Office Action Predictor
Last updated: April 15, 2026
Application No. 18/036,271

METHOD FOR PRODUCING WIRING BOARD

Non-Final OA §112
Filed
May 10, 2023
Examiner
CHANG, JAY C
Art Unit
2817
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Mitsui Mining & Smelting Co., LTD.
OA Round
1 (Non-Final)
85%
Grant Probability
Favorable
1-2
OA Rounds
2y 2m
To Grant
95%
With Interview

Examiner Intelligence

Grants 85% — above average
85%
Career Allow Rate
537 granted / 635 resolved
+16.6% vs TC avg
Moderate +10% lift
Without
With
+10.3%
Interview Lift
resolved cases with interview
Typical timeline
2y 2m
Avg Prosecution
43 currently pending
Career history
678
Total Applications
across all art units

Statute-Specific Performance

§101
0.4%
-39.6% vs TC avg
§103
38.6%
-1.4% vs TC avg
§102
32.3%
-7.7% vs TC avg
§112
25.7%
-14.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 635 resolved cases

Office Action

§112
DETAILED ACTION The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . This action is responsive to the following communications: the Amendment filed 5/10/2023. Claims 1-18 are pending. Information Disclosure Statement The information disclosure statements (IDS) submitted on 7/28/2023, 4/22/2024 and 5/21/2025 are in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statements are being considered by the examiner. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claims 1-18 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Claim 1 recites the limitation “the carrier side” in line 5 of the claim. There is insufficient antecedent basis for this limitation in the claim. Claim 1 recites the limitation “both ends thereof” in line 6 of the claim, however it is unclear what specific element is being referenced in the term “thereof”. The Examiner suggests amending the limitation to expressly recite the specific element being referenced in the limitation “both ends thereof”. Claim 1 recites the limitation “the metal layer side” in line 11 of the claim. There is insufficient antecedent basis for this limitation in the claim. Claim 18 recites the limitation “the metal layer side” in line 6 of the claim. There is insufficient antecedent basis for this limitation in the claim. Note the dependent claims 2-17 necessarily inherit the indefiniteness of the claims on which they depend. Allowable Subject Matter Claims 1-18 would be allowable if rewritten or amended to overcome the rejection(s) under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), 2nd paragraph, set forth in this Office action. Regarding independent claim 1, Shimokawa et al. (US 2020/0266089 A1, hereinafter “Shimokawa”) discloses a method for manufacturing a wiring substrate, comprising: providing a laminated sheet comprising a release layer 14 (“release layer”- ¶0012), a metal layer 20 (“interconnect layer”, which includes metal- ¶0027), and a device layer 30 (“semiconductor element”- ¶0029) in order on a carrier 11 (“substrate”- ¶0012) (see Figs. 1-3B). Shimokawa does not expressly disclose making a cut line from a surface of the laminated sheet on the carrier side so that the cut line passes through an inside of a contour of the device layer and both ends thereof reach an end of the laminated sheet when the laminated sheet is seen in a planar view, and so as to pass through the carrier, the release layer, and the metal layer when the laminated sheet is seen in a cross-sectional view and removing outer edge portions outside the cut line in the carrier, the release layer, and the metal layer, thereby exposing part of a surface of the device layer on the metal layer side to form a pressurizable exposed portion for promoting release of the carrier. Thus, regarding independent claim 1 (which claims 2-17 depend from), the prior art of record including Shimokawa, either singularly or in combination, does not disclose or suggest the combination of limitations including, but not limited to, “making a cut line from a surface of the laminated sheet on the carrier side so that the cut line passes through an inside of a contour of the device layer and both ends thereof reach an end of the laminated sheet when the laminated sheet is seen in a planar view, and so as to pass through the carrier, the release layer, and the metal layer when the laminated sheet is seen in a cross-sectional view” and “removing outer edge portions outside the cut line in the carrier, the release layer, and the metal layer, thereby exposing part of a surface of the device layer on the metal layer side to form a pressurizable exposed portion for promoting release of the carrier”. Regarding independent claim 18, Figure 3B of Shimokawa discloses a wiring substrate material comprising a release layer 14 (“release layer”- ¶0012), a metal layer 20 (“interconnect layer”, which includes metal- ¶0027), and a device layer 30 (“semiconductor element”- ¶0029) in order on a carrier 11 (“substrate”- ¶0012). Shimokawa does not expressly disclose wherein outer edge portions of the carrier, the release layer, and the metal layer are missing in at least one place along at least one line passing through an inside of a contour of the device layer when the wiring substrate material is seen in a planar view, whereby part of a surface of the device layer on the metal layer side is exposed. Thus, regarding independent claim 18, the prior art of record including Shimokawa, either singularly or in combination, does not disclose or suggest the combination of limitations including, but not limited to, “wherein outer edge portions of the carrier, the release layer, and the metal layer are missing in at least one place along at least one line passing through an inside of a contour of the device layer when the wiring substrate material is seen in a planar view, whereby part of a surface of the device layer on the metal layer side is exposed”. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure: Matsuura et al. (US 2019/0378727 A1), which discloses a wiring substrate comprising a releaser layer, a metal layer and a device layer. Any inquiry concerning this communication or earlier communications from the examiner should be directed to JAY C CHANG whose telephone number is (571)272-6132. The examiner can normally be reached Mon- Fri 12pm-10pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Eliseo Ramos-Feliciano can be reached at (571)-272-7925. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /JAY C CHANG/ Primary Examiner, Art Unit 2817
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Prosecution Timeline

May 10, 2023
Application Filed
Dec 04, 2025
Non-Final Rejection — §112
Mar 31, 2026
Response Filed

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
85%
Grant Probability
95%
With Interview (+10.3%)
2y 2m
Median Time to Grant
Low
PTA Risk
Based on 635 resolved cases by this examiner. Grant probability derived from career allow rate.

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