Prosecution Insights
Last updated: July 17, 2026
Application No. 18/097,232

ANTENNA MEMBER AND APPARATUS AND METHOD FOR TREATING SUBSTRATE

Final Rejection §103
Filed
Jan 14, 2023
Priority
Jun 16, 2022 — RE 10-2022-0073223
Examiner
KENDALL, BENJAMIN R
Art Unit
2896
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Semes Co., Ltd.
OA Round
3 (Final)
32%
Grant Probability
At Risk
4-5
OA Rounds
5m
Est. Remaining
56%
With Interview

Examiner Intelligence

Grants only 32% of cases
32%
Career Allowance Rate
155 granted / 477 resolved
-35.5% vs TC avg
Strong +23% interview lift
Without
With
+23.3%
Interview Lift
resolved cases with interview
Typical timeline
3y 11m
Avg Prosecution
36 currently pending
Career history
520
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
94.8%
+54.8% vs TC avg
§102
4.4%
-35.6% vs TC avg
§112
0.5%
-39.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 477 resolved cases

Office Action

§103
DETAILED ACTION The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. Status of Claims 3. This action is in response to Applicant’s RCE dated 04/10/2026. 4. Claims 1-3, 5, 7-12, 14, 16-19, and 21 are currently pending. 5. Claims 1, 11, and 21 have been amended. 6. Claims 4, 6, 13, 15, and 20 have been cancelled. 7. Claim 21 has been added. Continued Examination Under 37 CFR 1.114 8. A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after final rejection. Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, the finality of the previous Office action has been withdrawn pursuant to 37 CFR 1.114. Applicant's submission filed on 04/10/2026 has been entered. Claim Rejections - 35 USC § 103 9. This application currently names joint inventors. In considering patentability of the claims the examiner presumes that the subject matter of the various claims was commonly owned as of the effective filing date of the claimed invention(s) absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and effective filing dates of each claim that was not commonly owned as of the effective filing date of the later invention in order for the examiner to consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2) prior art against the later invention. 10. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. 11. Claim(s) 1-3, 5, 7, 9-12, 14, 16, 18-19, and 21 is/are rejected under 35 U.S.C. 103 as being unpatentable over Lee et al (US 2004/0223579) in view of Choi (US 2019/0385814). Regarding claim 1: Lee teaches an antenna member (antenna structure) [fig 3 & 0033] comprising: a first coil (10) and a second coil (20) that are rotationally symmetrical with each other (see fig 3), wherein the first coil (10) includes a first supply terminal (P of 10) to which current is applied, a first ground terminal (G of 10) connected to a ground [fig 3 & 0034], the second coil (20) includes a second supply terminal (P of 20) to which current is applied, a second ground terminal (G of 20) connected to the ground [fig 3 & 0034], the first coil (10) includes an arc-shaped first portion (upper portion of 10) and an arc-shaped second portion (10a), and the first portion (upper portion of 10) and the second portion (10a) form a one-turn winding as a whole (see fig 3), the second coil (20) includes an arc-shaped first portion (upper portion of 20) and an arc-shaped second portion (20a), and the first portion (upper portion of 20) and the second portion (20a) form a one-turn winding as a whole (see fig 3), the second portion of each of the first coil and the second coil (10a/20a, respectively) has a height lower than a height of the first portion of each of the first coil and the second coil (upper portion of 10/20, respectively), the second portion of the second coil (20a) is disposed below the first portion of the first coil (upper portion of 10), the second portion of the first coil (10a) is disposed below the first portion of the second coil (upper portion of 20) [fig 3 & 0036], the first supply terminal (P of 10) is provided in the first portion of the first coil (upper portion of 10) and the second supply terminal (P of 20) is provided in the first portion of the second coil (upper portion of 20) [fig 3 & 0034]. Lee does not specifically teach the first coil includes a first shunt capacitor shunted between the first supply terminal and the first ground terminal, and the second coil includes a second shunt capacitor shunted between the second supply terminal and the second ground terminal, and the first shunt capacitor is provided in the second portion of the first coil and the second shunt capacitor is provided in the second portion of the second coil. Choi teaches a coil includes a shunt capacitor (variable capacitor, C) shunted between the supply terminal and the ground terminal (see fig 8) [fig 8 & 0047], and the shunt capacitor (C) is provided in the second portion of the coil (see location depicted in fig 8 - variable capacitor, C, is disposed in a winding between the supply terminal and ground terminal) [Choi - fig 8 & 0047]. It would have been obvious to one skilled in the art before the effective filing date to modify each of the first coil and second coil of Lee to include a shunt capacitor shunted between the supply terminal and the ground terminal in the second portion of the coil, as in Choi, to improve the uniformity of the plasma density on the surface of a substrate by connecting the variable capacitor to the portion of the antenna coil in parallel to adjust its value [Choi – fig 9 & 0050]. Regarding claim 2: Lee teaches the rotational symmetry is a 180° symmetry (see fig 3) [fig 3 & 0036]. Regarding claim 3: Lee teaches for each of the first coil (10) and the second coil (20), a center angle between the first portion (upper portion of 10/20) and the second portion (10a/20a) is 180° (see fig 3) [fig 3 & 0036]. Regarding claim 5: Lee teaches in each of the first coil (10) and the second coil (20), when a portion in which the second portion extends from the first portion is referred to as 0° (D-D’), the first supply terminal (P of 10) and the second supply terminal (P of 20) are provided in the first portion in a position of 90° (C-C’) with respect to 0° (D-D’) [fig 3 & 0036]. Regarding claim 7: Modified Lee teaches in each of the first coil and the second coil, when a portion in which the second portion extends from the first portion is referred to as 0°, the first shunt capacitor and the second shunt capacitor are provided in the second portion in a position of 90° with respect to 0° (see location depicted in Choi - variable capacitor, C, is disposed in a winding between the supply terminal and ground terminal) [Choi - fig 8 & 0047]. Regarding claim 9: Lee teaches the first supply terminal (P of 10) and the first ground terminal (G of 10) are provided to be adjacent to each other (see fig 3), and the second supply terminal (P of 20) and the second ground terminal (G of 20) are provided in positions adjacent to each other (see fig 3) [fig 3 & 0034]. Regarding claim 10: Modified Lee teaches the first shunt capacitor and the second shunt capacitor (C) are variable capacitors (variable capacitor) [Choi - fig 8 & 0047]. Regarding claim 11: Lee teaches a substrate treatment apparatus (inductively coupled plasma generator) [fig 4 & 0033] comprising: a chamber (chamber, C) providing a treatment space [fig 4 & 0034]; a chuck member (see fig 4) provided in the treatment space to support a substrate [fig 4 & 0034]; a window (top wall of chamber, C) disposed above the chuck member [fig 4 & 0034]; and an antenna member (antenna structure) disposed above the window (top wall of chamber, C) [fig 3-4 & 0034], wherein the antenna member (antenna structure) includes: a first coil (10) and a second coil (20) that are rotationally symmetrical with each other (see fig 3), wherein the first coil (10) includes a first supply terminal (P of 10) to which current is applied, a first ground terminal (G of 10) connected to a ground [fig 3 & 0034], the second coil (20) includes a second supply terminal (P of 20) to which current is applied, a second ground terminal (G of 20) connected to the ground [fig 3 & 0034], the first coil (10) includes an arc-shaped first portion (upper portion of 10) and an arc-shaped second portion (10a), and the first portion (upper portion of 10) and the second portion (10a) form a one-turn winding as a whole (see fig 3), the second coil (20) includes an arc-shaped first portion (upper portion of 20) and an arc-shaped second portion (20a), and the first portion (upper portion of 20) and the second portion (20a) form a one-turn winding as a whole (see fig 3), the second portion of each of the first coil and the second coil (10a/20a, respectively) has a height lower than a height of the first portion of each of the first coil and the second coil (upper portion of 10/20, respectively), the second portion of the second coil (20a) is disposed below the first portion of the first coil (upper portion of 10), the second portion of the first coil (10a) is disposed below the first portion of the second coil (upper portion of 20) [fig 3 & 0036], the first supply terminal (P of 10) is provided in the first portion of the first coil (upper portion of 10) and the second supply terminal (P of 20) is provided in the first portion of the second coil (upper portion of 20) [fig 3 & 0034]. Lee does not specifically teach the first coil includes a first shunt capacitor shunted between the first supply terminal and the first ground terminal, and the second coil includes a second shunt capacitor shunted between the second supply terminal and the second ground terminal, and the first shunt capacitor is provided in the second portion of the first coil and the second shunt capacitor is provided in the second portion of the second coil. Choi teaches a coil includes a shunt capacitor (variable capacitor, C) shunted between the supply terminal and the ground terminal (see fig 8) [fig 8 & 0047], and the shunt capacitor (C) is provided in the second portion of the coil (see location depicted in fig 8 - variable capacitor, C, is disposed in a winding between the supply terminal and ground terminal) [Choi - fig 8 & 0047]. It would have been obvious to one skilled in the art before the effective filing date to modify each of the first coil and second coil of Lee to include a shunt capacitor shunted between the supply terminal and the ground terminal in the second portion of the coil, as in Choi, to improve the uniformity of the plasma density on the surface of a substrate by connecting the variable capacitor to the portion of the antenna coil in parallel to adjust its value [Choi – fig 9 & 0050]. Regarding claim 12: Lee teaches the rotational symmetry is a 180° symmetry (see fig 3) [fig 3 & 0036]. Regarding claim 14: Lee teaches in each of the first coil (10) and the second coil (20), when a portion in which the second portion extends from the first portion is referred to as 0° (D-D’), the first supply terminal (P of 10) and the second supply terminal (P of 20) are provided in the first portion in a position of 90° (C-C’) with respect to 0° (D-D’) [fig 3 & 0036]. Regarding claim 16: Modified Lee teaches in each of the first coil and the second coil, when a portion in which the second portion extends from the first portion is referred to as 0°, the first shunt capacitor and the second shunt capacitor are provided in the second portion in a position of 90° with respect to 0° (see location depicted in Choi - variable capacitor, C, is disposed in a winding between the supply terminal and ground terminal) [Choi - fig 8 & 0047]. Regarding claim 18: Modified Lee teaches the first shunt capacitor and the second shunt capacitor (C) are variable capacitors (variable capacitor) [Choi - fig 8 & 0047]. Regarding claim 19: The claim limitations “wherein the current flowing through the antenna member is adjusted before and after each of the first shunt capacitor and the second shunt capacitor, according to a change in capacitance of the first shunt capacitor or the second shunt capacitor” are merely intended use and are given weight to the extent that the prior art is capable of performing the intended use. A claim containing a “recitation with respect to the manner in which a claimed apparatus is intended to be employed does not differentiate the claimed apparatus from a prior art apparatus” if the prior art apparatus teaches all the structural limitations of the claim. Ex parte Masham, 2 USPQ2d 1647 (Bd. Pat. App. & Inter. 1987). Regarding claim 21: Modified Lee teaches a first side of the first shunt capacitor is in electrical connection with the first supply terminal while a second side of the first shunt capacitor is in electrical connection with the first ground terminal (10 of Lee was modified to include variable capacitor C of Choi) [Lee – fig 3 & Choi – fig 8 & 0047], and a first side of the second shunt capacitor is in electrical connection with the second supply terminal while a second side of the second shunt capacitor is in electrical connection with the second ground terminal (20 of Lee was modified to include variable capacitor C of Choi) [Lee – fig 3 & Choi – fig 8 & 0047]. 12. Claim(s) 8 and 17 is/are rejected under 35 U.S.C. 103 as being unpatentable over Lee et al (US 2004/0223579) in view of Choi (US 2019/0385814) as applied to claims 1-3, 5, 7, 9-12, 14, 16, 18-19, and 21 above, and further in view of Yamazawa (US 2012/0073757). The limitations of claims 1-3, 5, 7, 9-12, 14, 16, 18-19, and 21 have been set forth above. Regarding claims 8 and 17: Modified Lee does not specifically teach a variable capacitor is connected to each of the first ground terminal and the second ground terminal. Yamazawa teaches a variable capacitor (variable capacitor, 90) is connected to each of the first ground terminal (64(1)) and the second ground terminal (64(2)) [fig 17A-17B & 0139]. It would have been obvious to one skilled in the art before the effective filing date to modify each of the first ground terminal and second ground terminal of modified Lee to be connected to a variable capacitor, as in Yamazawa, to suppress sputtering on a dielectric window [Yamazawa – 0140]. Response to Arguments 13. Applicant’s arguments, see Remarks, filed 04/10/2026, with respect to the rejection of claim(s) 21 under 35 USC 112(a) and 35 USC 112(b) have been fully considered and are persuasive. The rejection of claim(s) 21 under 35 USC 112(a) and 35 USC 112(b) has been withdrawn in view of the amendments to claim 21. 14. Applicant's arguments, see Remarks, filed 04/10/2026, with respect to the rejection of claim(s) 1-19 and 21 under 35 USC 103 have been fully considered but they are not persuasive. Applicant argues that the variable capacitor C of Choi is connected to an intermediate portion of the four-turn wound coil. Therefore, if Lee were to be modified using the teachings of Choi, the modification would not result in the shunt capacitor (C) being provided in the second portion of each coil. In response, examiner disagrees with applicant’s conclusion. As applicant aptly notes, the variable capacitor C of Choi is connected to an intermediate portion of the coil [Choi - fig 7b & 8]. In other words, the variable capacitor C of Choi is connected midway between the supply terminal and ground terminal [Choi - fig 7b & 8]. Examiner notes that midway between the supply terminal and ground terminal on each coil (10 and 20) of Lee is the second portion (10a and 20a, respectively) of each coil [Lee – fig 3]. Therefore, the proposed modification results in the claimed structure. Conclusion 15. The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. KimHongSeub (KR 10-2007-0033222), Nakagami et al (US 2010/0066251), Jang (US 2012/0090785), and Jo et al (US 2020/0243301) teach a first coil and a second coil that are rotationally symmetrical with each other [fig 6, 2, 3, and 4a, respectively]. 16. All claims are identical to or patentably indistinct from, or have unity of invention with claims in the application prior to the entry of the submission under 37 CFR 1.114 (that is, restriction (including a lack of unity of invention) would not be proper) and all claims could have been finally rejected on the grounds and art of record in the next Office action if they had been entered in the application prior to entry under 37 CFR 1.114. Accordingly, THIS ACTION IS MADE FINAL even though it is a first action after the filing of a request for continued examination and the submission under 37 CFR 1.114. See MPEP § 706.07(b). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. 17. Any inquiry concerning this communication or earlier communications from the examiner should be directed to BENJAMIN R KENDALL whose telephone number is (571)272-5081. The examiner can normally be reached Mon - Thurs 9-5 EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, William F Kraig can be reached at (571)272-8660. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /Benjamin Kendall/Primary Examiner, Art Unit 2896
Read full office action

Prosecution Timeline

Jan 14, 2023
Application Filed
Sep 23, 2025
Non-Final Rejection mailed — §103
Dec 16, 2025
Response Filed
Jan 13, 2026
Final Rejection mailed — §103
Apr 10, 2026
Request for Continued Examination
Apr 10, 2026
Response after Non-Final Action
Apr 15, 2026
Final Rejection mailed — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12680168
MULTIPLE-CHAMBER REACTOR FOR SELECTIVE DEPOSITION OF SILICON NITRIDE AND METHOD OF USING SAME
1y 11m to grant Granted Jul 14, 2026
Patent 12660557
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
2y 9m to grant Granted Jun 16, 2026
Patent 12652973
DELAYED PULSING FOR PLASMA PROCESSING OF WAFERS
2y 8m to grant Granted Jun 09, 2026
Patent 12646694
CONTINUOUS PLASMA PROCESSING SYSTEM WITH ADJUSTABLE ELECTRODE
2y 7m to grant Granted Jun 02, 2026
Patent 12648396
WAFER PLACEMENT TABLE
2y 8m to grant Granted Jun 02, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

4-5
Expected OA Rounds
32%
Grant Probability
56%
With Interview (+23.3%)
3y 11m (~5m remaining)
Median Time to Grant
High
PTA Risk
Based on 477 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month