Prosecution Insights
Last updated: April 19, 2026
Application No. 18/091,055

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF, MEMORY AND MEMORY SYSTEM

Final Rejection §102§103
Filed
Dec 29, 2022
Examiner
DAS, PINAKI
Art Unit
2898
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Yangtze Memory Technologies Co. Ltd.
OA Round
2 (Final)
89%
Grant Probability
Favorable
3-4
OA Rounds
3y 6m
To Grant
87%
With Interview

Examiner Intelligence

Grants 89% — above average
89%
Career Allow Rate
24 granted / 27 resolved
+20.9% vs TC avg
Minimal -2% lift
Without
With
+-2.0%
Interview Lift
resolved cases with interview
Typical timeline
3y 6m
Avg Prosecution
48 currently pending
Career history
75
Total Applications
across all art units

Statute-Specific Performance

§103
44.9%
+4.9% vs TC avg
§102
26.4%
-13.6% vs TC avg
§112
27.4%
-12.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 27 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Status of Claims Claims 1-17 are pending in this application. Claims 4-16 were previously withdrawn as set forth in the office action mailed 10/7/2025. Drawings Prior objection to drawings is withdrawn in view of replacement drawings. Specification The disclosure is objected to because of the following informalities: In the amended specification filed on 1/7/2026, it appears that the applicant has erroneously indicated the wrong paragraphs to be amended. The examiner believes that the paragraphs to be amended are [0113] and [0114], and not [0134] and [0135], as the applicant has indicated. Appropriate correction is required. Claim Rejections - 35 USC § 102 The text of those sections of Title 35, U.S. Code not included in this action can be found in a prior Office action. Claims 1-3 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Rabkin et al. (US 2020/0203362 A1, newly cited). Re Claim 1, Rabkin teaches a semiconductor device (Figs. 13A and 13B), comprising: a stack structure (32+46, Fig. 13A, para [0127]) including alternately stacked dielectric layers (32, para [0042]) and conductive layers (46, para [0127]), the conductive layers including a top select gate layer (top gate electrode in the stack may function as the select gate electrode, para [0047]); and channel holes (58, Fig. 13A, para [0097]) penetrating through the stack structure (32+46), wherein the top select gate layer (top 46 layer, Fig. 13A) is provided with a first top select gate isolation structure (72, Figs. 13A and 13B, para [0055]) and a second top select gate isolation structure (marked “2nd isolation structure” in annotated Fig. 13B below), the channel holes (58) being located (see Figs. 13A and 13B) between the first top select gate isolation structure (72) and the second top select gate isolation structure (“2nd isolation structure”), and the second top select gate isolation structure (“2nd isolation structure”) includes an insulation portion (74, Fig. 13B, para [0120]), the insulation portion being divided into a plurality of second top select gate isolation substructures (marked “74-1” and “74-2”, in annotated Fig. 13B below), with spaces between adjacent ones of the plurality of second top select gate isolation substructures filled with a conductive substance to form a plurality of inter-substructure conductive portions (76A+76B, Fig. 13B, para [0123]). PNG media_image1.png 435 653 media_image1.png Greyscale Re Claim 2, Rabkin teaches the semiconductor device of claim 1, wherein the insulation portion (74) of the second top select gate isolation structure (“2nd isolation structure”) is divided in a first direction (vertical-axis in Fig. 13B) into a plurality of strip-shaped second top select gate isolation substructures (“74-1” and “74-2”, see annotated Fig. 13B above) extending in a second direction (horizontal-axis in Fig. 13B) perpendicular to the first direction (vertical-axis in Fig. 13B). Re Claim 3, Rabkin teaches the semiconductor device of claim 2, wherein the plurality of second top select gate isolation substructures (“74-1” and “74-2”, see annotated Fig. 13B above) are distributed side by side in the first direction (vertical-axis in Fig. 13B), and the plurality of second top select gate isolation substructures have the same dimension in the first direction (width of “74-1” and “74-2” along the vertical-axis are same). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim 17 is rejected under 35 U.S.C. 103 as being unpatentable over Rabkin et al. (US 2020/0203362 A1, newly cited), and further in view of Lee et al. (US 2019/0363100 A1, of record). Re Claim 17, Rabkin teaches a memory system, comprising a memory, the memory including a semiconductor device (Figs. 13A and 13B), wherein the semiconductor device includes a stack structure (32+46, Fig. 13A, para [0127]) and channel holes (58, Fig. 13A, para [0097]), the stack structure (32+46) includes alternately stacked dielectric layers (32, para [0042]) and conductive layers (46, para [0127]), the conductive layers including a top select gate layer (top gate electrode in the stack may function as the select gate electrode, para [0047]), the channel holes (58, Fig. 13A, para [0097]) penetrating through the stack structure (32+46), the top select gate layer (top 46 layer, Fig. 13A) is provided with a first top select gate isolation structure (72, Figs. 13A and 13B, para [0055]) and a second top select gate isolation structure (marked “2nd isolation structure” in annotated Fig. 13B above), the channel holes (58) being located (see Figs. 13A and 13B) between the first top select gate isolation structure (72) and the second top select gate isolation structure (“2nd isolation structure”), and the second top select gate isolation structure (“2nd isolation structure”) includes an insulation portion (74, Fig. 13B, para [0120]), the insulation portion being divided into a plurality of second top select gate isolation substructures (marked “74-1” and “74-2”, in annotated Fig. 13B above), with spaces between adjacent ones of the plurality of second top select gate isolation substructures filled with a conductive substance to form a plurality of inter-substructure conductive portions (76A+76B, Fig. 13B, para [0123]). Rabkin is silent about a controller being coupled with the memory. However, related semiconductor art, Lee, discloses a controller device (1100, Fig. 4, para [0079]) which is configured to control reading, writing, erasing, and background operations of the memory device (para [0081]). It would have been prima facie obvious to one of ordinary skill in the art before the effective filing date of the claimed invention, absent unexpected results, to incorporate a controller into the memory device of Rabkin as disclosed by Lee, because the controller is configured to control reading, writing, erasing, and background operations of the memory device (para [0081], Lee). Response to Arguments Applicant’s arguments with respect to claims 1 and 17 have been considered but are moot because the new ground of rejection does not rely on any reference applied in the prior rejection of record for any teaching or matter specifically challenged in the argument. Conclusion Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to PINAKI DAS whose telephone number is (703)756-5641. The examiner can normally be reached M-F 8-5 EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, JULIO MALDONADO can be reached at (571)272-1864. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /P.D./Examiner, Art Unit 2898 /JULIO J MALDONADO/Supervisory Patent Examiner, Art Unit 2898
Read full office action

Prosecution Timeline

Dec 29, 2022
Application Filed
Sep 29, 2025
Examiner Interview (Telephonic)
Oct 01, 2025
Non-Final Rejection — §102, §103
Jan 07, 2026
Response Filed
Mar 12, 2026
Final Rejection — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
89%
Grant Probability
87%
With Interview (-2.0%)
3y 6m
Median Time to Grant
Moderate
PTA Risk
Based on 27 resolved cases by this examiner. Grant probability derived from career allow rate.

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