Prosecution Insights
Last updated: April 19, 2026
Application No. 18/091,209

TRANSFER-FREE 2D FET AND FEFET DEVICE FABRICATION BY 2D MATERIAL GROWTH IN SUPERLATTICE WITH NITRIDES

Non-Final OA §102
Filed
Dec 29, 2022
Examiner
HO, ANTHONY
Art Unit
2817
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Intel Corporation
OA Round
1 (Non-Final)
91%
Grant Probability
Favorable
1-2
OA Rounds
2y 5m
To Grant
93%
With Interview

Examiner Intelligence

Grants 91% — above average
91%
Career Allow Rate
1007 granted / 1110 resolved
+22.7% vs TC avg
Minimal +2% lift
Without
With
+2.3%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
38 currently pending
Career history
1148
Total Applications
across all art units

Statute-Specific Performance

§101
2.3%
-37.7% vs TC avg
§103
31.8%
-8.2% vs TC avg
§102
40.5%
+0.5% vs TC avg
§112
16.1%
-23.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1110 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of Invention I, claims 1-15, in the reply filed on February 3, 2026 is acknowledged. Accordingly, claims 16-20 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected invention, there being no allowable generic or linking claim. Election was made without traverse in the reply filed on February 3, 2026. Information Disclosure Statement The information disclosure statement (IDS) submitted on December 29, 2022 is in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statement is being considered by the examiner. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim(s) 1, 2, 5, 9, and 10 is/are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Lin et al (US Pub 2024/0107903). In re claim 1, Lin et al discloses a transistor structure, comprising: a source terminal (i.e. 145) and a drain terminal (i.e. 145); a nanoribbon between and coupled to the source terminal and the drain terminal, wherein the nanoribbon comprises a channel layer (i.e. 120b), a first crystalline layer (i.e. 120a), and a second crystalline layer (i.e. 131/130) (i.e. see at least paragraph 0021 disclosing the use of crystalline material for at least layers 120, 130), wherein the channel layer is between the first crystalline layer and the second crystalline layer (i.e. see at least Figure 8), the channel layer comprising a metal and a chalcogen (i.e. see at least paragraph 0043); a gate electrode material (i.e. 154) adjacent the nanoribbon; and a gate insulator layer (i.e. 152) between the nanoribbon and the gate electrode material (i.e. see at least Figure 8). In re claim 2, Lin et al discloses wherein the channel layer comprises a crystalline material (i.e. see at least paragraph 0021). In re claim 5, Lin et al discloses wherein the first and second crystalline layers have substantially the same composition and crystalline structure (i.e. see at least paragraphs 0021, 0043). In re claim 9, Lin et al discloses wherein the metal is at least tungsten or molybdenum and the chalcogen is at least sulfur (i.e. see at least paragraphs 0024, 0026, 0028). In re claim 10, Lin et al discloses an integrated circuit (IC) device (i.e. see at least Figure 8), comprising: an IC die comprising a transistor (i.e. paragraph 0002 discloses integrated circuit (IC) technology and thus, it would have been implicit/inherent from Lin et al that an IC die would be used in their invention), the transistor comprising: a source terminal (i.e. 145) and a drain terminal (i.e. 145); a plurality of nanoribbons between and coupled to the source terminal and the drain terminal, wherein individual ones of the nanoribbons comprise a channel layer (i.e. 120b) between a first crystalline layer (i.e. 120a) and a second crystalline layer (i.e. 131/130) (i.e. see at least paragraph 0021 disclosing the use of crystalline material for at least layers 120, 130), the channel layer comprising a metal and a chalcogen (i.e. see at least paragraph 0043); a gate electrode (i.e. 154) material between and coupled to individual ones of the nanoribbons (i.e. at least electrically coupled); and a gate insulator layer (i.e. 152) between individual ones of the nanoribbons and the gate electrode material; and a power supply coupled to the IC die (i.e. it would have been inherent/implicit from Lin et al that there would be a power supply as it is well known in the art that a power supply is needed in order for the device to function). Allowable Subject Matter Claims 3, 4, 6-8, and 11-15 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to ANTHONY HO whose telephone number is (571)270-1432. The examiner can normally be reached 9AM - 5PM, Monday-Friday. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Marlon Fletcher can be reached at 571-272-2063. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /ANTHONY HO/Primary Examiner, Art Unit 2817
Read full office action

Prosecution Timeline

Dec 29, 2022
Application Filed
Jul 14, 2023
Response after Non-Final Action
Mar 06, 2026
Non-Final Rejection — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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Patent 12568758
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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
91%
Grant Probability
93%
With Interview (+2.3%)
2y 5m
Median Time to Grant
Low
PTA Risk
Based on 1110 resolved cases by this examiner. Grant probability derived from career allow rate.

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