Prosecution Insights
Last updated: October 04, 2026
Application No. 18/140,692

Optoelectronic Semiconductor Structure

Non-Final OA §103
Filed
Apr 28, 2023
Priority
Apr 29, 2022 — provisional 63/363,879
Examiner
SEVEN, EVREN
Art Unit
2812
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Sensortek Technology Corp.
OA Round
3 (Non-Final)
74%
Grant Probability
Favorable
3-4
OA Rounds
0m
Est. Remaining
83%
With Interview

Examiner Intelligence

Grants 74% — above average
74%
Career Allowance Rate
559 granted / 750 resolved
+6.5% vs TC avg
Moderate +9% lift
Without
With
+8.6%
Interview Lift
resolved cases with interview
Typical timeline
2y 3m
Avg Prosecution
33 currently pending
Career history
776
Total Applications
across all art units

Statute-Specific Performance

§101
2.7%
-37.3% vs TC avg
§103
53.7%
+13.7% vs TC avg
§102
20.8%
-19.2% vs TC avg
§112
20.8%
-19.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 750 resolved cases

Office Action

§103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 103 The text of those sections of Title 35, U.S. Code not included in this action can be found in a prior Office action. Claims 1- are rejected under 35 U.S.C. 103 as unpatentable over U.S. Pat. Pub. No. 20020185665 to Kuhara et al. (Kuhara) in view of U.S. Pat. Pub. No. 20010002120 to Bessendorf et al. (Bessendorf). Regarding Claim 1, Kuhara teaches an optoelectronic semiconductor structure, comprising: a first-type N semiconductor substrate 1/21/22, having a top surface (facing up on page); a second-type P semiconductor light-receiving region 12; and a second-type semiconductor conduction region 6, disposed on said top surface of said first-type semiconductor substrate, used for conducting a photocurrent, said second-type semiconductor light-receiving region surrounding said second-type semiconductor conduction region, and said second-type semiconductor conduction region and said second-type semiconductor light-receiving region spaced by a distance (see Figs. 7-8). Kuhara does not explicitly teach a bias gate layer, covering said top surface of said first-type semiconductor substrate, and located between said second-type semiconductor light-receiving region and said second-type semiconductor conduction region. However, in analogous art, Bettendorf teaches a bias gate 200 similarly situated. It would have been obvious to the person of ordinary skill in the art before the time of filing to include the teaching of Bettendorf to better control current, as taught by Bettendorf throughout. Regarding Claim 2, Kuhara and Bettendorf teach the optoelectronic semiconductor structure of claim 1, wherein said second-type semiconductor light-receiving region surrounds or partially surrounds said second-type semiconductor conduction region (see Figs. 7-8). Regarding Claim 3, Kuhara and Bettendorf teach the optoelectronic semiconductor structure of claim 1, wherein said first-type semiconductor substrate includes a spacer part; the inner side of said spacer part surrounds or partially surrounds said second-type semiconductor conduction region; and the outer side of said spacer part is adjacent to said second-type semiconductor light-receiving region (gap between 6 and 12 defines a spacer). Regarding Claim 9, Kuhara and Bettendorf teach the optoelectronic semiconductor structure of claim 1, wherein said second-type semiconductor light-receiving region is disposed on said top surface of said first-type semiconductor substrate (see Figs. 7-8). Regarding Claim 14, Kuhara and Bettendorf teach the optoelectronic semiconductor structure of claim 1, but does not explicitly teach that said second-type semiconductor conduction region is coupled to an analog-to-digital converter. Kuhara does teach in Fig. 12 coupling the output of the detector to an amplifier 28. It would further be obvious to digitize this output in order to more easily manipulate the output data. Regarding Claim 15, Kuhara and Bettendorf teach the optoelectronic semiconductor structure of claim 1, wherein said second-type semiconductor light-receiving region is a second-type semiconductor well, and said second-type semiconductor conduction region is a second-type semiconductor with high doping concentration (10^19, [0058]). Regarding Claim 16, Kuhara teaches the optoelectronic semiconductor structure of claim 1, but does not explicitly teach that the concentration of ions implanted into said second-type semiconductor conduction region is higher than the concentration of ions implanted into said second-type semiconductor light-receiving region. Kuhara is silent regarding dopant concentrations other than that it is “high.” The person of ordinary skill having the benefit of Kuhara is thus motivated to experiment with various dopant concentrations in the various regions to optimize and best practice the invention of Kuhara and my readily arrive at such an arrangement. Regarding Claim 18, Kuhara and Bettendorf teach the optoelectronic semiconductor structure of claim 1, wherein when said first-type semiconductor substrate is n-type, said photocurrent includes the holes flowing from said second-type semiconductor light-receiving region to said second-type semiconductor conduction region via said first-type semiconductor substrate (see Figs. 7-8). Regarding Claim 17, Kuhara teaches the optoelectronic semiconductor structure of claim 1, but does not explicitly teach that when said first-type semiconductor substrate is p-type, said photocurrent includes the photoelectrons flowing from said second-type semiconductor light-receiving region to said second-type semiconductor conduction region via said first-type semiconductor substrate. Kuhara teaches the inverse dopant scheme. Forming the required PN junctions taught by Kuhara throughout may be formed with either dopant scheme and are obvious variants. Allowable Subject Matter Claim 10 is allowed. The following is an examiner’s statement of reasons for allowance: the cited prior art does not teach a shelter layer in context with the remaining elements of Claim 10. Any comments considered necessary by applicant must be submitted no later than the payment of the issue fee and, to avoid processing delays, should preferably accompany the issue fee. Such submissions should be clearly labeled “Comments on Statement of Reasons for Allowance.” Claims 11 and 12 objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims for the same reason as Claim 10. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to EVREN SEVEN whose telephone number is (571)270-5666. The examiner can normally be reached Mon-Fri 8:00- 5:00 Pacific. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Christine Kim can be reached at (571) 272-8458. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /EVREN SEVEN/Primary Examiner, Art Unit 2812
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Prosecution Timeline

Apr 28, 2023
Application Filed
Jul 16, 2025
Non-Final Rejection mailed — §103
Jan 16, 2026
Response Filed
Jan 28, 2026
Final Rejection mailed — §103
Jun 29, 2026
Response after Non-Final Action
Jul 27, 2026
Request for Continued Examination
Jul 30, 2026
Response after Non-Final Action
Sep 09, 2026
Non-Final Rejection mailed — §103 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
74%
Grant Probability
83%
With Interview (+8.6%)
2y 3m (~0m remaining)
Median Time to Grant
High
PTA Risk
Based on 750 resolved cases by this examiner. Grant probability derived from career allowance rate.

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