Tech Center 2800 • Art Units: 1716 1792 2812
This examiner grants 82% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18028808 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE | Non-Final OA | Mitsubishi Electric Corporation |
| 17553811 | POLISHING LIQUID AND CHEMICAL MECHANICAL POLISHING METHOD | Non-Final OA | FUJIFILM Corporation |
| 18236042 | METHODS OF ETCHING SILICON-AND-OXYGEN-CONTAINING FEATURES AT LOW TEMPERATURES | Non-Final OA | Applied Materials, Inc. |
| 18751858 | PELLICLE ASSEMBLY AND METHOD OF MAKING SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18608043 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 18207737 | ETCHING METHOD AND PLASMA PROCESSING SYSTEM | Final Rejection | Tokyo Electron Limited |
| 18027720 | SURFACE-MODIFIED SILICA PARTICLES AND COMPOSITIONS COMPRISING SUCH PARTICLES | Non-Final OA | MERCK PATENT GMBH |
| 18213894 | SACRIFICIAL PASSIVATION FILM DEPOSITION METHOD, TRENCH ETCHING METHOD AND SEMICONDUCTOR PROCESSING APPARATUS USING LOW-TEMPERATURE ALD PROCESS | Non-Final OA | SEMES CO., LTD. |
| 18662672 | METHOD FOR ETCHING AN ETCH LAYER | Final Rejection | Lam Research Corporation |
| 18122961 | SULFONIC ACID-MODIFIED COLLOIDAL SILICA | Final Rejection | FUJIMI INCORPORATED |
| 18216289 | POLISHING COMPOSITIONS AND METHODS OF USE THEREOF | Final Rejection | Fujifilm Electronic Materials U.S.A., Inc. |
| 18239037 | CRYOGENIC PLASMA ETCHING USING C2H2F2 | Non-Final OA | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude |
| 18239041 | DIELECTRIC PLASMA ETCHING USING C2H2F2 | Non-Final OA | L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude |
| 18014406 | Control of Processing Equipment | Final Rejection | University of Exeter |
| 18157006 | ETCHANT COMPOSITION OF TITANIUM LAYER AND ETCHING METHOD USING THE SAME | Non-Final OA | ENF TECHNOLOGY CO., LTD. |
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