Prosecution Insights
Last updated: April 19, 2026
Application No. 18/085,082

PHOTORESIST UNDERLAYER COMPOSITION

Non-Final OA §102§103
Filed
Dec 20, 2022
Examiner
CHU, JOHN S Y
Art Unit
1737
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Rohm And Haas Electronic Materials Korea Ltd.
OA Round
3 (Non-Final)
77%
Grant Probability
Favorable
3-4
OA Rounds
3y 1m
To Grant
82%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allow Rate
740 granted / 959 resolved
+12.2% vs TC avg
Moderate +5% lift
Without
With
+5.1%
Interview Lift
resolved cases with interview
Typical timeline
3y 1m
Avg Prosecution
65 currently pending
Career history
1024
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
48.2%
+8.2% vs TC avg
§102
29.9%
-10.1% vs TC avg
§112
12.1%
-27.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 959 resolved cases

Office Action

§102 §103
DETAILED CORRESPONDENCE This Office action is in response to the RCE received February 25, 2026. The rejection under 35 U.S.C. 112(a) or 35 U.S.C. 112 (pre-AIA ), first paragraph, as failing to comply with the written description requirement. The claim(s) contains subject matter which was not described in the specification in such a way as to reasonably convey to one skilled in the relevant art that the inventor or a joint inventor, or for applications subject to pre-AIA 35 U.S.C. 112, the inventor(s), at the time the application was filed, had possession of the claimed invention is withdrawn in view of the amendment to claim 1. The rejections under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention is withdrawn in view of the amendment to claim 1. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries set forth in Graham v. John Deere Co., 383 U.S. 1, 148 USPQ 459 (1966), that are applied for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claims 1, 4, 5, 7-10, 13, 14, 18, and 19 are rejected under 35 U.S.C. 103 as being unpatentable over HORIGUCHI et al (2009/0311624) and SIM et al (2017/0283651) and LEE et al (2018/0364575). The claimed invention now recites the following: PNG media_image1.png 808 642 media_image1.png Greyscale PNG media_image2.png 260 656 media_image2.png Greyscale HORIGUCHI et al report an underlayer coating comprising a resin (A), a liquid additive and a solvent (C) (para. [0043]) wherein the resin (A) used in the prior art contains a compound having structural units containing carboxyl groups, protected carboxyl groups and a compound reactable with a carboxyl group, such as a group represented by Formula (5) as reported in para. [0049] and para. [0110] see below: PNG media_image3.png 68 370 media_image3.png Greyscale PNG media_image4.png 356 368 media_image4.png Greyscale The group that represents Formula (5) are disclosed in para. [0054] shown below: PNG media_image5.png 246 370 media_image5.png Greyscale And more specifically in para. [0094] for N-methoxymethyl methacrylamide and others meeting the first structural unit in the first polymer, see below: PNG media_image6.png 404 370 media_image6.png Greyscale So, the comonomers of Formula (5) meet the first polymer and first structural unit. The second structural unit in the first polymer to a heterocyclic group is met by any of those copolymers reported on page 10-12 with [1-15] having a heterocyclic group: PNG media_image7.png 160 350 media_image7.png Greyscale With respect to the second polymer having the structures derived from Formula (4), (5) and combinations thereof in claim 1, applicants are directed to para. [0136] which discloses a light absorbing compound (D) wherein compound [4-4] is shown below being an isocyanurate compound derivative: PNG media_image8.png 152 340 media_image8.png Greyscale New claim 11 is met by the disclosed in page 10-12 such as [1-10] below: PNG media_image9.png 236 358 media_image9.png Greyscale SIM et al discloses a coating composition for underlayer wherein the composition comprises a thermal acid generator (para. [0097]-[0098]) , a first resin meeting the claimed second polymer derived from a structure unit of formula (4), see pages 4-15 wherein the general structure is defined to be formula (8) seen below: PNG media_image10.png 192 684 media_image10.png Greyscale With respect to the first polymer comprising a N-(alkoxymethyl) (meth)acrylic amide monomer, applicants are directed to page 26, para. [0094] for the disclosed use of a crosslinker like an amine-based crosslinker which is prepared by copolymerization of N-alkoxymethyl acrylamide or methacrylamide with other suitable monomers. LEE et al to the same assignee, likewise disclose a composition comprising a thermal acid generator (para. [0053]-[0054]) which may further comprise a polymer having isocyanurate units, see page 4 para. [0029] and page 8, para. [0039], respectively. These polymers may be defined as Polymers 1-5 seen in page 8 , with Polymer 1 cited below for reference: PNG media_image11.png 192 732 media_image11.png Greyscale Applicants are further directed to page 9, para.[0051] wherein a N-(alkoxymethyl) (meth)acrylic amide monomer can be copolymerized with suitable monomers to form the crosslinking resins. Claim 4 and 5 are met by the para. [0094] of SIM et al. Claims 7-10 are met by the coated substrate and method on page 36, para. [0154] in SIM et al. Claims 13, 14, 18 and 19 are taught above in para. [0094] in SIM et al and para. [0051] in LEE et al. It would have been prima facie obvious to one of ordinary skill in the art of underlayer compositions to use add a crosslinker resin made from N-(alkoxymethyl) (meth)acrylic amide monomer as reported in LEE et al and SIM et al with specific monomers as disclosed in HORIGUCHI et al and is formulated with a resin having isocyanurate units such as Polymer 1 seen in both SIM et al and LEE et al and reasonably expect an underlayer that provides increased resolution of an image pattern and exhibit fast dry etch rates. Any inquiry concerning this communication or earlier communications from the examiner should be directed to JOHN S CHU whose telephone number is (571)272-1329. The examiner can normally be reached M-F, IFP-Flex. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Mark Huff, can be reached at telephone number 571-272-1385. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://portal.uspto.gov/external/portal. Should you have questions about access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. /John S. Chu/ Primary Examiner, Art Unit 1737 J. Chu March 16, 2026
Read full office action

Prosecution Timeline

Dec 20, 2022
Application Filed
Jun 28, 2025
Non-Final Rejection — §102, §103
Sep 19, 2025
Response Filed
Dec 04, 2025
Final Rejection — §102, §103
Feb 05, 2026
Response after Non-Final Action
Feb 25, 2026
Request for Continued Examination
Mar 04, 2026
Response after Non-Final Action
Mar 16, 2026
Non-Final Rejection — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12601975
COMPOSITIONS FOR REDUCING RESIST CONSUMPTION OF EXTREME ULTRAVIOLET METALLIC TYPE RESIST
2y 5m to grant Granted Apr 14, 2026
Patent 12585186
PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
2y 5m to grant Granted Mar 24, 2026
Patent 12578646
ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND PATTERNING
2y 5m to grant Granted Mar 17, 2026
Patent 12554198
Functional hydrogen silsesquioxane resins and the use thereof
2y 5m to grant Granted Feb 17, 2026
Patent 12547074
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM, PATTERNED CURED FILM AND SEMICONDUCTOR ELEMENT
2y 5m to grant Granted Feb 10, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

AI Strategy Recommendation

Get an AI-powered prosecution strategy using examiner precedents, rejection analysis, and claim mapping.
Powered by AI — typically takes 5-10 seconds

Prosecution Projections

3-4
Expected OA Rounds
77%
Grant Probability
82%
With Interview (+5.1%)
3y 1m
Median Time to Grant
High
PTA Risk
Based on 959 resolved cases by this examiner. Grant probability derived from career allow rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month