Prosecution Insights
Last updated: July 17, 2026
Application No. 18/010,821

A PHOTOCURABLE COMPOSITION

Non-Final OA §102§103
Filed
Dec 16, 2022
Priority
Jun 22, 2020 — CN PCT/CN2020/097364 +1 more
Examiner
CHU, JOHN S Y
Art Unit
1737
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Huntsman Advanced Materials Licensing (Switzerland)Gmbh
OA Round
4 (Non-Final)
77%
Grant Probability
Favorable
4-5
OA Rounds
0m
Est. Remaining
83%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allowance Rate
749 granted / 971 resolved
+12.1% vs TC avg
Moderate +6% lift
Without
With
+5.6%
Interview Lift
resolved cases with interview
Typical timeline
2y 11m
Avg Prosecution
49 currently pending
Career history
1034
Total Applications
across all art units

Statute-Specific Performance

§101
0.4%
-39.6% vs TC avg
§103
75.6%
+35.6% vs TC avg
§102
12.8%
-27.2% vs TC avg
§112
6.3%
-33.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 971 resolved cases

Office Action

§102 §103
DETAILED CORRESPONDENCE This Office action is in response to the RCE received May 5, 2026. Bolded text indicates new language in the office action. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries set forth in Graham v. John Deere Co., 383 U.S. 1, 148 USPQ 459 (1966), that are applied for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claims 1-9 and 11, 12 are rejected under 35 U.S.C. 103 as being unpatentable over KAWANA (5,620,831) or TANAKA et al in view of IMKEN et al (2002/0114969) and HIGUCHI et al (2014/0186766) and SANTOBIANCO et al (2003/0065049) and FUJIKAWA et al (20180134838). The claimed invention now recites the following: PNG media_image1.png 328 702 media_image1.png Greyscale KAWANA report a photocurable composition comprising a resin, defined to be a carboxyl containing polymer formulated with an epoxy resin, a photopolymerization initiator and a filler (silica), see Example 5 in column 26, line 44 to column 27, line 40 below: PNG media_image2.png 360 360 media_image2.png Greyscale PNG media_image3.png 662 358 media_image3.png Greyscale Each of the components is highlighted above and no claims are allowed. TANAKA et al discloses the claimed ingredients at Examples 1-5 on Table 1 in column 17/18, see below: PNG media_image4.png 432 650 media_image4.png Greyscale TANAKA et al lack a working example employing a silica or talc filler, however those fillers are reported in column 12, lines 15-25, see below: PNG media_image5.png 202 444 media_image5.png Greyscale IMKEN et al report an epoxy novolac/photopolymerization initiator composition with the use of adjuvants/fillers such as silica and wollastonite, see page 4, para. [0057] below: PNG media_image6.png 288 370 media_image6.png Greyscale HIGUCHI et al report the claimed invention at Examples 1-13 wherein Table 1 and Table 2 report the components of the composition which include carboxyl group containing resins and an epoxy compound and a photopolymerization initiator, see Table 1below: PNG media_image7.png 1056 742 media_image7.png Greyscale The amount of the filler as seen in HIGUCHI et al, Example 1, Table 1 is calculated to be at 40%, as seen Example 1 for reference, meeting the amended content as now seen in claim 1. SANTOBIANCO et al (2003/0065049) is cited to disclose the use of fillers such as talc, silica and wollastonite in an amount of 1 to 40 percent by weight (para. [0042], while FUJIKAWA et al (20180134838) disclose the use of fillers in an amount of 1 to 30 parts by weight (para. [0116] It would have been prima facie obvious to one of ordinary skill in the art of photocurable composition use any of the listed filler/adjuvants components reported in IMKEN et al, HIGUCHI et al, TANAKA et al, FUJIKAWA et al and SANTOBIANCO et al, such as talc, silica and wollastonite in a composition such as reported in KAWANA or HIGUCHI et al in an amount of 30 to 40 percent by weight as seen in the newly cited references with the reasonable expectation of same or similar results for swift reactions to heat and the ability to remain stable at low temperatures. The rejection is repeated wherein the solvent resistance property now recited in claim 1 is a property of the composition after processing wherein any of the prior art compositions could be cured and processed in a myriad number of ways to arrive at the same or similar post curing properties as recited. Amended claim 1 to the composition continues to be seen as obvious over the prior art references for the formulation. Any inquiry concerning this communication or earlier communications from the examiner should be directed to JOHN S CHU whose telephone number is (571)272-1329. The examiner can normally be reached M-F, IFP-Flex. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Mark Huff, can be reached at telephone number 571-272-1385. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://portal.uspto.gov/external/portal. Should you have questions about access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. /John S. Chu/ Primary Examiner, Art Unit 1737 J. Chu May 16, 2026
Read full office action

Prosecution Timeline

Show 2 earlier events
Oct 01, 2025
Response Filed
Oct 27, 2025
Non-Final Rejection mailed — §102, §103
Jan 27, 2026
Response Filed
Feb 24, 2026
Final Rejection mailed — §102, §103
Apr 08, 2026
Response after Non-Final Action
May 05, 2026
Request for Continued Examination
May 06, 2026
Response after Non-Final Action
May 20, 2026
Non-Final Rejection mailed — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12681385
PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURING METHOD OF DISPLAY DEVICE USING THE SAME
3y 12m to grant Granted Jul 14, 2026
Patent 12663714
RESIST COMPOSITION AND PATTERN FORMING PROCESS
2y 11m to grant Granted Jun 23, 2026
Patent 12663715
PHOTOSENSITIVE RESIN FILM AND APPLICATION THEREOF
2y 3m to grant Granted Jun 23, 2026
Patent 12645142
A PHOTORESIST COMPOSITION, A METHOD FOR MANUFACTURING A PHOTORESIST COATING, ETCHED PHOTORESIST COATING, AND ETCHED SI CONTAINING LAYER(S), AND MANUFACTURING A DEVICE USING THEREOF
5y 5m to grant Granted Jun 02, 2026
Patent 12625427
NOVEL NAPHTHALIMIDE SULFONATE DERIVATIVE, AND PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION EACH COMPRISING SAME
2y 10m to grant Granted May 12, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

4-5
Expected OA Rounds
77%
Grant Probability
83%
With Interview (+5.6%)
2y 11m (~0m remaining)
Median Time to Grant
High
PTA Risk
Based on 971 resolved cases by this examiner. Grant probability derived from career allowance rate.

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