Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 1716 1724 1743 1792 2812
This examiner grants 82% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18889658 | POLISHING COMPOSITIONS AND METHODS OF USE THEREOF | Non-Final OA | Fujifilm Electronic Materials U.S.A., Inc. |
| 18640071 | FABRICATION OF REFLECTIVE POLYMER WAVEGUIDE MOLD | Non-Final OA | GOOGLE LLC |
| 18028808 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE | Non-Final OA | Mitsubishi Electric Corporation |
| 18896372 | ETCHING METHOD | Non-Final OA | Hitachi High-Tech Corporation |
| 18237628 | ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME | Non-Final OA | Applied Materials, Inc. |
| 18236042 | METHODS OF ETCHING SILICON-AND-OXYGEN-CONTAINING FEATURES AT LOW TEMPERATURES | Final Rejection | Applied Materials, Inc. |
| 18212314 | INCREASED ETCH RATES OF SILICON-CONTAINING MATERIALS | Non-Final OA | Applied Materials, Inc. |
| 18855160 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 18733473 | SYSTEMS AND METHODS THAT UTILIZE METAL-COATED PROCESSING HEADS TO IMPROVE WET PROCESSING OF SEMICONDUCTOR SUBSTRATES | Final Rejection | Tokyo Electron Limited |
| 18341239 | SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, CLEANING METHOD, AND RECORDING MEDIUM | Non-Final OA | Kokusai Electric Corporation |
| 18732471 | TREATMENT LIQUID | Final Rejection | Tokyo Ohka Kogyo Co., Ltd. |
| 18122961 | SULFONIC ACID-MODIFIED COLLOIDAL SILICA | Non-Final OA | FUJIMI INCORPORATED |
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