH/Primary Examiner, Art Unit 2899 4/14/2026
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Prosecution Timeline

Oct 19, 2022
Application Filed
Oct 02, 2025
Non-Final Rejection mailed — §103, §112
Dec 11, 2025
Response Filed
Apr 20, 2026
Non-Final Rejection mailed — §103, §112 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

2-3
Expected OA Rounds
51%
Grant Probability
56%
With Interview (+5.4%)
3y 11m (~1m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 638 resolved cases by this examiner. Grant probability derived from career allowance rate.

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