Prosecution Insights
Last updated: October 02, 2026
Application No. 18/144,329

LASER BEAM ANNEALING APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS BY USING THE SAME

Non-Final OA §102
Filed
May 08, 2023
Priority
Jul 18, 2022 — RE 10-2022-0088552
Examiner
TEKA, ABIY
Art Unit
3745
Tech Center
3700 — Mechanical Engineering & Manufacturing
Assignee
Samsung Display Co., Ltd.
OA Round
1 (Non-Final)
85%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
95%
With Interview

Examiner Intelligence

Grants 85% — above average
85%
Career Allowance Rate
590 granted / 695 resolved
+14.9% vs TC avg
Moderate +10% lift
Without
With
+10.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
27 currently pending
Career history
723
Total Applications
across all art units

Statute-Specific Performance

§101
1.1%
-38.9% vs TC avg
§103
35.0%
-5.0% vs TC avg
§102
35.4%
-4.6% vs TC avg
§112
27.1%
-12.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 695 resolved cases

Office Action

§102
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of Claims 1-10 in the reply filed on 06/29/2026 is acknowledged. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-3 and 10 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Lee et al. (US 2020/0328237 A1). Regarding Claim 1 LEE teaches a laser beam annealing apparatus comprising: a laser generator (100) (Fig 2) which generates a first incident laser (La) beam and a second incident laser beam (Lb) ; a beam mixer (Fig 2) arranged on optical paths of the first incident laser (La) beam and the second incident laser beam (Lb) and comprising an inversion module (200) (Fig 1-2) which vertically and horizontally inverts an image of a laser beam (par.0075); a homogenizer (par.0057) arranged on an optical path of a laser beam having passed through the beam mixer (Fig 2); and a condenser lens (Par.0057) arranged on an optical path of a laser beam having passed through the homogenizer (par.0057), wherein the laser beam having passed through the beam mixer (Fig 2) comprises a first mixed beam in which an image is not inverted and a second mixed beam in which an image is vertically and horizontally inverted (par.0076). Regarding Claim 2 LEE teaches wherein the beam mixer (Fig 2) further comprises a splitter (210) arranged at a front end of the inversion module (see Fig 3). Regarding Claim 3 LEE teaches wherein the inversion module (200) (Fig 1-2) comprises a plurality of mirrors220,230, 240), at least one of the plurality of mirrors vertically inverts an image of a laser beam, and at least one of the plurality of mirrors horizontally inverts an image of a laser beam (see Fig 3, par.0071). Regarding Claim 10 LEE teaches wherein the inversion module (200) (Fig 1-2) comprises a circulation module (230), an optical member (220), and a moving mirror (240), and the circulation module increases the optical path (Fig 3). Allowable subject matter Claims 4-9 are objected to but would be allowable if rewritten including all the limitations of the base claims and all the intervening claims. Conclusion Prior art made of record not relied up on is pertinent to applicant’s disclosure. Windpassinger (US 2006/0182155 A1); Muraki (US 5,153,773); Cho et al. (US 2021/0138581 A1) and Lee et al. (KR 2017/0085184 A) all teach laser beam apparatus that are pertinent to applicant’s claimed invention. Any inquiry concerning this communication or earlier communications from the examiner should be directed to ABIY TEKA whose telephone number is (571)272-9804. The examiner can normally be reached M-F 11-9 PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Nathaniel Wiehe can be reached at (571) 272-8648. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /ABIY TEKA/ Primary Examiner, Art Unit 3745
Read full office action

Prosecution Timeline

May 08, 2023
Application Filed
Sep 08, 2026
Non-Final Rejection mailed — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
85%
Grant Probability
95%
With Interview (+10.2%)
2y 5m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 695 resolved cases by this examiner. Grant probability derived from career allowance rate.

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