Prosecution Insights
Last updated: May 29, 2026
Application No. 18/157,006

ETCHANT COMPOSITION OF TITANIUM LAYER AND ETCHING METHOD USING THE SAME

Non-Final OA §102§103
Filed
Jan 19, 2023
Priority
Jan 21, 2022 — RE 10-2022-0009132 +1 more
Examiner
CULBERT, ROBERTS P
Art Unit
1716
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Enf Technology Co. Ltd.
OA Round
3 (Non-Final)
82%
Grant Probability
Favorable
3-4
OA Rounds
0m
Est. Remaining
78%
With Interview

Examiner Intelligence

Grants 82% — above average
82%
Career Allowance Rate
664 granted / 814 resolved
+16.6% vs TC avg
Minimal -3% lift
Without
With
+-3.4%
Interview Lift
resolved cases with interview
Typical timeline
2y 4m
Avg Prosecution
17 currently pending
Career history
835
Total Applications
across all art units

Statute-Specific Performance

§101
0.9%
-39.1% vs TC avg
§103
63.6%
+23.6% vs TC avg
§102
15.0%
-25.0% vs TC avg
§112
3.6%
-36.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 814 resolved cases

Office Action

§102 §103
DETAILED ACTION Continued Examination Under 37 CFR 1.114 A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after final rejection. Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, the finality of the previous Office action has been withdrawn pursuant to 37 CFR 1.114. Applicant's submission filed on 2/18/26 has been entered. Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1, 4, 5, 9-12, 18 and 19 are rejected under 35 U.S.C. 102(a)(1) as anticipated by or, in the alternative, under 35 U.S.C. 103 as obvious over US Publication 2016/0200975 to Cooper et al. Regarding Claim 1, Cooper et al. teaches an etchant composition comprising: an etidronic acid or a salt thereof (Paragraph 31), an inorganic base (Paragraph 27), hydrogen peroxide (Paragraph 28), and a remaining amount of water, wherein 0.01 to 5 wt% of the etidronic acid or the salt thereof; 0.1 to 2.8 wt% of the inorganic base; 15 to 25 wt% of the hydrogen peroxide; and a remaining amount of water are included (Tables), based on the total weight of the etchant composition, and the etchant composition further comprises a phosphate (Paragraph 29) selected from the group consisting of trisodium phosphate (Na₃PO₄), monopotassium phosphate (KH2PO4), dipotassium phosphate (K2HPO₄), monoammonium phosphate ((NH₄)H₂PO₄), diammonium phosphate ((NH₄)₂HPO₄), triammonium phosphate ((NH4)₃PO₄), and a combination of two or more thereof. The composition is disclosed with sufficient specificity for anticipation, further the composition would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention by selectin of the recited embodiments and disclosed ranges with predictable results. Regarding Claim 4, Cooper et al. teaches the inorganic base is a hydrate (aqueous). Regarding Claim 5, Cooper et al. teaches (Tables) etidronic acid or a salt thereof (0.1%) and the inorganic base (0.2%) 1:1 to 1:2.5. Regarding Claim 7, Cooper et al. teaches embodiments in which a quaternary ammonium salt is not included. Regarding Claim 9, Cooper et al. teaches (Tables) 0.01 to 1 wt% of the phosphate. Regarding Claims 10 and 19, Cooper et al. teaches (Paragraph 31) one or more chealating agents may be used. Regarding Claim 11, Cooper et al. teaches (Paragraph 39) pH 6-10. Further, the same pH would reasonably be expected to be achieved using the same components, or else is the result of essential limitations that are not claimed. Regarding Claim 12, Cooper et al. teaches etching a titanium-containing material layer. However, the claim reads on an intended use and does not materially limit the claimed composition. Regarding Claim 18, Cooper et al. teaches (Paragraph 27) inorganic base such as potassium hydroxide. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to Roberts P Culbert whose telephone number is (571)272-1433. The examiner can normally be reached Monday thru Thursday 7:30 AM-6 PM EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Parviz Hassanzadeh can be reached at 571-272-1435. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /ROBERTS P CULBERT/ Primary Examiner, Art Unit 1716
Read full office action

Prosecution Timeline

Jan 19, 2023
Application Filed
Jul 25, 2025
Examiner Interview (Telephonic)
Jul 30, 2025
Non-Final Rejection mailed — §102, §103
Oct 29, 2025
Response Filed
Nov 19, 2025
Final Rejection mailed — §102, §103
Feb 18, 2026
Request for Continued Examination
Feb 24, 2026
Response after Non-Final Action
Mar 05, 2026
Non-Final Rejection mailed — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12640348
PULSING REMOTE PLASMA FOR ION DAMAGE REDUCTION AND ETCH UNIFORMITY IMPROVEMENT
3y 5m to grant Granted May 26, 2026
Patent 12642027
LINE EDGE ROUGHNESS (LER) IMPROVEMENT OF RESIST PATTERNS
2y 7m to grant Granted May 26, 2026
Patent 12642028
METHODS FOR WET ATOMIC LAYER ETCHING OF TUNGSTEN
2y 1m to grant Granted May 26, 2026
Patent 12635434
HIGH ASPECT RATIO CONTACT ETCHING WITH ADDITIVE GAS
3y 1m to grant Granted May 19, 2026
Patent 12635436
PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM
2y 11m to grant Granted May 19, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
82%
Grant Probability
78%
With Interview (-3.4%)
2y 4m (~0m remaining)
Median Time to Grant
High
PTA Risk
Based on 814 resolved cases by this examiner. Grant probability derived from career allowance rate.

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