Tech Center 2800 • Art Units: 1716 1743 1792 2812
This examiner grants 82% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18640071 | FABRICATION OF REFLECTIVE POLYMER WAVEGUIDE MOLD | Non-Final OA | GOOGLE LLC |
| 18624450 | Etching Compositions | Non-Final OA | Fujifilm Electronic Materials U.S.A., Inc. |
| 18790894 | ATOMIC LAYER ETCHING PROCESSES | Non-Final OA | ASM IP Holding B.V. |
| 18028808 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE | Non-Final OA | Mitsubishi Electric Corporation |
| 18236042 | METHODS OF ETCHING SILICON-AND-OXYGEN-CONTAINING FEATURES AT LOW TEMPERATURES | Final Rejection | Applied Materials, Inc. |
| 18232991 | METHODS OF ETCHING OXYGEN-CONTAINING FEATURES AT LOW TEMPERATURES | Non-Final OA | Applied Materials, Inc. |
| 18212314 | INCREASED ETCH RATES OF SILICON-CONTAINING MATERIALS | Final Rejection | Applied Materials, Inc. |
| 18626025 | HIGH ENERGY ATOMIC LAYER ETCHING | Non-Final OA | Lam Research Corporation |
| 18202872 | ETCHING GAS COMPOSITION, SUBSTRATE PROCESSING APPARATUS, AND PATTERN FORMING METHOD USING THE ETCHING GAS COMPOSITION | Non-Final OA | SEMES CO., LTD. |
| 18189427 | ETCHING GAS COMPOSITION, SUBSTRATE PROCESSING APPARATUS, AND PATTERN FORMING METHOD USING THE SAME | Non-Final OA | SEMES CO., LTD. |
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