Prosecution Insights
Last updated: April 19, 2026
Application No. 17/994,446

SENSOR PACKAGE WITH LOW ASPECT RATIO THROUGH SILICON VIA

Non-Final OA §102§103
Filed
Nov 28, 2022
Examiner
MENZ, LAURA MARY
Art Unit
2813
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Texas Instruments Incorporated
OA Round
1 (Non-Final)
87%
Grant Probability
Favorable
1-2
OA Rounds
2y 6m
To Grant
96%
With Interview

Examiner Intelligence

Grants 87% — above average
87%
Career Allow Rate
805 granted / 922 resolved
+19.3% vs TC avg
Moderate +8% lift
Without
With
+8.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 6m
Avg Prosecution
29 currently pending
Career history
951
Total Applications
across all art units

Statute-Specific Performance

§101
2.3%
-37.7% vs TC avg
§103
27.0%
-13.0% vs TC avg
§102
51.0%
+11.0% vs TC avg
§112
7.9%
-32.1% vs TC avg
Black line = Tech Center average estimate • Based on career data from 922 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of Species 2 in the reply filed on 8/11/25 is acknowledged. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 9 is/are rejected under 35 U.S.C. 102a1 as being anticipated by Huang et al (US 2017/0077158). 9. An electronic device, comprising: a semiconductor substrate (Fig.1A-1H (100) and [ 0018-0019]) having: opposite first (Fig.1A-1H (100a) and [0019]) and second sides (Fig.1B-1H (100b) and [0026]), a first conductive routing structure (Fig.1A-1H (140) and [0021]) on the first side (Fig.1A-1H (100a) and [0019]) of the semiconductor substrate (Fig.1A-1H (100) and [ 0018-0019]), and a via opening (Fig.1B-1H (190) and [0026]) extending from the first side (Fig.1A-1H (100a) and [0019]) of the semiconductor substrate (Fig.1A-1H (100) and [ 0018-0019]) to the second side (Fig.1B-1H (100b) and [0026]) of the semiconductor substrate (Fig.1A-1H (100) and [ 0018-0019]), a portion of the first conductive routing structure (Fig.1A-1H (140) and [0021]) extending over the via opening (Fig.1B-1H (190) and [0026]), a transparent cover (Fig.1A-1H (170) and [0023]) over a portion of the first side (Fig.1A-1H (100a) and [0019]) of the semiconductor substrate (Fig.1A-1H (100) and [ 0018-0019]), the transparent cover (Fig.1A-1H (170) and [0023]) covering the patterned first conductive routing structure(Fig.1A-1H (140) and [0021]); an insulator layer (Fig.1C-1H (210) and [0028]) on the second side (Fig.1B-1H (100b) and [0026]) of the semiconductor substrate (Fig.1A-1H (100) and [ 0018-0019]) and along a sidewall of the via opening (Fig.1C-1H (190) and [0026 and 0028]), the insulator layer (Fig.1C-1H (210) and [0028]) including a polyimide material [0028]; and a second conductive routing structure (Fig.1C-1H (220) and [0029]) on an outer side of the insulator layer (Fig.1C-1H (210) and [0028]), the second conductive routing structure (Fig.1C-1H (220) and [0029]) extending through the via opening (Fig.1C-1H (190) and [0026 and 0029]) and directly contacting the portion of the first conductive routing structure (Fig.1A-1H (140) and [0021]). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1-4, 7-8 is/are rejected under 35 U.S.C. 103 as being unpatentable over Huang et al (US 2017/0077158) in further view of Oganesian (US 2013/0056844). Huang teaches the following claimed limitations as cited below: 1. An electronic device, comprising: a semiconductor substrate (Fig.1A-1H (100) and [ 0018-0019]) having: opposite first (Fig.1A-1H (100a) and [0019]) and second sides (Fig.1B-1H (100b) and [0026]), a first conductive routing structure (Fig.1A-1H (140) and [0021]) on the first side (Fig.1A-1H (100a) and [0019]) of the semiconductor substrate (Fig.1A-1H (100) and [ 0018-0019]), and a via opening (Fig.1B-1H (190) and [0026]) extending from the first side (Fig.1A-1H (100a) and [0019]) of the semiconductor substrate (Fig.1A-1H (100) and [ 0018-0019]) to the second side (Fig.1B-1H (100b) and [0026]) of the semiconductor substrate (Fig.1A-1H (100) and [ 0018-0019]), a portion of the first conductive routing structure (Fig.1A-1H (140) and [0021]) extending over the via opening (Fig.1B-1H (190) and [0026]), a transparent cover (Fig.1A-1H (170) and [0023]) over a portion of the first side (Fig.1A-1H (100a) and [0019]) of the semiconductor substrate (Fig.1A-1H (100) and [ 0018-0019]), the transparent cover (Fig.1A-1H (170) and [0023]) covering the patterned first conductive routing structure(Fig.1A-1H (140) and [0021]); an insulator layer (Fig.1C-1H (210) and [0028]) on the second side (Fig.1B-1H (100b) and [0026]) of the semiconductor substrate (Fig.1A-1H (100) and [ 0018-0019]) and along a sidewall of the via opening (Fig.1C-1H (190) and [0026 and 0028]), the insulator layer (Fig.1C-1H (210) and [0028]) including a photo-imageable material [0028]; and a second conductive routing structure (Fig.1C-1H (220) and [0029]) on an outer side of the insulator layer (Fig.1C-1H (210) and [0028]), the second conductive routing structure (Fig.1C-1H (220) and [0029]) extending through the via opening (Fig.1C-1H (190) and [0026 and 0029]) and directly contacting the portion of the first conductive routing structure (Fig.1A-1H (140) and [0021]). However, Huang fails to teach the additional limitation required by claim 1 as follows: the semiconductor substrate (Fig.1A-1H (100) and [ 0018-0019]) having a thickness distance between the first (Fig.1A-1H (100a) and [0019]) and second sides (Fig.1B-1H (100b) and [0026]) of approximately 20 um or more and less than 150 um. Oganesian teaches a substantially similar image sensor (Fig.1E) including the semiconductor substrate (Fig.1E (6) and [ 0017]) having a thickness distance between the first (Fig.1E (8) and [0017]) and second sides (Fig.1E (10) and [0017]) of approximately 20 um or more and less than 150 um [0017]. It would have been obvious to one of ordinary skill in the art to modify Huang’s teachings to include the thickness ranges 20 to 150 um- which values are suggested by Oganesian [0017] which teaches the openings/cavities (Fig.1E (12) would extend no further than ¾ the substrate thickness, leaving a minimum thickness at the maximum depth to be 50 um [0017-thus is it readily calculated that Oganesian suggests the thicknesses to be within the ranges of 20um and 150 um], since such thicknesses are considered known and suitable for image sensor with an underlying opening. The remaining claimed citations are in reference to the Huang reference; they are considered obvious for the same rationale provided above for claim 1, based upon their dependency: 2. The electronic device of claim 1, wherein the first (Fig.1A-1H (140) and [0021]) and second conductive routing structures (Fig.1C-1H (220) and [0029]) include copper [0030]. 3. The electronic device of claim 1, wherein the transparent cover includes glass (Fig.1A-1H (170) and [0023]). 4. The electronic device of claim 1, wherein the insulator layer includes polyimide material (Fig.1C-1H (210) and [0028]). 7. The electronic device of claim 1, further comprising a solder structure (Fig.1E-1H (280) and [0033]) attached to the second conductive routing structure (Fig.1C-1H (220) and [0029]) and extending outward from a bottom side of the electronic device (Fig.1E-1H (280) and [0033]). 8. The electronic device of claim 1, wherein the semiconductor substrate comprises a sensing area (Fig.1A-1H (120) and [0019]) exposed along the first side (Fig.1A-1H (100a) and [0019]) of the semiconductor substrate (Fig.1A-1H (100) and [ 0018-0019]) and spaced apart from the first conductive routing structure (Fig.1A-1H (140) and [0021]). Claim(s) 10 is/are rejected under 35 U.S.C. 103 as being unpatentable over Huang et al (US 2017/0077158), as applied to claim 9 above, in further view of Oganesian (US 2013/0056844). Huang teaches the limitations of claim 9 as cited above. However, Huang fails to teach the additional limitation required by claim 10 as follows: the semiconductor substrate (Fig.1A-1H (100) and [ 0018-0019]) having a thickness distance between the first (Fig.1A-1H (100a) and [0019]) and second sides (Fig.1B-1H (100b) and [0026]) of approximately 20 um or more and less than 150 um. Oganesian teaches a substantially similar image sensor (Fig.1E) including the semiconductor substrate (Fig.1E (6) and [ 0017]) having a thickness distance between the first (Fig.1E (8) and [0017]) and second sides (Fig.1E (10) and [0017]) of approximately 20 um or more and less than 150 um [0017]. It would have been obvious to one of ordinary skill in the art to modify Huang’s teachings to include the thickness ranges 20 to 150 um- which values are suggested by Oganesian [0017] which teaches the openings/cavities (Fig.1E (12) would extend no further than ¾ the substrate thickness, leaving a minimum thickness at the maximum depth to be 50 um [0017 thus is it readily calculated that Oganesian suggests the thicknesses to be within the ranges of 20um and 150 um], since such thicknesses are considered known and suitable for image sensor with an underlying opening. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Hayashi et al (EP 2802005); Aggarwal et al (US 20240038695; US 20240038694) teach similar structures. Any inquiry concerning this communication or earlier communications from the examiner should be directed to LAURA M MENZ whose telephone number is (571)272-1697. The examiner can normally be reached Monday-Friday 7:00-3:30. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Steven Gauthier can be reached at 571-270-0373. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /LAURA M MENZ/Primary Examiner, Art Unit 2813 10/9/25
Read full office action

Prosecution Timeline

Nov 28, 2022
Application Filed
Oct 19, 2025
Non-Final Rejection — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
87%
Grant Probability
96%
With Interview (+8.2%)
2y 6m
Median Time to Grant
Low
PTA Risk
Based on 922 resolved cases by this examiner. Grant probability derived from career allow rate.

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