Prosecution Insights
Last updated: October 26, 2026
Application No. 18/141,887

NITRIDE ETCH FOR CONSISTENT STEP HEIGHT FOR TSV REVEAL IN THE VIA MID FLOW

Final Rejection §103
Filed
May 01, 2023
Examiner
ERDEM, FAZLI
Art Unit
2812
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Intel Corporation
OA Round
2 (Final)
86%
Grant Probability
Favorable
3-4
OA Rounds
0m
Est. Remaining
99%
With Interview

Examiner Intelligence

Grants 86% — above average
86%
Career Allowance Rate
934 granted / 1092 resolved
+17.5% vs TC avg
Strong +16% interview lift
Without
With
+15.7%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
21 currently pending
Career history
1123
Total Applications
across all art units

Statute-Specific Performance

§101
0.5%
-39.5% vs TC avg
§103
50.5%
+10.5% vs TC avg
§102
37.7%
-2.3% vs TC avg
§112
7.4%
-32.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1092 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Response to Arguments Applicant’s arguments with respect to claim 1-20 have been considered but are moot because the new ground of rejection does not rely on any reference applied in the prior rejection of record for any teaching or matter specifically challenged in the argument. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1-6 and 8-20 are rejected under 35 U.S.C. 103 as being unpatentable over Chang et al. (20120056315) in view of Yang et al. (20100267217) Regarding Claim 1, in Figs. 1 and 7, Chang et al. discloses an interposer (see paragraph 0012), comprising: a substrate 10 with a first surface and a second surface opposite from the first surface; a via 20/20A/20b through the substrate, wherein a portion of the via extends past the second surface (see Fig. 3) a first layer 24/24A/24B/28 over the substrate, wherein the first layer is an electrically insulating material; and a second layer 24/24A/24B/28 over the first layer and over the portion of the via that extends past the second surface. Chang et al. fails to disclose the newly added limitation with respect to a liner surrounding the via, wherein a portion of the liner extends past the second surface. However, Yang et al. discloses a semiconductor device where in Fig. 10, elements 126/117 and 110, the required liner structure is disclosed. (Here TSV is 126, liner is 117 and “recessed” substrate is 110) It would have been obvious to one of having ordinary skill in the art before the effective filing date of the claimed invention to have the required liner structure in Chang et al. as taught by Yang et al. in order to protect the TSV and the layers around it. Regarding Claim 2, in Figs 3 of Chang et al, a step height of the portion of the via 20/20A/20B that extends past the second surface is approximately 0.1 micrometer or greater. Regarding Claim 3, in Chang et al., the second layer 24/24A/24B/28 comprises:a third layer 24/24A/24B/28 comprising titanium; and a fourth layer 24/24A/24B/28 comprising copper. Regarding Claim 4, in Chang et al, the third layer 24/24A/24B/28 comprises a barrier layer, and wherein the fourth layer comprises a seed layer. Regarding Claim 5, in Chang et al, the first layer 24/24A/24B/28 comprises silicon and nitrogen. Regarding Claim 6, in Chang et al, the substrate 10 comprises silicon. Regarding Claim 8, in Chang et al, an electrically conductive bump 30 over the second layer. Regarding Claim 9, in Chang et al, a width of the electrically conductive bump 30 is substantially equal to a width of the second layer. Regarding Claim 10, in Chang et al, the first layer is wider than the second layer. Regarding Claim 11, in Chang et al, the via is a through silicon via (TSV) that passes through an entire thickness of the substrate (see Fig.3). Regarding Claim 12, in Chang et al, it is disclosed a multi-die module, comprising :an interposer (paragraph 0012), comprising: a substrate 10 with a first surface and a second surface opposite from the first surface; a via 20/20a/20b through the substrate, wherein an end of the via extends up past the second surface of the substrate (Fig. 3); and a layer 24/24A/24B/28 comprising copper around the end of the via; a first die coupled to the interposer; and a second die coupled to the interposer (see paragraph 0012, interposer is inherently for a multi-die). Chang et al. fails to disclose the newly added limitation with respect to a liner surrounding the via, wherein a portion of the liner extends past the second surface. However, Yang et al. discloses a semiconductor device where in Fig. 10, elements 126/117 and 110, the required liner structure is disclosed. (Here TSV is 126, liner is 117 and “recessed” substrate is 110) It would have been obvious to one of having ordinary skill in the art before the effective filing date of the claimed invention to have the required liner structure in Chang et al. as taught by Yang et al. in order to protect the TSV and the layers around it. Regarding Claim 13, in paragraph 0012 of Chang et al, the first die is communicatively coupled to the second die through the interposer. Regarding Claim 14, in Fig. 7 of Chang et al, the first die is coupled to the interposer through a bump 30 or through a bumpless die-to-die interconnect. Regarding Claim 15, in Chang et al, the layer 24/24A/24B/28 comprising copper is over a layer comprising titanium. Regarding Claim 16, in Chang et al, the layer c24/24A/24B/28 comprising copper has a horizontal portion over a top of the via, and vertical portions along sidewalls of the via. Regarding Claim 17, in Chang et al, a layer 24/24A/24B/28 comprising silicon and nitrogen is provided over the second surface of the substrate. Regarding Claim 18, in Chang et al, an electronic system, comprising: a board; a package substrate coupled to the board; and a multi-die module coupled to the package substrate (see paragraph 0012), wherein the multi-die module comprises: an interposer (see paragraph 0012) with a via 20/20A/20B with an end that extends past a top surface of the interposer (Fig. 3); a laye r24/24A/24B/28 comprising copper over and around the end of the via; a first die coupled to the interposer through the bump; and a second die coupled to the interposer (see paragraph 0012). Chang et al. fails to disclose the newly added limitation with respect to a liner surrounding the via, wherein a portion of the liner extends past the second surface. However, Yang et al. discloses a semiconductor device where in Fig. 10, elements 126/117 and 110, the required liner structure is disclosed. (Here TSV is 126, liner is 117 and “recessed” substrate is 110) It would have been obvious to one of having ordinary skill in the art before the effective filing date of the claimed invention to have the required liner structure in Chang et al. as taught by Yang et al. in order to protect the TSV and the layers around it. Regarding Claim 19, in Chang et al, the via 20/20A/20B has a step height above the top surface of the interposer that is approximately 0.1pm or greater. Regarding Claim 20, in Chang et al, in paragraph 0012, the electronic system is part of a personal computer, a server, a mobile device, a tablet, or an automobile. Examiner is including Chiang et al, 20150348871 (Fig. 2, paragraph 0018) as pertinent prior art reference that is not applied on this rejection but that discloses a recessed substrate, a TSV and a liner protruding above the recessed substrate). Conclusion Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to FAZLI ERDEM whose telephone number is (571)272-1914. The examiner can normally be reached M-F, 8am-5pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Davienne Monbleau can be reached at 571-272-1945. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /FAZLI ERDEM/Primary Examiner, Art Unit 2812 9/28/2026
Read full office action

Prosecution Timeline

May 01, 2023
Application Filed
Nov 29, 2023
Response after Non-Final Action
May 20, 2026
Non-Final Rejection mailed — §103
Aug 19, 2026
Response Filed
Sep 30, 2026
Final Rejection mailed — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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SEMICONDUCTOR DEVICE AND AN ELECTRONIC SYSTEM INCLUDING THE SAME
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2y 9m to grant Granted Oct 20, 2026
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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
86%
Grant Probability
99%
With Interview (+15.7%)
2y 5m (~0m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 1092 resolved cases by this examiner. Grant probability derived from career allowance rate.

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