Prosecution Insights
Last updated: May 22, 2026
Application No. 18/147,515

METHOD AND APPARATUS FOR A SILICON DIE PREPARATION INCLUDING AUXETIC AND ELECTROSTATIC DISSIPATATIVE FEATURES

Non-Final OA
Filed
Dec 28, 2022
Examiner
MANGOHIG, THOMAS A
Art Unit
1788
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Intel Corporation
OA Round
1 (Non-Final)
20%
Grant Probability
At Risk
1-2
OA Rounds
7m
Est. Remaining
44%
With Interview

Examiner Intelligence

Grants only 20% of cases
20%
Career Allowance Rate
86 granted / 433 resolved
-45.1% vs TC avg
Strong +24% interview lift
Without
With
+24.3%
Interview Lift
resolved cases with interview
Typical timeline
4y 0m
Avg Prosecution
46 currently pending
Career history
479
Total Applications
across all art units

Statute-Specific Performance

§101
0.3%
-39.7% vs TC avg
§103
63.5%
+23.5% vs TC avg
§102
8.4%
-31.6% vs TC avg
§112
21.7%
-18.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 433 resolved cases

Prosecution Timeline

Dec 28, 2022
Application Filed
Feb 10, 2025
Response after Non-Final Action

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12617969
LAYERED PRODUCT
6y 0m to grant Granted May 05, 2026
Patent 12620326
Label Assembly and Method for Affixing a Label to a Surface Using the Same
5y 5m to grant Granted May 05, 2026
Patent 12552975
CARRIER FILM FOR SEMI-CONDUCTOR WAFER PROCESSING
4y 11m to grant Granted Feb 17, 2026
Patent 12545816
FUNCTIONAL LAYER WITH ADHESIVE LAYER, LAMINATE, AND USE THEREOF
4y 10m to grant Granted Feb 10, 2026
Patent 12479200
THERMOSETTABLE ADHESIVE TAPED ARTICLES
6y 10m to grant Granted Nov 25, 2025
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

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Prosecution Projections

1-2
Expected OA Rounds
20%
Grant Probability
44%
With Interview (+24.3%)
4y 0m (~7m remaining)
Median Time to Grant
Low
PTA Risk
Based on 433 resolved cases by this examiner. Grant probability derived from career allowance rate.

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