Prosecution Insights
Prosecution Insights
Technology areas: Chemistry & Materials • Semiconductors, Circuits & Optics
296 pending office actions • 79 art units • 194 examiners • 0 of 296 (0%) have an AI response strategy ready • 678 patents granted in the last 365 days
Tokyo Electron Limited maintains a high-volume portfolio with 301 pending office actions in the Chemistry & Materials technology area. This workload is distributed across 197 distinct examiners, reflecting a large scale of ongoing prosecution. The ratio of actions to examiners suggests that while many examiners handle a single matter, others manage multiple cases simultaneously.
The company operates across 55 distinct art units, showing significant technical diversity in its patent filings. CHEN, KEATH T is identified as the busiest examiner, managing 8 pending office actions. This figure represents a small fraction of the total 301 actions, suggesting that even the most active examiners handle only a minor portion of the overall portfolio. Such a wide distribution across 55 art units indicates that the company's legal strategy must account for a variety of examination styles and technical standards.
Based on the USPTO statutory response window for each pending office action. 56 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 56 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §101 only | 1 (0%) |
| §101 + other | 14 (5%) |
| §103 only | 111 (38%) |
| §102 only | 26 (9%) |
| §112 only | 17 (6%) |
| Double-patenting only | 4 (1%) |
| Double-patenting + other | 8 (3%) |
| Multi-statute (no §101) | 114 (39%) |
| No statute on record | 1 (0%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| CHEN, KEATH T | 8 | 30.2% | +24.8% |
| CROWELL, ANNA M | 7 | 44.5% | +30.6% |
| KENDALL, BENJAMIN R | 7 | 33.5% | +21.5% |
| MACARTHUR, SYLVIA | 5 | 65.8% | +25.8% |
| ZERVIGON, RUDY | 5 | 66.8% | -5.4% |
| MOORE, KARLA A | 5 | 43.1% | +13.7% |
| LAOBAK, ANDREW KEELAN | 5 | 75.4% | +34.5% |
| PHAM, THOMAS T | 5 | 51.4% | +15.7% |
| BAREFORD, KATHERINE A | 4 | 13.9% | +28.6% |
| REYES, JOSHUA NATHANIEL PI | 4 | 41.4% | +51.2% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17756373 | INFERENCE DEVICE, INFERENCE METHOD AND INFERENCE PROGRAM FOR ANALYZING MANUFACTURING TIME-SERIES DATA USING A PLURALITY OF NETWORK SECTIONS | AGRAWAL, SHISHIR | 60d overdue |
| 18120050 | UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS | CHAN, LAUREEN | 36d overdue |
| 18326266 | HEAT TREATMENT APPARATUS, HEAT TREATMENT METHOD, AND RECORDING MEDIUM | ADHIKARI DAWADI, BIPANA | 31d overdue |
| 18369219 | SUBSTRATE PROCESSING METHOD, COMPONENT PROCESSING METHOD, AND SUBSTRATE PROCESSING APPARATUS | LEE, AIDEN Y | 19d overdue |
| 18789854 | HYDROPHOBIZATION TREATMENT APPARATUS, HYDROPHOBIZATION TREATMENT METHOD, AND COMPUTER STORAGE MEDIUM | CROWELL, ANNA M | 3d overdue |
| 17997558 | REPLACING APPARATUS AND REPLACING METHOD | CADUGAN, ERICA E | 2d overdue |
| 18509560 | INTEGRATED NANOSHEET MEMORY ELEMENTS, DEVICES AND METHODS | YAP, DOUGLAS ANTHONY | 6d |
| 18350519 | PLASMA PROCESSING METHOD AND APPARATUS | ZERVIGON, RUDY | 14d |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17757781 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | REYES, JOSHUA NATHANIEL PI | 51d overdue |
| 17747861 | PLASMA PROCESSING APPARATUS | KENDALL, BENJAMIN R | 31d overdue |
| 18359783 | APPARATUS AND METHOD FOR PLASMA PROCESSING | KENDALL, BENJAMIN R | 18d overdue |
| 18603049 | CYCLIC ETCH/DEPOSITION PLASMA PROCESSES USING TUNGSTEN BASED PRECURSOR GAS | LAOBAK, ANDREW KEELAN | 11d overdue |
| 18789854 | HYDROPHOBIZATION TREATMENT APPARATUS, HYDROPHOBIZATION TREATMENT METHOD, AND COMPUTER STORAGE MEDIUM | CROWELL, ANNA M | 3d overdue |
| 17894296 | ELECTROSTATIC CHUCK, SUBSTRATE SUPPORT, PLASMA PROCESSING APPARATUS, AND METHOD OF MANUFACTURING ELECTROSTATIC CHUCK | CROWELL, ANNA M | 12d |
| 18552108 | SUBSTRATE LIQUID-TREATMENT DEVICE | MACARTHUR, SYLVIA | 14d |
| 18402328 | FAULT DETECTION AND CLASSIFICATION (FDC) FOR ENDPOINT DETECTION (EPD) BY REFLECTOMETRY | PHAM, THOMAS T | 16d |
| Art Unit | Apps |
|---|---|
| 1716 | 42 |
| 1718 | 32 |
| 1713 | 26 |
| 1717 | 11 |
| 1712 | 9 |
| 1794 | 9 |
| 1714 | 7 |
| 3652 | 7 |
| 2896 | 7 |
| 2845 | 6 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19274978 | FILM FORMING METHOD AND FILM FORMING APPARATUS | LAW, NGA LEUNG V | 1717 | §103 | Non-Final OA | — | Pending | Jul 21, 2025 |
| 19272175 | SUBSTRATE PROCESSING METHOD | EMPIE, NATHAN H | 1712 | §102§103 | Non-Final OA | — | Pending | Jul 17, 2025 |
| 19265822 | PLASMA-PROCESSING APPARATUS AND PLASMA-PROCESSING METHOD | KAISER, SYED M | 2831 | §102 | Non-Final OA | — | Pending | Jul 10, 2025 |
| 19264096 | PLASMA PROCESSING APPARATUS | TRAN, MINH | 2845 | §102§103 | Non-Final OA | — | Pending | Jul 09, 2025 |
| 19240089 | PLASMA PROCESSING APPARATUS | LE, TUNG X | 2845 | §103 | Non-Final OA | — | Pending | Jun 17, 2025 |
| 19233036 | CONTROL METHOD AND PLASMA PROCESSING APPARATUS | SATHIRAJU, SRINIVAS | 2845 | DP | Non-Final OA | — | Pending | Jun 10, 2025 |
| 19232884 | CONTROL METHOD AND PLASMA PROCESSING APPARATUS | SATHIRAJU, SRINIVAS | 2845 | DP | Non-Final OA | — | Pending | Jun 10, 2025 |
| 19232127 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | WIECZOREK, MICHAEL P | 1715 | §103§112 | Non-Final OA | — | Pending | Jun 09, 2025 |
| 19221714 | RECORDING MEDIUM, INFORMATION PROCESSING APPARATUS, AND INFORMATION PROCESSING METHOD | HU, JENSEN | 2169 | §101 | Final Rejection | — | Pending | May 29, 2025 |
| 19213239 | Substrate Processing Method and Substrate Processing Apparatus | WALTERS JR, ROBERT S | 1717 | §112 | Non-Final OA | — | Pending | May 20, 2025 |
| 19211708 | RECIPE OPTIMIZATION METHOD AND HEAT TREATMENT APPARATUS | PROCTOR, CACHET I | 1712 | §103§112 | Non-Final OA | — | Pending | May 19, 2025 |
| 19212511 | Substrate Processing Method and Substrate Processing Apparatus | HERNANDEZ-KENNEY, JOSE | 1717 | §103 | Final Rejection | — | Pending | May 19, 2025 |
| 19210017 | FILM FORMING METHOD AND PLASMA PROCESSING APPARATUS | CHEN, BRET P | 1715 | §112 | Non-Final OA | — | Pending | May 16, 2025 |
| 19207755 | PLASMA PROCESSING APPARATUS AND MATCHING DEVICE | KAISER, SYED M | 2831 | §102 | Non-Final OA | — | Pending | May 14, 2025 |
| 19204688 | PLASMA PROCESSING APPARATUS | SWANSON, ANDREW L | 1745 | §101§102§103§112DP | Non-Final OA | — | Pending | May 12, 2025 |
| 19205415 | CLEANING METHOD AND FILM-FORMING APPARATUS | MILLER, MICHAEL G | 1712 | §103 | Non-Final OA | — | Pending | May 12, 2025 |
| 19191504 | FILM FORMING METHOD AND FILM FORMING APPARATUS | WALTERS JR, ROBERT S | 1717 | §103 | Non-Final OA | — | Pending | Apr 28, 2025 |
| 19186758 | SUBSTRATE INSPECTION APPARATUS AND SUBSTRATE INSPECTION METHOD | AHMED, JAMIL | 2877 | DP | Non-Final OA | — | Pending | Apr 23, 2025 |
| 19185246 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | BAREFORD, KATHERINE A | 1718 | §103 | Final Rejection | — | Pending | Apr 22, 2025 |
| 19183966 | SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS | ADDISU, SARA | 3722 | §102§103 | Non-Final OA | — | Pending | Apr 21, 2025 |
| 18846977 | EXHAUST STRUCTURE AND EXHAUST METHOD FOR FLOW RATE CONTROL DEVICE, AND GAS SUPPLY SYSTEM AND GAS SUPPLY METHOD COMPRISING SAME | HICKS, ANGELISA | 3753 | §103§112 | Non-Final OA | — | Pending | Apr 17, 2025 |
| 19175014 | SUBSTRATE PROCESSING APPARATUS, MEASURING DEVICE, AND MEASURING METHOD | AMARA, MOHAMED K | 2877 | §102§103 | Non-Final OA | — | Pending | Apr 10, 2025 |
| 19170138 | DEVELOPING APPARATUS, DEVELOPING METHOD, AND COMPUTER PROGRAM | WHITESELL, STEVEN H | 1759 | §102§103 | Non-Final OA | — | Pending | Apr 04, 2025 |
| 19096492 | AREA SELECTIVE DEPOSITION USING METAL CARBONYL PRECURSORS | EMPIE, NATHAN H | 1712 | §102§103 | Non-Final OA | — | Pending | Mar 31, 2025 |
| 19093922 | METHOD FOR OPERATING FILM FORMING DEVICE AND FILM FORMING DEVICE | ROLLAND, ALEX A | 1759 | §103 | Final Rejection | — | Pending | Mar 28, 2025 |
| 19090806 | COOLING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND COOLING METHOD | RUPPERT, ERIC S | 3763 | §102§103 | Non-Final OA | — | Pending | Mar 26, 2025 |
| 19090475 | SUBSTRATE EVALUATION METHOD AND SUBSTRATE PROCESSING APPARATUS | AKANBI, ISIAKA O | 2877 | §102§103 | Non-Final OA | — | Pending | Mar 26, 2025 |
| 18684088 | FILM FORMING METHOD AND FILM FORMING APPARATUS | TADAYYON ESLAMI, TABASSOM | 1718 | §103 | Final Rejection | — | Pending | Mar 24, 2025 |
| 19086206 | FILM FORMING METHOD AND FILM FORMING APPARATUS | TALBOT, BRIAN K | 1712 | §103§112 | Non-Final OA | — | Pending | Mar 21, 2025 |
| 19082876 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | AYALEW, TINSAE B | 1711 | §102§103§112 | Non-Final OA | — | Pending | Mar 18, 2025 |
| 19111422 | PROCESSOR THAT IMPLEMENTS INDIRECT ADDRESSING-STYLE CONDITIONAL JUMP INSTRUCTIONS, PROGRAM RECORDING MEDIUM, AND METHOD | METZGER, MICHAEL J | 2183 | §103 | Non-Final OA | — | Pending | Mar 13, 2025 |
| 19078750 | INSPECTION METHOD, INSPECTION DEVICE, AND PROGRAM | SANGHERA, JAS A | 2852 | §102§103 | Non-Final OA | — | Pending | Mar 13, 2025 |
| 19070912 | FILM FORMING METHOD AND FILM FORMING APPARATUS | TUROCY, DAVID P | 1718 | §103 | Non-Final OA | — | Pending | Mar 05, 2025 |
| 19063605 | MONITORING APPARATUS, SUBSTRATE PROCESSING APPARATUS, MONITORING METHOD, AND STORAGE MEDIUM | WASEL, MOHAMED A | 2454 | §102Other | Non-Final OA | — | Pending | Feb 26, 2025 |
| 19062585 | ETCHING METHOD, PRECOAT METHOD, AND ETCHING APPARATUS | AHMED, SHAMIM | 1713 | §102§103 | Non-Final OA | — | Pending | Feb 25, 2025 |
| 19056816 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | NUCKOLS, TIFFANY Z | 1716 | §103 | Non-Final OA | — | Pending | Feb 19, 2025 |
| 19050019 | SUBSTRATE PROCESSING DEVICE AND POSITIONING METHOD OF CONVEYANCE ARM | AN, IG TAI | 3662 | §103 | Non-Final OA | — | Pending | Feb 10, 2025 |
| 19033032 | COATING FILM FORMING METHOD, COATING FILM FORMING APPARATUS, AND STORAGE MEDIUM | TADESSE, YEWEBDAR T | 1718 | §102 | Non-Final OA | — | Pending | Jan 21, 2025 |
| 19021284 | CONTROL PROGRAM, INFORMATION PROCESSING PROGRAM, CONTROL METHOD, INFORMATION PROCESSING METHOD, PLASMA PROCESSING DEVICE, AND INFORMATION PROCESSING DEVICE | LEE, WILSON | 2844 | §102§103 | Non-Final OA | — | Pending | Jan 15, 2025 |
| 19023119 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD INCLUDING A PRE-TREATMENT PROCESS OF SUPPLYING A HEATED FLUID TO A SECOND SURFACE OF A SUBSTRATE AND SUPPLYING A PRE-WETTING LIQUID TO A FIRST SURFACE OF THE SUBSTRATE, WHILE ROTATING THE SUBSTRATE | BERGNER, ERIN FLANAGAN | 1713 | §103§112 | Non-Final OA | — | Pending | Jan 15, 2025 |
| 19022101 | PLASMA PURGE METHOD AND PLASMA PROCESSING APPARATUS | GOLIGHTLY, ERIC WAYNE | 1714 | §103 | Non-Final OA | — | Pending | Jan 15, 2025 |
| 19012374 | INFORMATION PROCESSING APPARATUS, SEMICONDUCTOR MANUFACTURING APPARATUS, AND INFORMATION PROCESSING METHOD | HATCHER, DEIRDRE D | 3625 | §101§103 | Non-Final OA | — | Pending | Jan 07, 2025 |
| 19010740 | 3D IMAGING BY LIQUID IMMERSION WITH TILT AND/OR ROTATION | ZHAO, DAQUAN | 2484 | — | Non-Final OA | — | Pending | Jan 06, 2025 |
| 19010575 | BONDING METHOD AND BONDING APPARATUS | PATWARDHAN, ABHISHEK A | 1746 | §103§112 | Non-Final OA | — | Pending | Jan 06, 2025 |
| 19005674 | Transfer System and Semiconductor Manufacturing Method | TIGHE, BRENDAN P | 3652 | §103 | Non-Final OA | — | Pending | Dec 30, 2024 |
| 18879383 | SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE, AND STORAGE MEDIUM | LEE, DOUGLAS | 1714 | §102§103 | Non-Final OA | — | Pending | Dec 27, 2024 |
| 18999454 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | VETERE, ROBERT A | 1712 | §103 | Non-Final OA | 63d | Pending | Dec 23, 2024 |
| 18986780 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | NGUYEN, CHI Q | 3635 | §112 | Non-Final OA | — | Pending | Dec 19, 2024 |
| 18986429 | MEASUREMENT SYSTEM, MEASUREMENT METHOD, AND PLASMA PROCESSING DEVICE | FABIAN JR, ROBERTO | — | §103 | Final Rejection | — | Pending | Dec 18, 2024 |
| 18985733 | INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, AND STORAGE MEDIUM | CHAN, CAROL WANG | 2672 | §112 | Non-Final OA | — | Pending | Dec 18, 2024 |
IP Author helps IP teams respond to office actions faster with AI-generated responses, examiner analytics, and prosecution intelligence.
Start Free TrialTokyo Electron Limited has 296 pending office actions as of October 2026, spread across 79 art units and 194 examiners.
Keath T Chen has the most, with 8 of Tokyo Electron Limited's pending office actions.
Mostly Chemistry & Materials (USPTO Tech Center 1700), based on where its pending office actions are examined.