Prosecution Insights
Last updated: July 17, 2026
Application No. 18/091,264

STACKED MULTICHIP IC DEVICE PACKAGES INCLUDING A GLASS SUBSTRATE

Non-Final OA §102
Filed
Dec 29, 2022
Examiner
LIU, BENJAMIN T
Art Unit
2893
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Intel Corporation
OA Round
1 (Non-Final)
75%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
87%
With Interview

Examiner Intelligence

Grants 75% — above average
75%
Career Allowance Rate
533 granted / 710 resolved
+7.1% vs TC avg
Moderate +12% lift
Without
With
+11.9%
Interview Lift
resolved cases with interview
Typical timeline
2y 11m
Avg Prosecution
29 currently pending
Career history
744
Total Applications
across all art units

Statute-Specific Performance

§101
0.3%
-39.7% vs TC avg
§103
86.3%
+46.3% vs TC avg
§102
11.5%
-28.5% vs TC avg
§112
1.7%
-38.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 710 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of claims 1-16 in the reply filed on 5/13/2026 is acknowledged. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-16 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Jeng et al. (US 2021/0074600) (“Jeng”). With regard to claim 1, fig. 1F of Jeng discloses an apparatus comprising: a glass substrate 110 (“glass substrate”, par [0028]); a plurality of through vias 111 extending through a thickness of the glass substrate 110; a logic IC die 128 on a first side 11B of the glass substrate 110 and comprising first metallization features 113 facing the glass substrate 110, wherein first ones (113 under 128 not above 120) of the first metallization features 113 are coupled to first ones (111 under 128 and not above 120) of the through vias 111; and a memory (“memory”, par [0042]) IC die 120 in a stack with the logic (“logic circuitry”, par [0033]) IC die 128, the memory (“memory”, par [0042]) IC die 120 comprising second metallization features 122 facing, and coupled to, second ones (113 above 120) of the first metallization features 113. With regard to claim 2, fig. 1F of Jeng discloses that the thickness of the glass substrate 110 is between the logic (“logic circuitry”, par [0033]) IC die 128 and the memory (“memory”, par [0042]) IC die 120; and the second ones (113 above 120) of the first metallization features 113 are coupled to a first end (top of 111 above 120) of second ones (111 above 120) of the through vias 111. With regard to claim 3, fig. 1F of Jeng discloses that the first ones (113 under 128 and not above 120) of the first metallization features 113 are directly bonded (“direct metal-to-metal”, par [0034]) to the first ones of the through vias 111, and the second ones 123 of the first metallization features 130 are directly bonded (“direct metal-to-metal”, par [0043]) to the second ones (111 above 120) of the through vias 111. With regard to claim 4, fig. 1F of Jeng discloses that the second metallization features 123 are directly bonded to a second end (bottom of 111 above 120) of the second ones (111 above 120) of the through vias 111. With regard to claim 5, fig. 1F of Jeng discloses that the second metallization features 123 are coupled through solder (“solder”, par [0043]) features 123B to a second end (bottom of 111 above 120) of the second ones (111 above 120) of the through vias 111. With regard to claim 6, fig. 1F of Jeng discloses that the solder features (“solder”, par [0043]) are first solder features 123; and the IC device logic (“logic circuitry”, par [0033]) IC die 128 further comprises second solder features 116 laterally adjacent to the memory (“memory”, par [0042]) IC die 120 and coupled to a second end (bottom of 111 under 128 not above 120) of the first ones (111 under 128 not above 120) of the through vias 111, the second solder features 116 having a lower reflow temperature (“elevated temperature”, par [0075]) than the first solder features 123B. With regard to claim 7, fig. 1F of Jeng discloses solder features 113 (“solder bonding”, par [0043]) couple the first (130 under 128 not over 120) and second ones (130 over 120) of the first metallization features 113 to the first (111 under 18 not over 120) and second ones (111 over 120) of the through vias 111, the second solder features 116 having a lower reflow temperature (“elevated temperature”, par [0075]) than the first solder features 113. With regard to claim 8, fig. 1F of Jeng discloses that the solder features are first solder (“solder bonding”, par [0043]) features 123; and the second metallization features 123 are coupled through second solder (“solder bonding”, par [0043]) features 123 to the second end (bottom of 111 above 120) of the second ones (111 above 120) of the through vias 111. With regard to claim 9, fig. 1F of Jeng disclose logic IC die further comprises package-level solder interconnect 116 features laterally adjacent to the memory IC die 120 and coupled to the second end (bottom of 111 under 128 not above 120) of the first ones (111 under 128 not above 120) of the through vias 111, the package-level solder interconnect features 116 having a lower reflow temperature (“elevated temperature”, par [0075]) than the first solder features 113. With regard to claim 10, fig. 1F of Jeng discloses logic IC die further comprises package-level solder interconnect 116 features laterally adjacent to the memory IC die 120 and coupled to a second end (bottom of 111 under 128 not above 120) of the first ones (111 under 128 not above 120) of the through vias 111. With regard to claim 11, fig. 2 of Jeng discloses logic IC die (“logic circuitry”, par [0033]) further comprises: a package dielectric material 104 laterally adjacent to the memory (“memory”, par [0042]) IC die 120; and a routing structure 106 within the package dielectric material 104, the routing structure 104 comprising via metallization features in direct contact (“same or similar to those of the conductive structures 113”, par [0046]; (“direct metal-to-metal (such as a copper-to-copper) bonding”, par [0043]) with a second end (bottom of 111) of the first ones (111 under 128 not above 120) of the through vias 111, the routing structure 106 terminating at first-level interconnect interfaces (top of 106). With regard to claim 12, fig. 1F of Jeng discloses at least one of the logic IC die or memory IC die 120 is embedded within the glass substrate 110 and at least a portion of a sidewall of the logic IC die or memory IC die 120 is laterally adjacent to the through vias 111 with a portion of the glass substrate 110 therebetween. With regard to claim 13, fig. 1F of Jeng discloses that the first ones (113 under 128 not above 120) of the first metallization features 113 are directly bonded to the first ones (111 under 128 not above 120) of the through vias 111, and the second ones (113 above 120) of the first metallization features 113 are directly bonded (“direct metal-to-metal (such as a copper-to-copper) bonding”, par [0043]) to the second metallization features 123. With regard to claim 14, fig. 2 of Jeng discloses a system comprising: a multi-chip integrated circuit (IC) device comprising: a glass substrate 110 (“glass substrate”, par [0028]); a plurality of through vias 111 extending through a thickness of the glass substrate 110; a logic (“logic circuitry”, par [0033]) IC die 128 on a first side of the glass substrate 110 and comprising first metallization features 113 facing the glass substrate 110, wherein first ones of the first metallization features 113 are coupled to first ones of the through vias 111; and a memory (“memory”, par [0042]) IC die 120 in a stack with the logic IC die 128, the memory IC die 120 comprising second metallization features 123 facing, and coupled to, second ones (113 above 120) of the first metallization features 113 through second ones (111 above 120) of the through vias 111; a package dielectric material 104 adjacent to a sidewall of the memory IC die 120; a routing structure 106 embedded within the package dielectric material 104, the routing structure 106 comprising metallization features in contact with the first ones of the through vias 111 and terminating at first-level interconnect interfaces (top of 106); and a host component (“external device”, par [0051]) interconnected to the routing structure 106 through first-level interconnects 136 coupled to the first-level interconnect interfaces (top of 106). With regard to claim 15, fig. 2 of Jeng discloses that the first-level interconnect features 136 comprise solder (“solder element to form the conductive bumps 136”, par [0052]). With regard to claim 16, fig. 2 of Jeng discloses a power supply coupled through the host component (“external device”, par [0051]) to provide power to at least the logic IC die 128 through the first ones of the through vias 111. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to BENJAMIN T LIU whose telephone number is (571)272-6009. The examiner can normally be reached Monday-Friday 11:00am-7:30pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Yara J Green can be reached at 571 270-3035. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /BENJAMIN TZU-HUNG LIU/ Primary Examiner, Art Unit 2893
Read full office action

Prosecution Timeline

Dec 29, 2022
Application Filed
Jul 14, 2023
Response after Non-Final Action
Jun 04, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
75%
Grant Probability
87%
With Interview (+11.9%)
2y 11m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 710 resolved cases by this examiner. Grant probability derived from career allowance rate.

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