Prosecution Insights
Last updated: April 19, 2026
Application No. 18/087,318

ELONGATED CONTACT FOR SOURCE OR DRAIN REGION

Non-Final OA §102
Filed
Dec 22, 2022
Examiner
OH, JAEHWAN
Art Unit
2899
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Intel Corporation
OA Round
1 (Non-Final)
85%
Grant Probability
Favorable
1-2
OA Rounds
2y 4m
To Grant
95%
With Interview

Examiner Intelligence

Grants 85% — above average
85%
Career Allow Rate
555 granted / 656 resolved
+16.6% vs TC avg
Moderate +10% lift
Without
With
+10.4%
Interview Lift
resolved cases with interview
Typical timeline
2y 4m
Avg Prosecution
23 currently pending
Career history
679
Total Applications
across all art units

Statute-Specific Performance

§101
0.9%
-39.1% vs TC avg
§103
47.4%
+7.4% vs TC avg
§102
36.8%
-3.2% vs TC avg
§112
7.4%
-32.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 656 resolved cases

Office Action

§102
The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . DETAILED ACTION Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 1-20 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Lin et al. (U.S. Patent Application Publication 2020/0006160, hereinafter referred to as Lin). As to claim 1, Lin teaches 1. An integrated circuit comprising: a semiconductor device having a semiconductor region extending in a first direction from a source or drain region, and a gate structure extending in a second direction over the semiconductor region [see 204, 206 and 210 in Fig. 2]; and a conductive contact on at least a top surface of the source or drain region, wherein the conductive contact has a first section directly above the source or drain region and a second section extending away from the source or drain region such that the source or drain region is not below the second section, and wherein the first section has a first thickness and the second section has a second thickness, the first thickness being greater than the second thickness by 5 nm or more. [see 256 in Fig. 13] As to claim 2, Lin teaches 2. The integrated circuit of claim 1, wherein the semiconductor region comprises a plurality of semiconductor nanoribbons. [¶0013] As to claim 3, Lin teaches 3. The integrated circuit of claim 1, wherein a top surface of the first section of the conductive contact is substantially coplanar with a top surface of the second section of the conductive contact, and a bottom surface of the first section of the conductive contact is not coplanar with a bottom surface of the second section of the conductive contact due to the first thickness being greater than the second thickness. [see 256 in Fig. 13] As to claim 4, Lin teaches 4. The integrated circuit of claim 1, wherein the source or drain region is a first source or drain region and the second section of the conductive contact extends over a second source or drain region of an adjacent semiconductor device. [see 256 in Fig. 13] As to claim 5, Lin teaches 5. The integrated circuit of claim 4, wherein the first source or drain region has a different dopant type (n or p) than the second source or drain region. [see 214, 216 in Fig. 13] As to claim 6, Lin teaches 6. The integrated circuit of claim 1, further comprising a conductive via that contacts a top surface of the second section of the conductive contact. [see 256 in Fig. 12] As to claim 7, Lin teaches 7. The integrated circuit of claim 1, wherein both the first and second sections of the conductive contact comprise a continuous conductive liner and a continuous and monolithic body of conductive fill. [see 252, 250, 256 in Fig. 13] As to claim 8, Lin teaches 8. A printed circuit board comprising the integrated circuit of claim 1. [¶0002, 0015] As to claim 9, Lin teaches 9. An electronic device, comprising: a chip package comprising one or more dies, at least one of the one or more dies comprising a semiconductor device having a semiconductor region extending in a first direction from a source or drain region, and a gate structure extending in a second direction over the semiconductor region; and a conductive contact on at least a top surface of the source or drain region, wherein the conductive contact has a first section directly above the source or drain region and a second section extending away from the source or drain region such that the source or drain region is not below the second section, and wherein the first section has a first thickness and the second section has a second thickness, the first thickness being at least 10 nm greater than the second thickness. [see 204, 206 and 210 in Fig. 2; see 256 in Fig. 13; ¶0002; ¶0015] As to claim 10, Lin teaches 10. The electronic device of claim 9, wherein a top surface of the first section of the conductive contact is substantially coplanar with a top surface of the second section of the conductive contact. [see 256 in Fig. 13] As to claim 11, Lin teaches 11. The electronic device of claim 9, wherein the source or drain region is a first source or drain region and the second section of the conductive contact extends over a second source or drain region from an adjacent semiconductor device. [see 256 in Fig. 13] As to claim 12, Lin teaches 12. The electronic device of claim 9, wherein the at least one of the one or more dies further comprises a conductive via that contacts a top surface of the second section of the conductive contact. [see 292 and 256 in Fig. 13] As to claim 13, Lin teaches 13. The electronic device of claim 9, wherein the first thickness is at least two times greater than the second thickness. [see 256 in Fig. 13] As to claim 14, Lin teaches 14. The electronic device of claim 9, further comprising a printed circuit board, wherein the chip package is coupled to the printed circuit board. [¶0002; ¶0015] As to claim 15, Lin teaches 15. An integrated circuit comprising: a first semiconductor device having a first semiconductor region extending in a first direction from a first source or drain region; a second semiconductor device having a second semiconductor region extending in the first direction from a second source or drain region, the second source or drain region being adjacent to the first source or drain region along a second direction orthogonal to the first direction; and a conductive contact on at least a top surface of the first source or drain region, wherein the conductive contact has a first section directly above the first source or drain region and a second section extending away from the source or drain region and over, but not contacting, the second source or drain region, and wherein the first section has a first thickness and the second section has a second thickness, the first thickness being at least 5 nm greater than the second thickness. [see rejections claim 1 and 9 above] As to claim 16, Lin teaches 16. The integrated circuit of claim 15, wherein a top surface of the first section of the conductive contact is substantially coplanar with a top surface of the second section of the conductive contact. [see 256 in Fig. 13] As to claim 17, Lin teaches 17. The integrated circuit of claim 15, wherein the first source or drain region has a different dopant type (n or p) than the second source or drain region. [see 214, 216 in Fig. 13] As to claim 18, Lin teaches 18. The integrated circuit of claim 15, further comprising a conductive via that contacts a top surface of the second section of the conductive contact. [see 292, 256 in Fig. 13] As to claim 19, Lin teaches 19. The integrated circuit of claim 15, wherein both the first and second sections of the conductive contact comprise a conductive liner and a conductive fill. [see 252 in Fig. 13] As to claim 20, Lin teaches 20. The integrated circuit of claim 15, wherein the first thickness is at least two times greater than the second thickness. [see 256 in Fig. 13] Conclusion Claims 1-20 are rejected as explained above. The prior art made of record in the PTO-892 form and not relied upon is considered pertinent to applicant's disclosure. Any inquiry concerning this communication or earlier communications from the examiner should be directed to JAEHWAN OH whose telephone number is (571) 270-5800. The examiner can normally be reached on Monday - Friday 9:00 AM-5:00PM. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Brent Fairbanks can be reached on 408-918-7532. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://pair-direct.uspto.gov. Should you have questions on access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative or access to the automated information system, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /JAEHWAN OH/ Primary Examiner, Art Unit 2899
Read full office action

Prosecution Timeline

Dec 22, 2022
Application Filed
Jun 28, 2023
Response after Non-Final Action
Feb 07, 2026
Non-Final Rejection — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12604679
Deposition Equipment with Adjustable Temperature Source
2y 5m to grant Granted Apr 14, 2026
Patent 12581654
MEMORY DEVICE
2y 5m to grant Granted Mar 17, 2026
Patent 12564023
FREE-STANDING SUBSTRATE FOR EPITAXIAL CRYSTAL GROWTH, AND FUNCTIONAL ELEMENT
2y 5m to grant Granted Feb 24, 2026
Patent 12557498
Light Emitting Panel and Preparation Method thereof, and Light Emitting Apparatus
2y 5m to grant Granted Feb 17, 2026
Patent 12557514
DISPLAY SUBSTRATE, DISPLAY APPARATUS AND MASK PLATE
2y 5m to grant Granted Feb 17, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

AI Strategy Recommendation

Get an AI-powered prosecution strategy using examiner precedents, rejection analysis, and claim mapping.
Powered by AI — typically takes 5-10 seconds

Prosecution Projections

1-2
Expected OA Rounds
85%
Grant Probability
95%
With Interview (+10.4%)
2y 4m
Median Time to Grant
Low
PTA Risk
Based on 656 resolved cases by this examiner. Grant probability derived from career allow rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month