DETAILED ACTION
Notice of Pre-AIA or AIA Status
The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA .
Election/Restrictions
Applicant’s election without traverse of species IV, claims 1-20, in the reply filed on October 6, 2025 is acknowledged.
Priority
Receipt is acknowledged of certified copies of papers required by 37 CFR 1.55.
Information Disclosure Statement
The information disclosure statements (IDS) submitted on 11/10/22, 3/16/23, 6/21/23 and 8/11/25 are in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statement is being considered by the examiner.
Drawings
The drawings are objected to under 37 CFR 1.83(a). The drawings must show every feature of the invention specified in the claims. Therefore, the “removing the mold patterns … exposing the protection oxide layer” (claims 1 and 14) must be shown or the feature(s) canceled from the claim(s). No new matter should be entered.
Corrected drawing sheets in compliance with 37 CFR 1.121(d) are required in reply to the Office action to avoid abandonment of the application. Any amended replacement drawing sheet should include all of the figures appearing on the immediate prior version of the sheet, even if only one figure is being amended. The figure or figure number of an amended drawing should not be labeled as “amended.” If a drawing figure is to be canceled, the appropriate figure must be removed from the replacement sheet, and where necessary, the remaining figures must be renumbered and appropriate changes made to the brief description of the several views of the drawings for consistency. Additional replacement sheets may be necessary to show the renumbering of the remaining figures. Each drawing sheet submitted after the filing date of an application must be labeled in the top margin as either “Replacement Sheet” or “New Sheet” pursuant to 37 CFR 1.121(d). If the changes are not accepted by the examiner, the applicant will be notified and informed of any required corrective action in the next Office action. The objection to the drawings will not be held in abeyance.
The drawings are objected to as failing to comply with 37 CFR 1.84(p)(5) because they do not include the following reference sign(s) mentioned in the description: “110” ([0029]). Corrected drawing sheets in compliance with 37 CFR 1.121(d) are required in reply to the Office action to avoid abandonment of the application. Any amended replacement drawing sheet should include all of the figures appearing on the immediate prior version of the sheet, even if only one figure is being amended. Each drawing sheet submitted after the filing date of an application must be labeled in the top margin as either “Replacement Sheet” or “New Sheet” pursuant to 37 CFR 1.121(d). If the changes are not accepted by the examiner, the applicant will be notified and informed of any required corrective action in the next Office action. The objection to the drawings will not be held in abeyance.
The drawings (Fig. 2B) are objected to because “P1” should read as “P2”. Corrected drawing sheets in compliance with 37 CFR 1.121(d) are required in reply to the Office action to avoid abandonment of the application. Any amended replacement drawing sheet should include all of the figures appearing on the immediate prior version of the sheet, even if only one figure is being amended. The figure or figure number of an amended drawing should not be labeled as “amended.” If a drawing figure is to be canceled, the appropriate figure must be removed from the replacement sheet, and where necessary, the remaining figures must be renumbered and appropriate changes made to the brief description of the several views of the drawings for consistency. Additional replacement sheets may be necessary to show the renumbering of the remaining figures. Each drawing sheet submitted after the filing date of an application must be labeled in the top margin as either “Replacement Sheet” or “New Sheet” pursuant to 37 CFR 1.121(d). If the changes are not accepted by the examiner, the applicant will be notified and informed of any required corrective action in the next Office action. The objection to the drawings will not be held in abeyance.
Claim Objections
Claims 3 and 8 is objected to because of the following informalities: a comma should read as a semicolon after “comprising” (claims 3 and 8, line 1). Appropriate correction is required.
Claim Rejections - 35 USC § 112
The following is a quotation of 35 U.S.C. 112(b):
(b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention.
The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph:
The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention.
Claims 1-20 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention.
The claimed limitation of "bit line spacers on side surfaces …", as recited in claims 1 and 14, is unclear as to whether said limitation is in one-to-one, one-to-multiple or multiple-to-one relationship between the bit line spacer and the side surface applicant refers.
The claimed limitation of "… gap regions extending in a first direction", as recited in claim 1, is unclear as to which dimension of the gap regions extending in a first direction applicant refers.
The claimed limitations of "the gap regions formed between the bit line structures and exposing portions of the active portions", as recited in claim 1, are unclear as to whether said limitations are in one-to-one, one-to-multiple or multiple-to-one relationship between the gap region and the (exposed) portion; and between the (exposed) portion and the active portion applicant refers.
The claimed limitations of "buried contact patterns in the contact regions to contact the portions of the active regions", as recited in claim 1, are unclear as to whether said limitations are in one-to-one, one-to-multiple or multiple-to-one relationship between the buried contact pattern and the contact region; and between the buried contact pattern and the (exposed) portion of the active region applicant refers.
The claimed limitation of "surfaces of the mold patterns", as recited in claims 3 and 14, is unclear as to whether said limitation is in one-to-one, one-to-multiple or multiple-to-one relationship between the surface and the mold pattern applicant refers.
The claimed limitation of "the buffer insulating layer comprises a first buffer insulating layer … and a second buffer insulating layer …", as recited in claim 4, is unclear as to how a single buffer insulating layer can include multiple buffer insulating layers.
Claim 6 recites the limitation "the respective portion of the active portions" in line 2. There is insufficient antecedent basis for this limitation in the claim. Also, it is unclear as to whether said limitation is the same as or different from “portions of the active portions”, as recited in claim 1.
Claims 6 and 13 recite the limitation "the buried contact pattern" in lines 2-3 and 5, respectively. There is insufficient antecedent basis for this limitation in the claim. Also, it is unclear as to whether said limitation is the same as or different from “buried contact patterns”, as recited in claim 1 and “each buried contact pattern”, as recited in claim 6, line 1.
The claimed limitation of "a side surface", as recited in claim 6, is unclear as to whether said limitation is the same as or different from "side surfaces", as recited in claim 6.
The claimed limitation "the forming of the gap regions", as recited in claims 8 and 15, is unclear as to which step is “the forming of the gap regions” applicant refers.
The claimed limitation of "portions of the active portions", as recited in claim 8, is unclear as to whether said limitation is the same as or different from "portions of the active portions", as recited in claim 1.
The claimed limitation of "each of the buried contact patterns is located at a vertical level lower than top surfaces of the bit line structures", as recited in claim 9, is unclear as to which dimension of each of the buried contact patterns is located at a vertical lever lower than top surfaces of the bit line structures applicant refers.
The claimed limitation of "top surfaces of the bit line structures", as recited in claim 9, is unclear as to whether said limitation is in one-to-one, one-to-multiple or multiple-to-one relationship between the top surface and the bit line structure applicant refers.
The claimed limitation of "side surfaces of the fence patterns", as recited in claims 11 and 18, is unclear as to whether said limitation is in one-to-one, one-to-multiple or multiple-to-one relationship between the side surface and the fence pattern applicant refers.
The claimed limitation of "widths of the fence patterns", as recited in claims 11, 17 and 18, is unclear as to whether said limitation is in one-to-one, one-to-multiple or multiple-to-one relationship between the width and the fence pattern applicant refers.
The claimed limitation "the forming of the contact regions", as recited in claims 11 and 18, is unclear as to which step is “the forming of the contact regions” applicant refers.
The claimed limitation of "the word line structures … extending in a first direction", as recited in claim 1, is unclear as to which dimension of the word line structures extending in a first direction applicant refers.
Claim 14 recites the limitation "the active portion" in line 3. There is insufficient antecedent basis for this limitation in the claim. Also, it is unclear as to whether said limitation is the same as or different from “active portions”, as recited in claim 14, lines 2-3.
The claimed limitation of "top surfaces of the word line structures", as recited in claim 14, is unclear as to whether said limitation is in one-to-one, one-to-multiple or multiple-to-one relationship between the top surface and the word line structure applicant refers.
The claimed limitation of "bit line structures … to extend in a second direction …", as recited in claim 14, is unclear as to which dimension of the bit line structures … to extend in a second direction applicant refers.
The claimed limitations of "… gap regions, which extend in the second direction and are disposed between the bit line structures to expose portions of the active portions", as recited in claim 14, is unclear as to which dimension of the gap regions extends in the second direction; as to whether said limitations is in one-to-one, one-to-multiple or multiple-to-one relationship between the gap region and the (exposed) portion, and between the (exposed) region and the active region applicant refers.
The claimed limitations of "… , which extends in the first direction", as recited in claim 14, is unclear as to which dimension of which element extends in the first direction applicant refers.
The claimed limitations of "mold patterns … in the gap regions", as recited in claim 14, is unclear as to whether said limitations is in one-to-one, one-to-multiple or multiple-to-one relationship between mold pattern and the gap region applicant refers.
The claimed limitations of "buried contact patterns, which contact the portions of the active regions, in the contact regions", as recited in claim 14, are unclear as to whether said limitations are in one-to-one, one-to-multiple or multiple-to-one relationship between the buried contact pattern and the contact region; and between the buried contact pattern and the (exposed) portion of the active region applicant refers.
The claimed limitation of "top surfaces of the portions of the active portions", as recited in claim 15, is unclear as to whether said limitation is in one-to-one, one-to-multiple or multiple-to-one relationship between the top surface and the portion applicant refers.
The claimed limitation of "a top surface of the gate capping pattern", as recited in claim 15, is unclear as to a top surface of the gate capping pattern of which word line structure applicant refers.
The claimed limitations of "portions of side surfaces of two of the gate capping patterns of the word line structures", as recited in claim 15, are unclear as to whether said limitations are in one-to-one, one-to-multiple or multiple-to-one relationship between the portion and the side surface, and between the side surface and the gate capping pattern applicant refers.
The claimed limitations of "two gate capping patterns" and “adjacent gate capping patterns, as recited in claim 16, lines 3-4, is unclear as to whether said limitation is the same as or different from "two of the gate capping patterns", as recited in claim 16, lines 2-3.
The claimed limitation of "the gate capping pattern", as recited in claims 15 and 17, is unclear as to the gate capping pattern of which word line structure applicant refers.
Allowable Subject Matter
Claims 1-20 are allowed.
The following is a statement of reasons for the indication of allowable subject matter:
The prior art of record does not teach or suggest, singularly or in combination, at least the limitations of “forming a protection oxide layer to cover the portions of the active portions exposed through the gap regions; forming a mold layer to fill the gap regions, in which the protection oxide layer is formed; forming mold patterns respectively in each of the gap regions, to be spaced apart from each other; forming fence patterns in each of the gap regions and between the mold patterns; removing the mold patterns to form contact regions exposing the protection oxide layer”, as recited in claim 1; and “forming a protection oxide layer to cover the portions of the active portions exposed through the gap regions; forming a mold layer to fill the gap regions; patterning the mold layer using a mask pattern, which extends in the first direction, to form mold patterns spaced apart from each other in the second direction in the gap regions; oxidizing surfaces of the mold patterns to form a buffer oxide layer; removing the buffer oxide layer; forming fence patterns between the mold patterns; removing the mold patterns to form contact regions exposing the protection oxide layer, after the forming of the fence patterns”, as recited in claim 14.
Claims 1-20 would be allowable if rewritten or amended to overcome the rejection(s) under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), 2nd paragraph, set forth in this Office action.
Conclusion
The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Reference A is cited as being related to a method of fabricating a semiconductor memory device.
Any inquiry concerning this communication or earlier communications from the examiner should be directed to MEIYA LI whose telephone number is (571)270-1572. The examiner can normally be reached Monday-Friday 7AM-3PM.
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/MEIYA LI/Primary Examiner, Art Unit 2811