Prosecution Insights
Last updated: April 19, 2026
Application No. 17/987,564

SCHOTTKY BARRIER DIODE AND METHOD FOR MANUFACTURING SAME

Non-Final OA §102§103
Filed
Nov 15, 2022
Examiner
YEMELYANOV, DMITRIY
Art Unit
2891
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Enkris Semiconductor Inc.
OA Round
1 (Non-Final)
73%
Grant Probability
Favorable
1-2
OA Rounds
2y 8m
To Grant
92%
With Interview

Examiner Intelligence

Grants 73% — above average
73%
Career Allow Rate
393 granted / 538 resolved
+5.0% vs TC avg
Strong +19% interview lift
Without
With
+18.7%
Interview Lift
resolved cases with interview
Typical timeline
2y 8m
Avg Prosecution
43 currently pending
Career history
581
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
52.4%
+12.4% vs TC avg
§102
23.2%
-16.8% vs TC avg
§112
22.4%
-17.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 538 resolved cases

Office Action

§102 §103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of Invention I (Claims 1-10) in the reply filed on 06/26/2025 is acknowledged. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1, 2, 4, 6-9 is/are rejected under 35 U.S.C. 102(A1) as being anticipated by Jeong et al. (US 2014/0091312 A1). Regarding Claim 1, Jeopng (Fig. 1, 2, 11) discloses a Schottky barrier diode, comprising: a substrate (20); a heterojunction structure (30, 40) disposed on the substrate (20); and a P-type semiconductor layer (50), an anode (70) and a cathode (60) disposed on the heterojunction structure (30, 40), wherein the P-type semiconductor layer (50) comprises a plurality of P-type semiconductor sub-blocks (“The plurality of P-GaN layers 50 are separated from one another” layers 50 Fig. 11), the anode (70) and the cathode (60) are disposed at two ends in an extending direction of the plurality of P-type semiconductor sub-blocks (Fig. 11), respectively, and the plurality of P-type semiconductor sub-blocks (50) between the anode and the cathode are spaced apart. (Fig. 1, 2, 11) [0048-0049] Regarding Claim 2, Jeopng (Fig. 1, 2, 11) discloses the Schottky barrier diode of claim 1, wherein the plurality of P-type semiconductor sub-blocks (50) are distributed in parallel with each other between the anode (70) and the cathode (60). (See Fig. 1, 2, 11). Regarding Claim 4, Jeopng (Fig. 1, 2, 3, 7, 8, 11) discloses the Schottky barrier diode of claim 1, wherein for each of the plurality of P-type semiconductor sub-blocks (50), the P-type semiconductor sub-block (50) comprises a first end close to the anode and a second end close to the cathode (See 50 extending in a direction between anode and cathode) ; and at least one of:. the first end of at least one of the plurality of P-type semiconductor sub-blocks (see end of 50) has a tip, or the second end of at least one of the plurality of P-type semiconductor sub-blocks (see end of 50) has a tip. (Fig. 1, 2, 11) The Examiner notes that “a tip” is considered under broadest reasoanable interpretation. Ex a square tip (in flat head of screwdriver) Regarding Claim 6, Jeopng (Fig. 1, 2, 3, 7, 8, 11) discloses the Schottky barrier diode of claim 1, further comprising: a passivation layer (80), wherein the passivation layer (80) integrally covers on the plurality of P-type semiconductor sub-blocks (50) and between the plurality of P-type semiconductor sub-blocks (50); and the anode and the cathode (70, 40) pass through the passivation layer to contact the heterojunction structure. (40, 30) (Fig. 3) Regarding Claim 7, Jeopng (Fig. 1, 2, 3, 7, 8, 11) discloses the Schottky barrier diode of claim 1, wherein a side surface of at least one of the plurality of P-type semiconductor sub-blocks contacts the anode (70) and does not contact the cathode (60) (Fig. 1, 2, 3, 7, 8, 11); or a side surface of at least one of the plurality of P-type semiconductor sub-blocks contacts the cathode and does not contact the anode; or at least one of the plurality of P-type semiconductor sub-blocks is separated into a first section and a second section insulated from each other, wherein a side surface of the first section contacts the cathode and does not contact the anode, and a side surface of the second section contacts the anode and does not contact the cathode. Regarding Claim 8, Jeopng (Fig. 1, 2, 3, 7, 8, 11) discloses the Schottky barrier diode of claim 1, wherein the anode (70) contacts side surfaces of the plurality of P-type semiconductor sub-blocks and an upper surface of at least one of the plurality of P-type semiconductor sub-blocks (50) (Fig. 1, 2, 3, 7, 8, 11);; or the cathode contacts side surfaces of the plurality of P-type semiconductor sub-block and an upper surface of at least one of the plurality of P-type semiconductor sub-blocks. Regarding Claim 9, Jeopng (Fig. 1, 2, 3, 7, 8, 11) discloses the Schottky barrier diode of claim 1, wherein the heterojunction structure comprises: a channel layer (30) close to the substrate (20); and a barrier layer (40) away from the substrate (20); wherein the anode (70) contacts the barrier layer (40), or contacts the channel layer, or contacts both the channel layer and the barrier layer; and the cathode (60) contacts the barrier layer (40), or contacts the channel layer, or contacts both the channel layer and the barrier layer. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 3 is/are rejected under 35 U.S.C. 103 as being unpatentable over Jeong et al. (US 2014/0091312 A1). Regarding Claim 3, Jeopng (Fig. 1, 2, 3, 7, 8, 11) discloses the Schottky barrier diode of claim 1, wherein at least two of the plurality of P-type semiconductor sub-blocks (50) extend between the anode and the cathode (Fig. 1, 2, 11) Jeopng does not explicitly disclose that at least two of the plurality of P-type semiconductor sub-blocks extend between the anode and the cathode for unequal lengths. It would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to modify the Schottky barrier diode in Jeopng such that at least two of the plurality of P-type semiconductor sub-blocks extend between the anode and the cathode for unequal lengths a change in shape of an element was considered a matter of choice which a person of ordinary skill in the art would have found obvious absent persuasive evidence that the particular configuration was significant (In re Dailey, 357 F.2d 669, 149 USPQ 47 (CCPA 1966) (MPEP §2144.04) Allowable Subject Matter Claims 5 and 10 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Yu et al. (US 2013/0140578 A1) discloses P-type semiconductor layer comprises a plurality of P-type semiconductor sub-blocks. Any inquiry concerning this communication or earlier communications from the examiner should be directed to DMITRIY YEMELYANOV whose telephone number is (571)270-7920. The examiner can normally be reached M-F 9a.m.-6p.m. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Matthew Landau can be reached at (571) 272-1731. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /DMITRIY YEMELYANOV/Examiner, Art Unit 2891
Read full office action

Prosecution Timeline

Nov 15, 2022
Application Filed
Mar 07, 2026
Non-Final Rejection — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
73%
Grant Probability
92%
With Interview (+18.7%)
2y 8m
Median Time to Grant
Low
PTA Risk
Based on 538 resolved cases by this examiner. Grant probability derived from career allow rate.

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