Prosecution Insights
Last updated: July 17, 2026
Application No. 18/025,250

RAW MATERIAL SUPPLY DEVICE AND RAW MATERIAL SUPPLY METHOD

Non-Final OA
Filed
Mar 08, 2023
Priority
Sep 15, 2020 — JP 2020-154854 +1 more
Examiner
TADESSE, YEWEBDAR T
Art Unit
1717
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Tokyo Electron Limited
OA Round
1 (Non-Final)
81%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
99%
With Interview

Examiner Intelligence

Grants 81% — above average
81%
Career Allowance Rate
971 granted / 1196 resolved
+16.2% vs TC avg
Strong +19% interview lift
Without
With
+19.4%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
28 currently pending
Career history
1227
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
58.8%
+18.8% vs TC avg
§102
10.9%
-29.1% vs TC avg
§112
27.0%
-13.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1196 resolved cases

Prosecution Timeline

Mar 08, 2023
Application Filed
Apr 21, 2026
Non-Final Rejection mailed (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12667862
ANILOX ROLLER AND COATING APPARATUS
3y 3m to grant Granted Jun 30, 2026
Patent 12667863
MULTI-SLOT DIE, COATING METHOD USING THE SAME, SLURRY SUPPLY SYSTEM, AND SLURRY SUPPLY METHOD USING THE SAME
2y 3m to grant Granted Jun 30, 2026
Patent 12663733
LITHOGRAPHY APPARATUS WITH IMPROVED STABILITY
4y 0m to grant Granted Jun 23, 2026
Patent 12660567
SUBSTRATE SUPPORTS FOR SEMICONDUCTOR PROCESSING SYSTEMS
3y 8m to grant Granted Jun 16, 2026
Patent 12636675
DEVICE FOR APPLYING COMPOUNDS AND THE USE THEREOF
3y 1m to grant Granted May 26, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
81%
Grant Probability
99%
With Interview (+19.4%)
2y 9m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1196 resolved cases by this examiner. Grant probability derived from career allowance rate.

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